摘要:
An improved method of reaction of water PU resins for improving the blocking reactions of beta-dicarbynal compounds and polisocynantes, and reducing the reaction time for water PU blocking, wherein the construction is: ##STR1## wherein: R.sub.1,R.sub.2,R.sub.3,R.sub.4 =hydrogen or alkyl group n.sub.1 =1.about.100 n.sub.2, n.sub.3, n.sub.4 =1.about.10 The blocking agents of beta-Dicarbonyl compounds are reduced by D.sub.1 and D.sub.2 which are used in the blocking reactions of water PU.
摘要:
A method for synthesizing 1,4-bis(4-aminophenoxy)naphthalene and a series of polyamides, polyimides and copoly(amide-imide)s derived from the said compound is disclosed. These polymers possess excellent thermal stability and mechanical strength.
摘要:
A blocked hydrophilic polyurethane with molecular weight of 500.about.40,000, 5.about.70% solid content and 5.about.200 milliequivalent per 100 g polymer of sulfonic acid salt, can be prepared from following reactants:a. Organic isocyanates;b. Polyols, including polyether polyol, polyester polyol, polycarbonate, and polycaprolactone, that can participate in the polyaddition reactions with isocyanates.c. Polyols containing sulfonate group.d. Organic blocking agents capable of reacting with isocyanates.The blocked hydrophilic PU resins formed from above reactants can be applied for the anti-wrinkle treatment of cellulosic textiles with excellent performance.
摘要:
The present invention consists of a method for the preparation of an anionic water dispersible polyurethane(PU), which has excellent adhesive properties. The preparation method involves the formation of prepolymer from polyisocyanates and an active hydrogen containing compound such as polyols, followed by chain extension with aliphatic diols or diamines, and finally by chain extension with N-(2-aminoalkyl-2-aminoethoxylate ethane sulfonate and dispersion of the reaction product by deionized water to obtain water-borne polyurethane adhesive.
摘要:
The present invention relates to the synthesis of new type of diamine monomer, 1,3-bis(4-amonophenoxy)naphthalene, and with such a compound to produce a series of aromatic polymers, including polyamide, polyimide, copoly(amide-imide)s, etc., such polymers having excellent resistance to heat and mechanical properties.
摘要:
A method of manufacturing a photo-catalyst including titanium dioxide and silicon dioxide is provided, wherein titanium dioxide is synthesized by a collosol gelatinization utilizing the water generated by the esterification of acid and alcohol to conduct a reaction of hydrolysis condensation. The silicon dioxide is synthesized by a collosol gelatinization by adding Si(OC2H5)4, n-C4H9OH and water or Si(OC2H5)4, (CH3)Si(OC2H5)3 and water.
摘要翻译:提供了一种制造包括二氧化钛和二氧化硅的光催化剂的方法,其中二氧化钛通过利用由酸和醇的酯化产生的水进行胶体醇凝胶合成,以进行水解缩合反应。 通过加入Si(OC 2 H 5)4,n-C 4 H 9 OH和水或Si(OC 2 H 5)4,(CH 3)Si(OC 2 H 5)3和水),通过胶体醇化来合成二氧化硅。
摘要:
A bump structure comprises a first polymer block, a second polymer block, a first groove, an under bump metallurgy layer and a connection metal layer, wherein the first polymer block and the second polymer block are individual blocks. The first polymer block and the second polymer block are located at two sides of the first groove, the first polymer block comprises a first connection slot, and the second polymer block comprises a second connection slot communicated with the first connection slot and the first groove. The under bump metallurgy layer covers the first polymer block and the second polymer block to form a second groove, a third connection slot and a fourth connection slot communicated with each other. The connection metal layer covers the under bump metallurgy layer to form a third groove, a fifth connection slot and a sixth connection slot communicated with each other.
摘要:
A bump structure comprises a first polymer block, a second polymer block, a first groove, an under bump metallurgy layer and a connection metal layer, wherein the first polymer block and the second polymer block are individual blocks. The first polymer block comprises a first connection slot, and the second polymer block comprises a second connection slot communicated with the first groove and the first connection slot. The under bump metallurgy layer covers the first polymer block and the second polymer block to form a second groove. The connection metal layer covers the under bump metallurgy layer to form a third groove, wherein the under bump metallurgy layer covers a first coverage area of the first polymer block and a second coverage area of the second polymer block and reveals a first exposure area of the first polymer block and a second exposure area of the second polymer block.
摘要:
A compound or polymer having a bis(phenoxy)naphthalene structure, a high molecular weight, and very good mechanical performance and heat-resistivity is provided. The polymer can be polyamides, polyimides or poly(amide-imide)s and can have a basic structure of ##STR1## wherein R1 is a naphthalene ring.
摘要:
A bump structure comprises a first polymer block, a second polymer block, a first groove, an under bump metallurgy layer and a connection metal layer, wherein the first polymer block and the second polymer block are individual blocks. The first polymer block comprises a first connection slot, and the second polymer block comprises a second connection slot communicated with the first groove and the first connection slot. The under bump metallurgy layer covers the first polymer block and the second polymer block to form a second groove. The connection metal layer covers the under bump metallurgy layer to form a third groove, wherein the under bump metallurgy layer covers a first coverage area of the first polymer block and a second coverage area of the second polymer block and reveals a first exposure area of the first polymer block and a second exposure area of the second polymer block.