Electromagnetic wave attenuating transparent member
    1.
    发明授权
    Electromagnetic wave attenuating transparent member 有权
    电磁波衰减透明构件

    公开(公告)号:US06319598B1

    公开(公告)日:2001-11-20

    申请号:US09358557

    申请日:1999-07-22

    IPC分类号: G02B111

    摘要: An electromagnetic wave attenuating transparent member includes; a transparent base material, and a plurality of structural layers including at least one transparent conductive layer. Sheet resistivity of the electromagnetic wave attenuating transparent member is 100 &OHgr;/cm2 or less, and the plurality of structural layers include a first layer and a second layer which is provided to be farther than the first layer from the transparent base material, and has density which is higher than that of the first layer.

    摘要翻译: 电磁波衰减透明构件包括: 透明基材,以及包括至少一个透明导电层的多个结构层。 电磁波衰减透明构件的薄层电阻率为100欧姆/平方厘米以下,多个结构层包括第一层和第二层,该第一层和第二层被设置为比透明基材远离第一层,并且具有密度 比第一层高。

    Antireflection coating, optical element, and optical transceiver module
    2.
    发明授权
    Antireflection coating, optical element, and optical transceiver module 有权
    防反射涂层,光学元件和光收发模块

    公开(公告)号:US07599119B2

    公开(公告)日:2009-10-06

    申请号:US11331018

    申请日:2006-01-13

    IPC分类号: G02B1/10

    CPC分类号: G02B6/4204 G02B1/115

    摘要: An antireflection coating provided on an optical element which passes through at least two wavelengths of light in the wavelength range of 1300-1600 nm, wherein the antireflection coating comprises: a high refractive index layer; a low refractive index layer having a refractive index lower than a refractive index of the high refractive index layer; and a supplementary layer having a composition different from a composition of the high refractive index layer or from a composition of the low refractive index layer, and being provided adjacent to the high refractive index layer or to the low refractive index layer.

    摘要翻译: 一种防反射涂层,其设置在通过1300-1600nm波长范围内的至少两个波长的光学元件上,其中所述抗反射涂层包括:高折射率层; 折射率低于高折射率层的折射率的低折射率层; 以及具有与高折射率层的组成不同的组成或与低折射率层的组成不同的辅助层,并且邻近高折射率层或低折射率层设置。

    Antireflection coating with electromagnetic wave shielding effect and
optical member having the antireflection coating
    4.
    发明授权
    Antireflection coating with electromagnetic wave shielding effect and optical member having the antireflection coating 失效
    具有电磁波屏蔽效果的防反射涂层和具有抗反射涂层的光学部件

    公开(公告)号:US6104534A

    公开(公告)日:2000-08-15

    申请号:US44802

    申请日:1998-03-20

    CPC分类号: G02B1/116

    摘要: In an optical member having a coating for reducing a ray reflecting on the coating and for reducing an electromagnetic wave incident on the coating, the optical member includes: a transparent substrate; and the coating including, and formed on the transparent substrate in the order named from the transparent substrate, a first light transmitting thin layer having a high refractive index, a first light transmitting thin layer having a low refractive index, a second light transmitting thin layer having a high refractive index, a second light transmitting thin layer having a low refractive index. At least one of the first light transmitting thin layer having the high refractive index and the second light transmitting thin layer having the high refractive index is a transparent conductive layer having a sheet resistivity of 100 .OMEGA./.quadrature. or less.

    摘要翻译: 在具有用于减少在涂层上反射的光线并用于减少入射在涂层上的电磁波的涂层的光学部件中,所述光学部件包括:透明基板; 以及从所述透明基板起依次形成在所述透明基板上的所述涂层具有高折射率的第一透光薄膜,具有低折射率的第一透光薄膜,第二透光薄层 具有高折射率,具有低折射率的第二透光薄层。 具有高折射率的第一透光薄层和具有高折射率的第二透光薄层中的至少一个是具有100欧姆/平方厘米的薄膜电阻率的透明导电层。

    SOLUTION FOR REMOVING RESIDUE AFTER SEMICONDUCTOR DRY PROCESS AND METHOD OF REMOVING THE RESIDUE USING THE SAME
    6.
    发明申请
    SOLUTION FOR REMOVING RESIDUE AFTER SEMICONDUCTOR DRY PROCESS AND METHOD OF REMOVING THE RESIDUE USING THE SAME 有权
    用于在半导体干燥方法之后移除残留物的方法和使用该残留物去除残留物的方法

    公开(公告)号:US20100248486A1

    公开(公告)日:2010-09-30

    申请号:US12377995

    申请日:2007-08-23

    申请人: Shingo Nakamura

    发明人: Shingo Nakamura

    IPC分类号: H01L21/302 C11D7/26 H01L21/26

    摘要: The present invention provides a residue-removing solution for use after a dry process, the residue-removing solution being capable of preventing minute cracks on a Cu surface, which has heretofore been unresolved with known polymer-removing solutions; and a method for manufacturing semiconductor devices using the residue-removing solution. More specifically, the invention relates to a residue-removing solution for removing residues present on semiconductor substrates after dry etching and/or ashing, the solution containing water and at least one component selected from the group consisting of (a) a keto acid, (b) a keto acid salt, and (c) an aldehyde acid salt; and a method for removing residues using the residue-removing solution.

    摘要翻译: 本发明提供了一种在干法处理后使用的残留物去除溶液,该残渣除去溶液能够防止在已知的聚合物去除溶液中迄今未解决的Cu表面上的微小裂纹; 以及使用该除渣液的半导体装置的制造方法。 更具体地说,本发明涉及一种用于去除在干蚀刻和/或灰化之后存在于半导体衬底上的残留物的残留物去除溶液,所述溶液含有水和至少一种选自(a)酮酸,( b)酮酸盐,和(c)醛酸盐; 以及使用残渣除去溶液除去残留物的方法。

    Frozen dough conditioners
    8.
    发明授权
    Frozen dough conditioners 失效
    冷冻面团调理

    公开(公告)号:US5554403A

    公开(公告)日:1996-09-10

    申请号:US330958

    申请日:1994-10-28

    CPC分类号: A21D2/18 A21D2/16 A21D6/001

    摘要: A frozen dough conditioner for preventing freezing damage, such as reduced loaf volume of bread and deteriorated texture and taste, on the frozen dough caused in freezing and thawing processes. Preferably, the conditioner composition is in the form of a powdery or granule conditioner for admixture with a dough composition to be frozen. The composition preferably is prepared by spraying and drying an aqueous solution or dispersion having a pH of about 4 to about 9, wherein the aqueous solution or dispersion contains: (A) a sucrose fatty acid ester having an HLB of not less than about 5; (B) diacetyl tartaric acid monoglyceride; (C) a fatty acid monoglyceride; and (D) one or more sugars.

    摘要翻译: 一种冷冻面团调理剂,用于在冷冻和解冻过程中在冷冻的面团上防止冷冻损伤,例如面包的面包体积减少和质地和味道的恶化。 优选地,调理剂组合物是粉状或颗粒调理剂的形式,用于与待冷冻的生面团组合物混合。 组合物优选通过喷雾和干燥pH为约4至约9的水溶液或分散体制备,其中水溶液或分散体含有:(A)HLB不小于约5的蔗糖脂肪酸酯; (B)二乙酰酒石酸单甘油酯; (C)脂肪酸单甘油酯; 和(D)一种或多种糖。