公开(公告)号：US20100132888A1

公开(公告)日：2010-06-03

申请号：US12699382

申请日：2010-02-03

申请人： Shoji IKUHARA ,  Daisuke Shiraishi ,  Hideyuki Yamamoto ,  Akira Kagoshima ,  Hiromichi Enami ,  Yosuke Karashima ,  Eiji Matsumoto

发明人： Shoji IKUHARA ,  Daisuke Shiraishi ,  Hideyuki Yamamoto ,  Akira Kagoshima ,  Hiromichi Enami ,  Yosuke Karashima ,  Eiji Matsumoto

IPC分类号： H01L21/306

CPC分类号： H01L21/67069 ,  H01J37/32935 ,  H01L21/67253

摘要： A plasma processing apparatus includes a plasma processing main frame, and an apparatus controller controlling the plasma processing main frame. The plasma processing main frame has a vacuum process chamber, an exhaust device, a mass flow controller, a stage electrode receiving a workpiece, a high-frequency electrical source to, and a transfer device placing the workpiece on the stage electrode and carrying out the processed workpiece. The apparatus controller controls the plasma processing main frame in accordance with a predetermined procedure and is provided with a diagnosis device which acquires a plurality of recipes for processing workpieces carried in the chamber and apparatus parameters of the plasma processing apparatus when a specific recipe of the above recipes is executed, whereby the condition of the plasma processing main frame is diagnosed based on the acquired apparatus parameters.

摘要翻译： 等离子体处理装置包括等离子体处理主框架和控制等离子体处理主框架的装置控制器。 等离子体处理主框架具有真空处理室，排气装置，质量流量控制器，接收工件的阶段电极，高频电源和将工件放置在平台电极上的传送装置， 加工工件。 设备控制器按照预定的步骤控制等离子体处理主框架，并且设置有诊断装置，该诊断装置获取用于处理在室中携带的工件的多个配方和等离子体处理装置的装置参数，当上述特定配方 执行配方，由此基于所获取的装置参数来诊断等离子体处理主框架的状态。

公开(公告)号：US20100297783A1

公开(公告)日：2010-11-25

申请号：US12849233

申请日：2010-08-03

申请人： Shoji IKUHARA ,  Daisuke Shiraishi ,  Hideyuki Yamamoto ,  Akira Kagoshima ,  Hiromichi Enami ,  Yosuke Karashima ,  Eiji Matsumoto

发明人： Shoji IKUHARA ,  Daisuke Shiraishi ,  Hideyuki Yamamoto ,  Akira Kagoshima ,  Hiromichi Enami ,  Yosuke Karashima ,  Eiji Matsumoto

IPC分类号： H01L21/302

CPC分类号： H01L21/67069 ,  H01J37/32935 ,  H01L21/67253

摘要： A method for performing a plasma process using a plasma processing apparatus which includes a vacuum process chamber, an exhaust device, a mass flow controller supplying a process gas, a stage electrode which receives and holds a workpiece by adsorption, a transfer device, and a high-frequency electrical source. The method includes a first step of performing the plasma process for the workpiece in the vacuum process chamber by a corresponding recipe of predetermined recipes, a second step of acquiring apparatus parameters showing the condition of the plasma processing apparatus when a specific recipe of the predetermined recipes is executed to diagnose whether the condition of the plasma processing apparatus is good or not based on the acquired apparatus parameters.

摘要翻译： 一种使用等离子体处理装置进行等离子体处理的方法，所述等离子体处理装置包括真空处理室，排气装置，供给处理气体的质量流量控制器，通过吸附接收和保持工件的载物台电极，转印装置和 高频电源。 该方法包括：通过预定配方的相应配方对真空处理室中的工件进行等离子体处理的第一步骤;获取当预定配方的特定配方时显示等离子体处理装置的状态的装置参数的第二步骤 被执行以基于所获取的装置参数来诊断等离子体处理装置的状况是否良好。

公开(公告)号：US20060260746A1

公开(公告)日：2006-11-23

申请号：US11199234

申请日：2005-08-09

申请人： Shoji Ikuhara ,  Daisuke Shiraishi ,  Hideyuki Yamamoto ,  Akira Kagoshima ,  Hiromichi Enami ,  Yosuke Karashima ,  Eiji Matsumoto

发明人： Shoji Ikuhara ,  Daisuke Shiraishi ,  Hideyuki Yamamoto ,  Akira Kagoshima ,  Hiromichi Enami ,  Yosuke Karashima ,  Eiji Matsumoto

IPC分类号： H01L21/306

CPC分类号： H01L21/67069 ,  H01J37/32935 ,  H01L21/67253

摘要： There is provided a preventive maintenance technique capable of diagnosing apparatus conditions without causing serious decrease in uptime ratio. A plasma process apparatus is composed of a plasma processing main frame, and an apparatus controller controlling the plasma processing main frame. The plasma processing main frame has a vacuum process chamber, an exhaust device evacuating the vacuum process chamber, a mass flow controller supplying a process gas into the vacuum process chamber, a stage electrode receiving a workpiece and holding it by adsorption, a high-frequency electrical source applying a high-frequency electrical power to the supplied process gas to generate plasma, and a transfer device placing the workpiece on the stage electrode and carrying out the processed workpiece. The apparatus controller controls the plasma processing main frame in accordance with a predetermined procedure and is provided with a diagnosis device which acquires a plurality of recipes for processing workpieces carried in the chamber and apparatus parameters of the plasma processing apparatus when a specific recipe of the above recipes is executed, whereby the condition of the plasma processing main frame is diagnosed based on the acquired apparatus parameters.

摘要翻译： 提供了能够诊断装置条件而不引起正常运行时间比例严重降低的预防性维护技术。 等离子体处理装置由等离子体处理主框架和控制等离子体处理主框架的装置控制器构成。 等离子体处理主框架具有真空处理室，抽真空处理室的排气装置，向真空处理室供给工艺气体的质量流量控制器，接收工件并通过吸附保持其的阶段电极，高频 电源向所提供的处理气体施加高频电力以产生等离子体;以及传送装置，将工件放置在平台电极上并且执行被处理的工件。 设备控制器按照预定的步骤控制等离子体处理主框架，并且设置有诊断装置，该诊断装置获取用于处理在室中携带的工件的多个配方和等离子体处理装置的装置参数，当上述特定配方 执行配方，由此基于所获取的装置参数来诊断等离子体处理主框架的状态。

公开(公告)号：US20140045966A1

公开(公告)日：2014-02-13

申请号：US14002219

申请日：2012-03-06

申请人： Shihei Motofuji ,  Shintaro Higuchi ,  Hironobu Tokunaga ,  Takao Mukai ,  Takeshi Otaka ,  Yusuke Mizuno ,  Yasuhiro Shindo ,  Eiji Matsumoto

发明人： Shihei Motofuji ,  Shintaro Higuchi ,  Hironobu Tokunaga ,  Takao Mukai ,  Takeshi Otaka ,  Yusuke Mizuno ,  Yasuhiro Shindo ,  Eiji Matsumoto

IPC分类号： C08F22/10

CPC分类号： C08F22/105 ,  C08F2/48 ,  C08F4/00 ,  C08F220/20 ,  C08F220/40 ,  C08F222/10 ,  C08F222/20 ,  C08G18/3206 ,  C08G18/4854 ,  C08G18/6511 ,  C08G18/6705 ,  C08G59/687 ,  C09D4/00 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/029 ,  G03F7/038 ,  C08F2222/104 ,  C08F2220/282

摘要： The photosensitive composition of the present invention includes: (1) a radical initiator (A); (2) an acid generator (B) and/or a base generator (C); and (3) a polymerizable substance (D), wherein at least one of the radical initiator (A), the acid generator (B) and the base generator (C) are to generate an active species (H) on exposure to active rays, the active species (H) reacting with the radical initiator (A), the acid generator (B) or the base generator (C) to generate another active species (I), the active species (I) initiating polymerization of the polymerizable substance (D), the active species (H) or (I) is an acid or a base, and the photosensitive composition contains substantially no colorants, metal oxide powder, or metallic powder.

摘要翻译： 本发明的光敏组合物包括：（1）自由基引发剂（A）; （2）酸生成剂（B）和/或碱发生剂（C）; 和（3）可聚合物质（D），其中自由基引发剂（A），酸产生剂（B）和碱性发生剂（C）中的至少一种在暴露于活性射线时将产生活性物质（H） ，活性物质（H）与自由基引发剂（A），酸产生剂（B）或碱发生剂（C）反应生成另一活性物质（I），活性物质（I）引发可聚合物质的聚合 （D）中，活性物质（H）或（I）为酸或碱，感光性组合物基本上不含有着色剂，金属氧化物粉末或金属粉末。

公开(公告)号：US20050078698A1

公开(公告)日：2005-04-14

申请号：US10502890

申请日：2003-01-24

申请人： Yoshinobu Araya ,  Eiji Matsumoto

发明人： Yoshinobu Araya ,  Eiji Matsumoto

IPC分类号： H04L1/16 ,  H04L12/18 ,  H04L12/70 ,  H04L12/811 ,  H04L29/08 ,  H04J3/26

CPC分类号： H04L12/1863

摘要： A multicast communication apparatus 1 has a multicast processing unit 11 to transmit by multicast one or a plurality of data to a plurality of receiving terminals 3, a retransmission request receiving unit 12 to receive a request for retransmission which specifies at least one data out of the one or the plurality of data transmitted by the multicast and which is transmitted by unicast from any one of the plurality of receiving terminals 3, and a retransmission processing unit 13 to transmit by the unicast the specified data in the request for retransmission to the any one of the plurality of receiving terminals 3 which transmitted the request for retransmission.

摘要翻译： 多播通信装置1具有多播处理单元11，通过多播一个或多个数据发送到多个接收终端3，重发请求接收单元12，用于接收重发请求，该请求指定至少一个数据， 通过多播发送的一个或多个数据，并且通过单播从多个接收终端3中的任何一个发送;以及重传处理单元13，通过在重发请求中将指定的数据单播到任一个 发送重发请求的多个接收终端3。

公开(公告)号：US5243265A

公开(公告)日：1993-09-07

申请号：US720869

申请日：1991-08-13

申请人： Hitoshi Matsuura ,  Eiji Matsumoto

发明人： Hitoshi Matsuura ,  Eiji Matsumoto

IPC分类号： G01B11/24 ,  B23Q35/128 ,  B23Q35/40 ,  G01B11/245

CPC分类号： B23Q35/128 ,  G05B2219/37425

摘要： A non-contact tracing control apparatus is disclosed which traces the surface of a model by using at least two optical distance detectors for detecting the distances therefrom to the model. When a first light corresponding to a first of the optical distance detectors is detecting a distance, a second light of another, second optical distance detector is either dimmed or shut off. Interference between more than one light reflected from the model and errors from, i.e., the first light reflected from the model incident on a second position sensor of the second optical distance detector can be avoided. The distances to a plurality of measurement points thus can be detected without interference even though the measurement points on the surface of the model are relatively close to one another.

摘要翻译： PCT No.PCT / JP90 / 01622 Sec。 371日期1991年8月13日 102（e）日期1991年8月13日PCT 1990年12月11日PCT PCT。 公开号WO91 / 08861 日期：1991年6月27日。公开了一种非接触跟踪控制装置，其通过使用至少两个光学距离检测器来跟踪模型的表面，以检测距离模型的距离。 当对应于第一光学距离检测器的第一光线正在检测距离时，另一个第二光学距离检测器的第二光被暗淡或切断。 可以避免从模型反射的多于一个的光和来自入射在第二光学距离检测器的第二位置传感器上的模型反射的第一光的误差之间的干扰。 即使模型表面上的测量点彼此相对接近，也可以无干扰地检测到多个测量点的距离。

公开(公告)号：US4054918A

公开(公告)日：1977-10-18

申请号：US534843

申请日：1974-12-20

申请人： Toshiro Kamogawa ,  Yoshifumi Teruuchi ,  Eiji Matsumoto ,  Akira Nishiyama

发明人： Toshiro Kamogawa ,  Yoshifumi Teruuchi ,  Eiji Matsumoto ,  Akira Nishiyama

IPC分类号： H04N3/38 ,  H04N5/84 ,  H04N9/11 ,  H04N3/36

CPC分类号： H04N3/38 ,  H04N5/843 ,  H04N9/11

摘要： There is provided an image reproduction system whereby a moving picture and a still picture can be selectively reproduced from a tape-shaped recording medium having images recorded thereon in sequential frames and which also enables simple and automatic frame aligning.

摘要翻译： 提供了一种图像再现系统，其中可以从具有在其上记录的图像的带状记录介质以连续的帧选择性地再现运动图像和静止图像，并且还能够进行简单和自动的帧对齐。

公开(公告)号：US09542586B2

公开(公告)日：2017-01-10

申请号：US13572972

申请日：2012-08-13

申请人： Eiji Matsumoto ,  Nobutaka Kikuiri ,  Hideo Tsuchiya

发明人： Eiji Matsumoto ,  Nobutaka Kikuiri ,  Hideo Tsuchiya

IPC分类号： G03F7/20 ,  G01N21/956 ,  G06K9/00 ,  H04N7/18 ,  G01B11/02 ,  G01N21/95 ,  H01L21/66 ,  G03F1/84

CPC分类号： G06K9/00 ,  G01B11/02 ,  G01B2210/56 ,  G01N21/95 ,  G01N21/95607 ,  G01N2021/95615 ,  G03F1/84 ,  G03F7/70616 ,  G03F7/707 ,  H01L22/00 ,  H01L2924/0002 ,  H04N7/18 ,  H01L2924/00

摘要： A pattern inspection method according to one aspect of the present invention includes generating a first positional deviation amount map by using data acquired by a pre-scan, generating a second positional deviation amount map by using data acquired by a full scan, generating a first positional deviation difference map by calculating a difference between the first positional deviation amount map and the second positional deviation amount map, generating a third positional deviation amount map from the first positional deviation difference map and the second positional deviation amount map, and judging existence of a value exceeding an allowable value, in values defined by the third positional deviation amount map.

摘要翻译： 根据本发明的一个方面的图案检查方法包括通过使用通过预扫描获取的数据来生成第一位置偏差量图，通过使用通过全扫描获取的数据产生第二位置偏差量图，产生第一位置 通过计算第一位置偏差量图和第二位置偏差量图之间的差来产生偏差差图，从第一位置偏差差图和第二位置偏差量图生成第三位置偏差量图，并且判断值的存在 超过第三位置偏差量图所定义的值的允许值。

公开(公告)号：US20160236368A1

公开(公告)日：2016-08-18

申请号：US14640413

申请日：2015-03-06

申请人： Eiji Matsumoto

发明人： Eiji Matsumoto

IPC分类号： B26D7/06 ,  B26D1/29

CPC分类号： B26D7/0641 ,  B26D1/29

摘要： A multiple vegetable cutting apparatus having a simple configuration, being easy to be assembled, which, as a single apparatus, can be used with the specification being varied, depending upon the vegetable type, and the cutting way, thus being economical. The multiple vegetable cutting apparatus includes a main body, supported by a base; a receiving tray, installed on the main body for receiving and discharging a vegetable cut; a dish-like rotating disk, disposed inside of top face of the receiving tray and having a blade for cutting vegetables fed; a driving unit, incorporated in the main body for rotation-driving the rotating disk; a cover, having an adapter receiver in a location corresponding to the rotating disk, and covering the receiving tray; and a vegetable charging adapter, set inside the adapter receiver, and having plural forms of vegetable charging parts corresponding to the vegetable types and/or the cutting ways.

摘要翻译： 具有简单结构，容易组装的多种蔬菜切割装置，其可以根据蔬菜类型和切割方式根据植物类型和切割方式而使用，其可以根据规格变化，因此是经济的。 多个蔬菜切割装置包括由基部支撑的主体; 接收托盘，安装在主体上，用于接收和卸下蔬菜切割; 盘状旋转盘，其设置在所述容纳托盘的顶面的内侧，并且具有用于切割蔬菜的刀片; 驱动单元，其结合在主体中用于旋转驱动旋转盘; 盖子，在对应于旋转盘的位置上具有适配器接收器，并覆盖接收盘; 以及设置在适配器接收器内的蔬菜充电适配器，并且具有对应于蔬菜类型和/或切割方式的多种形式的植物充电部件。

公开(公告)号：US20110063127A1

公开(公告)日：2011-03-17

申请号：US12735878

申请日：2009-01-29

申请人： Eiji Matsumoto ,  Tetsuo Shibata ,  Minoru Imai

发明人： Eiji Matsumoto ,  Tetsuo Shibata ,  Minoru Imai

IPC分类号： G08C15/00

CPC分类号： G01T7/00 ,  H04B7/155 ,  H04B7/2606 ,  H04W74/08 ,  H04W84/047

摘要： An exposure management system includes dosimeters, wireless relay devices that wirelessly communicate with the dosimeters, and a monitoring device. The dosimeters are carried by workers for measuring exposure doses in a radiation management facility. The wireless relay devices transmit a monitor indication message that requests the dosimeters to provide respective responses that include information of measured exposure doses. The wireless relay devices receive the responses from the dosimeters by using allocated respective communication channels that are different from each other. Each dosimeter receives the monitoring indication message and generates a designated number of response times for providing a response to the monitor indication message, and determines a communication channel corresponding to each of the generated response times. The monitoring device is connected to the wireless relay devices for monitoring an exposure state of each of the workers through the wireless relay devices and dosimeters.

摘要翻译： 曝光管理系统包括剂量计，与剂量计无线通信的无线中继设备和监视设备。 剂量计由工人承担，用于在辐射管理设施中测量暴露剂量。 无线中继设备发送监视器指示消息，其请求剂量计提供包括测量的暴露剂量的信息的相应响应。 无线中继设备通过使用彼此不同的分配的各个通信信道来接收来自剂量计的响应。 每个剂量计接收监视指示消息，并产生指定数量的响应时间，以便向监视器指示消息提供响应，并且确定对应于所产生的每个响应时间的通信信道。 监视装置连接到无线中继装置，用于通过无线中继装置和剂量计来监测每个工人的曝光状态。