摘要:
The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by the formula (1) wherein R21, Q1, Q2, and A+ defined in the specification; (B) a salt represented by the formula (II): wherein R22, Q3, Q4, and A′+ are defined in the specification; and (C) a resin which contains a structural unit having a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
摘要:
The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by (I): wherein R21 represents a C1-C30 hydrocarbon group, Q1 and Q2 each represent a fluorine atom, and A+ represents at least one organic cation represented by (Ia): wherein P1-P3 each represent C1-C30 alkyl group, a cation represented by (Ib): wherein P4 and P5 each represent a hydrogen atom, and a cation represented by (Ic): wherein P10-P21 each represent hydrogen atom, B represents sulfur or oxygen atom and m represents 0 or 1; (B) a salt (II): wherein R22 represents C1-C30 hydrocarbon group, Q3 and Q4 each represent fluorine atom, and A′+ represents an organic cation (IIa): wherein P6 and P7 are each a C1-C12 alkyl group, P8 represents hydrogen atom, P9 represents C1-C12 alkyl group; and (C) a resin which contains a structural unit having an acid-labile group.
摘要:
The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ≡O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).
摘要:
The present invention provides a salt of the formula (L)A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ═O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).
摘要:
A fiber optic distributed temperature sensor system outputs a temperature distribution along the longitudinal direction of a sensor optical fiber by measuring the temperature dependency of Raman scattered light intensity produced in an optical fiber by use of the OTDR technique. The system is characterized in that a light output from a light source is input to the sensor (optical fiber) via an optical wavelength division demultiplexer, that among the reflected light of back scattered light returning from the sensor optical fiber, light of a particular wavelength range is reflected or transmitted by at least one optical filter of the optical wavelength division demultiplexer to separate the light of the particular wavelength range and that signal of the light of the particular wavelength range is guided to a detector of an optical measuring system.
摘要:
A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B), a cross-linking agent (C) and an acid amplifier (D) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern.
摘要:
An accumulator device includes: an outer container with mutually overlapped outer films bonded air-tightly to each other at a bonding portion formed along respective outer peripheral edge portions; an electrode unit accommodated inside the outer container and including positive and negative electrode sheets stacked one on another with a separator disposed therebetween, the positive and negative electrode sheets each including a current collector on which an electrode layer is formed; positive and negative electrode terminals provided to protrude from inside the outer container to outside through the bonding portion; and an electrolytic solution injected in the outer container. The positive electrode terminal includes an aluminum terminal substrate and a nickel-plating coating formed on a surface of an outer end portion of the terminal substrate located outside the outer container; an inner edge of the nickel-plating coating is located within the bonding portion.
摘要:
A positive electrode system of an electric storage device includes first and second positive electrodes. The first and second positive electrodes include current collectors, and first and second positive-electrode mixture layers, respectively. The negative electrode system of the electric storage device has a negative electrode including a current collector and a negative-electrode mixture layer. The first positive electrode and the second positive electrode are arranged across the negative electrode. The first positive-electrode mixture layer and the second positive-electrode mixture layer are connected to each other, and of different types. Through-holes are formed in the current collector of the negative electrode arranged between the first positive-electrode mixture layer and the second positive-electrode mixture layer.
摘要:
The present invention provides a photoresist composition comprisinga resin which comprises a structural unit represented by the formula (I): wherein Q1 and Q2 independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion, and a compound represented by the formula (D′): wherein R51, R52, R53 and R54 independently represent a C1-C20 alkyl group etc., and A11 represents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.
摘要:
A compounds represented by the Formula (I) or the Formula (I′). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.