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公开(公告)号：US20100034969A1
公开(公告)日：2010-02-11
申请号：US12569988
申请日：2009-09-30
IPC分类号： B05D3/12
CPC分类号： H01L21/68721 , B05D1/005 , G03F7/162 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached.
摘要翻译： 提供一种涂布处理装置，其包括水平保持四边形基板并旋转基板在水平面中的旋转卡盘，用于将涂布溶液供给到由旋转卡盘水平保持的基板的前表面的涂布溶液喷嘴，以及 溶剂供给机构，设置在旋转卡盘中，用于向基板的背面供给溶剂，其中供给到基板的背面的溶剂被允许到达基板的每个角部的背面和侧面 通过离心力，从而除去附着的涂布溶液。
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公开(公告)号：US07615117B2
公开(公告)日：2009-11-10
申请号：US10795269
申请日：2004-03-09
CPC分类号： H01L21/68721 , B05D1/005 , G03F7/162 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached.
摘要翻译： 提供一种涂布处理装置，其包括水平保持四边形基板并旋转基板在水平面中的旋转卡盘，用于将涂布溶液供给到由旋转卡盘水平保持的基板的前表面的涂布溶液喷嘴，以及 溶剂供给机构，设置在旋转卡盘中，用于向基板的背面供给溶剂，其中供给到基板的背面的溶剂被允许到达基板的每个角部的背面和侧面 通过离心力，从而除去附着的涂布溶液。
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公开(公告)号：US08277884B2
公开(公告)日：2012-10-02
申请号：US12569988
申请日：2009-09-30
CPC分类号： H01L21/68721 , B05D1/005 , G03F7/162 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached.
摘要翻译： 提供一种涂布处理装置，其包括水平保持四边形基板并旋转基板在水平面中的旋转卡盘，用于将涂布溶液供给到由旋转卡盘水平保持的基板的前表面的涂布溶液喷嘴，以及 溶剂供给机构，设置在旋转卡盘中，用于向基板的背面供给溶剂，其中供给到基板的背面的溶剂被允许到达基板的每个角部的背面和侧面 通过离心力，从而除去附着的涂布溶液。
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公开(公告)号：US20090263577A1
公开(公告)日：2009-10-22
申请号：US12492650
申请日：2009-06-26
IPC分类号： B05D3/12
CPC分类号： H01L21/68721 , B05C11/08 , B05D1/005 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
摘要翻译： 在用于通过在下降的清洁空气流中在环境中旋涂在多边形基板上形成涂膜的液体处理装置中，旋转卡盘包括用于在其上大致水平地支撑基板的支撑板。 空气流量控制构件设置在旋转卡盘上，使得气流控制构件邻近支撑在旋转卡盘上的多边形基板的周边设置，其中气流控制构件不设置在支撑在基座上的基板的拐角部分附近 旋转卡盘。 液体处理装置可以包括气流调节环，该气流调节环设置有具有围绕空气流量控制构件的外周的开口的空气入口，其中空气入口与排气单元连通。
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公开(公告)号：US07566365B2
公开(公告)日：2009-07-28
申请号：US10796179
申请日：2004-03-10
IPC分类号： B05C5/02
CPC分类号： H01L21/68721 , B05C11/08 , B05D1/005 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
摘要翻译： 在用于通过在下降的清洁空气流中在环境中旋涂在多边形基板上形成涂膜的液体处理装置中，旋转卡盘包括用于在其上大致水平地支撑基板的支撑板。 空气流量控制构件设置在旋转卡盘上，使得气流控制构件邻近支撑在旋转卡盘上的多边形基板的周边设置，其中气流控制构件不设置在支撑在基座上的基板的拐角部分附近 旋转卡盘。 液体处理装置可以包括气流调节环，该气流调节环设置有具有围绕空气流量控制构件的外周的开口的空气入口，其中空气入口与排气单元连通。
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公开(公告)号：US07927657B2
公开(公告)日：2011-04-19
申请号：US12492650
申请日：2009-06-26
IPC分类号： B05D3/12
CPC分类号： H01L21/68721 , B05C11/08 , B05D1/005 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
摘要翻译： 在用于通过在下降的清洁空气流中在环境中旋涂在多边形基板上形成涂膜的液体处理装置中，旋转卡盘包括用于在其上大致水平地支撑基板的支撑板。 空气流量控制构件设置在旋转卡盘上，使得气流控制构件邻近支撑在旋转卡盘上的多边形基板的周边设置，其中气流控制构件不设置在支撑在基座上的基板的拐角部分附近 旋转卡盘。 液体处理装置可以包括气流调节环，该气流调节环设置有具有围绕空气流量控制构件的外周的开口的空气入口，其中空气入口与排气单元连通。
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7.发明授权Developing treatment method, program, computer storage medium and developing treatment system 有权开发治疗方法，程序，计算机存储介质和开发治疗系统公开(公告)号：US08518480B2
公开(公告)日：2013-08-27
申请号：US13004246
申请日：2011-01-11
申请人： Norifumi Sato , Yukio Kiba , Tetsushi Miyamoto , Kazuhisa Hasebe
发明人： Norifumi Sato , Yukio Kiba , Tetsushi Miyamoto , Kazuhisa Hasebe
CPC分类号： H01L21/6715 , G03F7/3021 , H01L21/67109 , H01L21/67178 , H01L21/67742 , H01L21/67748
摘要： The present invention is a method of developing a resist film on a substrate using a developing solution at a predetermined temperature lower than room temperature, including a first cooling step of mounting and cooling the substrate on a cooling plate at a temperature lower than room temperature and higher than the predetermined temperature in a cooling apparatus; a second cooling step of then carrying the substrate into a developing apparatus and supplying a rinse solution at the predetermined temperature or lower onto the substrate to cool the substrate in the developing apparatus; a developing step of then supplying the developing solution onto the substrate and developing the resist film on the substrate to form a resist pattern in the resist film; and a cleaning step of then supplying a rinse solution at the predetermined temperature onto the substrate to clean a front surface of the substrate.
摘要翻译： 本发明是一种在低于室温的预定温度下使用显影液在基板上显影抗蚀剂膜的方法，该方法包括：在低于室温的温度下将基板安装和冷却在冷却板上的第一冷却步骤;以及 高于冷却装置中的预定温度; 第二冷却步骤，然后将衬底运送到显影装置中并将预定温度或更低的冲洗溶液供应到衬底上以冷却显影装置中的衬底; 显影步骤，然后将显影液供应到基底上，并在基底上显影抗蚀剂膜，以在抗蚀剂膜中形成抗蚀剂图案; 以及清洗步骤，然后将所述预定温度的冲洗溶液供应到所述基板上以清洁所述基板的前表面。
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8.发明申请DEVELOPING TREATMENT METHOD, PROGRAM, COMPUTER STORAGE MEDIUM AND DEVELOPING TREATMENT SYSTEM 有权开发处理方法，程序，计算机存储介质和开发处理系统公开(公告)号：US20110183073A1
公开(公告)日：2011-07-28
申请号：US13004246
申请日：2011-01-11
申请人： Norifumi Sato , Yukio Kiba , Tetsushi Miyamoto , Kazuhisa Hasebe
发明人： Norifumi Sato , Yukio Kiba , Tetsushi Miyamoto , Kazuhisa Hasebe
CPC分类号： H01L21/6715 , G03F7/3021 , H01L21/67109 , H01L21/67178 , H01L21/67742 , H01L21/67748
摘要： The present invention is a method of developing a resist film on a substrate using a developing solution at a predetermined temperature lower than room temperature, including a first cooling step of mounting and cooling the substrate on a cooling plate at a temperature lower than room temperature and higher than the predetermined temperature in a cooling apparatus; a second cooling step of then carrying the substrate into a developing apparatus and supplying a rinse solution at the predetermined temperature or lower onto the substrate to cool the substrate in the developing apparatus; a developing step of then supplying the developing solution onto the substrate and developing the resist film on the substrate to form a resist pattern in the resist film; and a cleaning step of then supplying a rinse solution at the predetermined temperature onto the substrate to clean a front surface of the substrate.
摘要翻译： 本发明是一种在低于室温的预定温度下使用显影液在基板上显影抗蚀剂膜的方法，该方法包括：在低于室温的温度下将基板安装和冷却在冷却板上的第一冷却步骤;以及 高于冷却装置中的预定温度; 第二冷却步骤，然后将衬底运送到显影装置中并将预定温度或更低的冲洗溶液供应到衬底上以冷却显影装置中的衬底; 显影步骤，然后将显影液供应到基底上，并在基底上显影抗蚀剂膜，以在抗蚀剂膜中形成抗蚀剂图案; 以及清洗步骤，然后将所述预定温度的冲洗溶液供应到所述基板上以清洁所述基板的前表面。
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