公开(公告)号：US20080057731A1

公开(公告)日：2008-03-06

申请号：US11927730

申请日：2007-10-30

申请人： Shinichi UEHARA ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

发明人： Shinichi UEHARA ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： G02B3/0056 ,  B81B2207/056 ,  B81C1/00031 ,  B81C2201/0133 ,  B81C2201/0142 ,  C03C15/00 ,  C03C17/34 ,  C03C2204/08 ,  C03C2218/34 ,  G02B3/0012 ,  G02F1/133526 ,  Y10T428/131 ,  Y10T428/249969 ,  Y10T428/315

摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.

公开(公告)号：US07329611B2

公开(公告)日：2008-02-12

申请号：US10410254

申请日：2003-04-10

申请人： Shinichi Uehara ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

发明人： Shinichi Uehara ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

IPC分类号： H01L21/302 ,  B29D11/00

CPC分类号： G02B3/0056 ,  B81B2207/056 ,  B81C1/00031 ,  B81C2201/0133 ,  B81C2201/0142 ,  C03C15/00 ,  C03C17/34 ,  C03C2204/08 ,  C03C2218/34 ,  G02B3/0012 ,  G02F1/133526 ,  Y10T428/131 ,  Y10T428/249969 ,  Y10T428/315

摘要： In a formation method for forming a fine structure in a workpiece containing an etching control component, using an isotropic etching process, a mask having an opening is applied to the workpiece, and the workpiece is etched with an etching solution to thereby form a recess, corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.

摘要翻译： 在包含蚀刻控制部件的工件中形成精细结构的形成方法中，使用各向同性蚀刻工序，将具有开口的掩模施加到工件上，用蚀刻溶液蚀刻工件，从而形成凹部， 对应于工件的表面中的开口的形状。 由于在各向同性蚀刻工艺期间蚀刻控制部件在凹陷内的蚀刻溶液中从工件中洗脱出来，停止了工件的蚀刻。

公开(公告)号：US20070291370A1

公开(公告)日：2007-12-20

申请号：US11843677

申请日：2007-08-23

申请人： Shinichi UEHARA ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

发明人： Shinichi UEHARA ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

IPC分类号： G02B1/00

CPC分类号： G02B3/0056 ,  B81B2207/056 ,  B81C1/00031 ,  B81C2201/0133 ,  B81C2201/0142 ,  C03C15/00 ,  C03C17/34 ,  C03C2204/08 ,  C03C2218/34 ,  G02B3/0012 ,  G02F1/133526 ,  Y10T428/131 ,  Y10T428/249969 ,  Y10T428/315

摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.

摘要翻译： 在包含蚀刻控制部件的工件（30）中形成精细结构的形成方法中，使用各向同性蚀刻工序，将具有开口（36）的掩模（32,34）施加到工件上，工件为 用蚀刻溶液（38）蚀刻，从而在工件的表面形成对应于开口形状的凹部（40）。 由于在各向同性蚀刻工艺期间蚀刻控制部件在凹陷内的蚀刻溶液中从工件中洗脱出来，停止了工件的蚀刻。

公开(公告)号：US07678454B2

公开(公告)日：2010-03-16

申请号：US11927730

申请日：2007-10-30

申请人： Shin-Ichi Uehara ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

发明人： Shin-Ichi Uehara ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

IPC分类号： B32B17/00

CPC分类号： G02B3/0056 ,  B81B2207/056 ,  B81C1/00031 ,  B81C2201/0133 ,  B81C2201/0142 ,  C03C15/00 ,  C03C17/34 ,  C03C2204/08 ,  C03C2218/34 ,  G02B3/0012 ,  G02F1/133526 ,  Y10T428/131 ,  Y10T428/249969 ,  Y10T428/315

摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.

摘要翻译： 在包含蚀刻控制部件的工件（30）中形成精细结构的形成方法中，使用各向同性蚀刻工序，将具有开口（36）的掩模（32,34）施加到工件上，工件为 用蚀刻溶液（38）蚀刻，从而在工件的表面形成对应于开口形状的凹部（40）。 由于在各向同性蚀刻工艺期间蚀刻控制部件在凹陷内的蚀刻溶液中从工件中洗脱出来，停止了工件的蚀刻。

公开(公告)号：US20080074564A1

公开(公告)日：2008-03-27

申请号：US11927725

申请日：2007-10-30

申请人： Shin-Ichi UEHARA ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

发明人： Shin-Ichi UEHARA ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

IPC分类号： G02F1/1335

CPC分类号： G02B3/0056 ,  B81B2207/056 ,  B81C1/00031 ,  B81C2201/0133 ,  B81C2201/0142 ,  C03C15/00 ,  C03C17/34 ,  C03C2204/08 ,  C03C2218/34 ,  G02B3/0012 ,  G02F1/133526 ,  Y10T428/131 ,  Y10T428/249969 ,  Y10T428/315

摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.

摘要翻译： 在包含蚀刻控制部件的工件（30）中形成精细结构的形成方法中，使用各向同性蚀刻工序，将具有开口（36）的掩模（32,34）施加到工件上，工件为 用蚀刻溶液（38）蚀刻，从而在工件的表面形成对应于开口形状的凹部（40）。 由于在各向同性蚀刻工艺期间蚀刻控制部件在凹陷内的蚀刻溶液中从工件中洗脱出来，停止了工件的蚀刻。

公开(公告)号：US07643100B2

公开(公告)日：2010-01-05

申请号：US11927725

申请日：2007-10-30

申请人： Shin-Ichi Uehara ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

发明人： Shin-Ichi Uehara ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

IPC分类号： G02F1/136 ,  G02F1/1335 ,  H01L21/302 ,  H01L21/461 ,  B29D11/00

CPC分类号： G02B3/0056 ,  B81B2207/056 ,  B81C1/00031 ,  B81C2201/0133 ,  B81C2201/0142 ,  C03C15/00 ,  C03C17/34 ,  C03C2204/08 ,  C03C2218/34 ,  G02B3/0012 ,  G02F1/133526 ,  Y10T428/131 ,  Y10T428/249969 ,  Y10T428/315

摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.

公开(公告)号：US07525732B2

公开(公告)日：2009-04-28

申请号：US11843677

申请日：2007-08-23

申请人： Shin-ichi Uehara ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

发明人： Shin-ichi Uehara ,  Yuko Sato ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Jin Matsushima

IPC分类号： G02B5/08 ,  G02B3/00

CPC分类号： G02B3/0056 ,  B81B2207/056 ,  B81C1/00031 ,  B81C2201/0133 ,  B81C2201/0142 ,  C03C15/00 ,  C03C17/34 ,  C03C2204/08 ,  C03C2218/34 ,  G02B3/0012 ,  G02F1/133526 ,  Y10T428/131 ,  Y10T428/249969 ,  Y10T428/315

摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.

摘要翻译： 在包含蚀刻控制部件的工件（30）中形成精细结构的形成方法中，使用各向同性蚀刻工序，将具有开口（36）的掩模（32,34）施加到工件上，工件为 用蚀刻溶液（38）蚀刻，从而在工件的表面形成对应于开口形状的凹部（40）。 由于在各向同性蚀刻工艺期间蚀刻控制部件在凹陷内的蚀刻溶液中从工件中洗脱出来，停止了工件的蚀刻。

公开(公告)号：US06323922B1

公开(公告)日：2001-11-27

申请号：US09542110

申请日：2000-03-31

申请人： Masayoshi Suzuki ,  Ken-Ichi Takatori ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Teruaki Suzuki ,  Hideo Shibahara ,  Yoshihiko Hirai

发明人： Masayoshi Suzuki ,  Ken-Ichi Takatori ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Teruaki Suzuki ,  Hideo Shibahara ,  Yoshihiko Hirai

IPC分类号： G02F11333

CPC分类号： G02F1/133753 ,  G02F1/133512 ,  G02F1/133707 ,  G02F1/136213 ,  G02F2001/133757 ,  G02F2001/133761

摘要： Liquid crystal display (LCD) has sub-pixel domains in each of pixels to obtain a wide viewing angle. The sub-pixel domains are formed by divided orientation alignment in which the sub-pixel domain are subjected to rubbing in different directions opposite to each other. The liquid crystal has a splay-type TN deformation structure in the first sub-pixel domain and a normal TN deformation structure in the second sub-pixel domain. The pre-tilt angles of the liquid crystal in the first domain and second domain are selected to obtain a wide viewing angle. The LCD has a shield pattern for for shielding disclination causing afterimages and storage capacitor electrodes having a function as a signal lines.

摘要翻译： 液晶显示器（LCD）在每个像素中具有子像素域，以获得宽的视角。 子像素域通过分割的取向对准形成，其中子像素域在彼此相反的不同方向上进行摩擦。 液晶在第一子像素域中具有喷射型TN变形结构，并且在第二子像素域中具有正常的TN变形结构。 选择第一域和第二域中的液晶的预倾角以获得宽视角。 LCD具有用于屏蔽变位的屏蔽图案，导致后影和具有作为信号线的功能的存储电容器电极。

公开(公告)号：US6081314A

公开(公告)日：2000-06-27

申请号：US096607

申请日：1998-06-12

申请人： Masayoshi Suzuki ,  Ken-Ichi Takatori ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Teruaki Suzuki ,  Hideo Shibahara ,  Yoshihiko Hirai

发明人： Masayoshi Suzuki ,  Ken-Ichi Takatori ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Teruaki Suzuki ,  Hideo Shibahara ,  Yoshihiko Hirai

IPC分类号： G02F1/1333 ,  G02F1/1335 ,  G02F1/1337 ,  G02F1/1343 ,  G02F1/1362

CPC分类号： G02F1/133753 ,  G02F1/133512 ,  G02F1/133707 ,  G02F1/136213 ,  G02F2001/133757 ,  G02F2001/133761

摘要： Liquid crystal display (LCD) has sub-pixel domains in each of pixels to obtain a wide viewing angle. The sub-pixel domains are formed by divided orientation alignment in which the sub-pixel domain are subjected to rubbing in different directions opposite to each other. The liquid crystal has a splay-type TN deformation structure in the first sub-pixel domain and a normal TN deformation structure in the second sub-pixel domain. The pre-tilt angles of the liquid crystal in the first domain and second domain are selected to obtain a wide viewing angle. The LCD has a shield pattern for shielding disclination causing afterimages and storage capacitor electrodes having a function as signal lines.

摘要翻译： 液晶显示器（LCD）在每个像素中具有子像素域，以获得宽的视角。 子像素域通过分割的取向对准形成，其中子像素域在彼此相反的不同方向上进行摩擦。 液晶在第一子像素域中具有喷射型TN变形结构，并且在第二子像素域中具有正常的TN变形结构。 选择第一域和第二域中的液晶的预倾角以获得宽视角。 LCD具有用于屏蔽旋转的屏蔽图案，导致后影和具有作为信号线的功能的存储电容器电极。

公开(公告)号：US5781262A

公开(公告)日：1998-07-14

申请号：US424123

申请日：1995-04-19

申请人： Masayoshi Suzuki ,  Ken-Ichi Takatori ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Teruaki Suzuki ,  Hideo Shibahara ,  Yoshihiko Hirai

发明人： Masayoshi Suzuki ,  Ken-Ichi Takatori ,  Ken Sumiyoshi ,  Setsuo Kaneko ,  Teruaki Suzuki ,  Hideo Shibahara ,  Yoshihiko Hirai

IPC分类号： G02F1/1333 ,  G02F1/1335 ,  G02F1/1337 ,  G02F1/1343 ,  G02F1/1362

CPC分类号： G02F1/133753 ,  G02F1/133512 ,  G02F1/133707 ,  G02F1/136213 ,  G02F2001/133757 ,  G02F2001/133761

摘要： Liquid crystal display (LCD) has sub-pixel domains within each pixel to obtain a wide viewing angle. The sub-pixel domains are formed by divided orientation alignment in which the sub-pixel domain are subjected to rubbing in different directions opposite to each other. The liquid crystal has a splay-type TN deformation structure in the first sub-pixel domain and a normal TN deformation structure in the second sub-pixel domain. The pre-tilt angles of the liquid crystal in the first domain and second domain are selected to obtain a wide viewing angle. The LCD has a shield pattern for for shielding disclination causing afterimages and storage capacitor electrodes having a function as a signal lines.

摘要翻译： 液晶显示器（LCD）在每个像素内具有子像素域以获得宽视角。 子像素域通过分割的取向对准形成，其中子像素域在彼此相反的不同方向上进行摩擦。 液晶在第一子像素域中具有喷射型TN变形结构，并且在第二子像素域中具有正常的TN变形结构。 选择第一域和第二域中的液晶的预倾角以获得宽视角。 LCD具有用于屏蔽变位的屏蔽图案，导致后影和具有作为信号线的功能的存储电容器电极。