Chemicallly amplified resist composition
    1.
    发明授权
    Chemicallly amplified resist composition 有权
    化学放大抗蚀剂组合物

    公开(公告)号:US07741007B2

    公开(公告)日:2010-06-22

    申请号:US11987672

    申请日:2007-12-03

    IPC分类号: G03F7/004

    摘要: The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by the formula (1) wherein R21, Q1, Q2, and A+ defined in the specification; (B) a salt represented by the formula (II): wherein R22, Q3, Q4, and A′+ are defined in the specification; and (C) a resin which contains a structural unit having a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译: 本发明提供一种化学放大抗蚀剂组合物,其包含:(A)由式(1)表示的盐,其中在说明书中定义的R 21,Q 1,Q 2和A + (B)由式(II)表示的盐:其中R 22,Q 3,Q 4和A'+在本说明书中定义; 和(C)含有具有酸不稳定基团的结构单元的结构单元的树脂,其本身在碱性水溶液中不溶或难溶,但通过酸作用而溶于碱水溶液中。

    Chemically amplified resist composition
    2.
    发明申请
    Chemically amplified resist composition 有权
    化学放大抗蚀剂组合物

    公开(公告)号:US20080213695A1

    公开(公告)日:2008-09-04

    申请号:US11987672

    申请日:2007-12-03

    IPC分类号: G03F7/004

    摘要: The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by (I): wherein R21 represents a C1-C30 hydrocarbon group, Q1 and Q2 each represent a fluorine atom, and A+ represents at least one organic cation represented by (Ia): wherein P1-P3 each represent C1-C30 alkyl group, a cation represented by (Ib): wherein P4 and P5 each represent a hydrogen atom, and a cation represented by (Ic): wherein P10-P21 each represent hydrogen atom, B represents sulfur or oxygen atom and m represents 0 or 1; (B) a salt (II): wherein R22 represents C1-C30 hydrocarbon group, Q3 and Q4 each represent fluorine atom, and A′+ represents an organic cation (IIa): wherein P6 and P7 are each a C1-C12 alkyl group, P8 represents hydrogen atom, P9 represents C1-C12 alkyl group; and (C) a resin which contains a structural unit having an acid-labile group.

    摘要翻译: 本发明提供一种化学放大抗蚀剂组合物,其包含:(A)由(I)表示的盐:其中R 21表示C 1 -C 30烃基,Q 1和 Q 2各自表示氟原子,A 0 +表示由(Ia)表示的至少一种有机阳离子:其中P 1〜 SUP> 3各自表示C1-C30烷基,由(Ib)表示的阳离子:其中P 4和P 5各自表示氢原子,和 由(Ic)表示的阳离子:其中P为10〜21个,各自表示氢原子,B表示硫或氧原子,m表示0或1; (B)盐(II):其中R 22表示C 1 -C 30烃基,Q 3和Q 4各自表示氟原子, 并且A' +表示有机阳离子(IIa):其中P 6和P 7各自为C 1 -C 12烷基, SUP> 8表示氢原子,P 9表示C1-C12烷基; 和(C)含有具有酸不稳定基团的结构单元的树脂。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    3.
    发明申请
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US20070027336A1

    公开(公告)日:2007-02-01

    申请号:US11390319

    申请日:2006-03-28

    IPC分类号: C07C309/51

    CPC分类号: C07C309/17 C07C2603/74

    摘要: The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ≡O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

    摘要翻译: 本发明提供式(L)的盐式(L)的盐:其中Q表示-CO-基或-C(OH) - 基; 环X表示当Q为-C(OH) - 基团或其中两个氢原子被≡O基团取代时,其中氢原子被Q位羟基取代的具有3-30个碳原子的单环或多环烃基 在Q为-CO-基的Q位置,单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基,具有1至6个碳原子的烷氧基,具有1至6个碳原子的烷氧基, 1至4个碳原子,具有1至6个碳原子的羟基烷基,羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。 本发明还提供了包含式(L)的盐的化学放大抗蚀剂组合物。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    4.
    发明授权
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US08124803B2

    公开(公告)日:2012-02-28

    申请号:US11390319

    申请日:2006-03-28

    IPC分类号: C07C309/19

    CPC分类号: C07C309/17 C07C2603/74

    摘要: The present invention provides a salt of the formula (L)A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ═O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

    摘要翻译: 本发明提供式(L)的盐式(L)的盐:其中Q表示-CO-基或-C(OH) - 基; 环X表示具有3〜30个碳原子的单环或多环烃基,其中当Q为-C(OH) - 基时,其中氢原子被Q位上的羟基取代,或其中两个氢原子被取代为= 在Q为-CO-基的Q位置,单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基,具有1至6个碳原子的烷氧基,具有1至6个碳原子的烷氧基, 1至4个碳原子,具有1至6个碳原子的羟基烷基,羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1〜6个碳原子的全氟烷基; 而A +代表有机抗衡离子。 本发明还提供了包含式(L)的盐的化学放大抗蚀剂组合物。

    RESIST PROCESSING METHOD
    6.
    发明申请
    RESIST PROCESSING METHOD 审中-公开
    电阻加工方法

    公开(公告)号:US20110189618A1

    公开(公告)日:2011-08-04

    申请号:US13062180

    申请日:2009-09-01

    IPC分类号: G03F7/20

    摘要: A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B), a cross-linking agent (C) and an acid amplifier (D) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern.

    摘要翻译: 抗蚀剂处理方法包括以下步骤:(1)通过施加第一抗蚀剂组合物形成第一抗蚀剂膜,所述第一抗蚀剂组合物包含:具有酸不稳定基团的树脂(A),其在碱性水溶液中不溶或难溶,并且呈现 通过酸,光酸产生剂(B),交联剂(C)和酸放大器(D)的作用将其溶于碱水溶液中并干燥; (2)预烘第一抗蚀膜; (3)暴露于第一抗蚀膜; (4)第一抗蚀剂膜的曝光后烘烤; (5)用第一碱性显影剂显影以获得第一抗蚀剂图案; (6)硬烘烤第一抗蚀剂图案,(7)通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上并干燥获得第二抗蚀剂膜; (8)预烘烤第二抗蚀剂膜; (9)使第二抗蚀剂膜曝光; (10)曝光后烘烤第二抗蚀膜; 和(11)用第二碱性显影剂显影以获得第二抗蚀剂图案。

    Accumulator device
    7.
    发明授权
    Accumulator device 有权
    蓄电池装置

    公开(公告)号:US09496541B2

    公开(公告)日:2016-11-15

    申请号:US13637385

    申请日:2011-02-24

    摘要: An accumulator device includes: an outer container with mutually overlapped outer films bonded air-tightly to each other at a bonding portion formed along respective outer peripheral edge portions; an electrode unit accommodated inside the outer container and including positive and negative electrode sheets stacked one on another with a separator disposed therebetween, the positive and negative electrode sheets each including a current collector on which an electrode layer is formed; positive and negative electrode terminals provided to protrude from inside the outer container to outside through the bonding portion; and an electrolytic solution injected in the outer container. The positive electrode terminal includes an aluminum terminal substrate and a nickel-plating coating formed on a surface of an outer end portion of the terminal substrate located outside the outer container; an inner edge of the nickel-plating coating is located within the bonding portion.

    摘要翻译: 一种蓄电装置,包括:外部容器,其具有相互重叠的外部膜,其沿相应的外周边缘部形成的接合部气密地彼此粘合; 容纳在外容器内部的电极单元,并且包括彼此层叠的正电极片和负电极片,隔着配置有隔膜的正极片和负极片,每个包括形成有电极层的集电体; 正极端子和负极端子,其设置成通过接合部从外部容器内部突出到外部; 以及注入到外容器中的电解液。 正极端子包括铝端子基板和形成在位于外部容器外部的端子基板的外端部的表面上的镀镍涂层; 镍镀层的内边缘位于接合部分内。

    Photoresist composition
    9.
    发明授权
    Photoresist composition 有权
    光刻胶组成

    公开(公告)号:US08524440B2

    公开(公告)日:2013-09-03

    申请号:US12983729

    申请日:2011-01-03

    IPC分类号: G03F7/26

    摘要: The present invention provides a photoresist composition comprisinga resin which comprises a structural unit represented by the formula (I): wherein Q1 and Q2 independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion, and a compound represented by the formula (D′): wherein R51, R52, R53 and R54 independently represent a C1-C20 alkyl group etc., and A11 represents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.

    摘要翻译: 本发明提供了包含树脂的光致抗蚀剂组合物,其包含式(I)表示的结构单元:其中Q1和Q2独立地表示氟原子等,U表示C1-C20二价烃基等,X 1表示 - O-CO-等,A +表示有机抗衡离子,由式(D')表示的化合物:其中R51,R52,R53和R54独立地表示C1-C20烷基等,A11表示 可以具有一个或多个取代基且可以含有一个或多个杂原子的C 1 -C 36饱和环烃基。