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公开(公告)号:US08350586B2
公开(公告)日:2013-01-08
申请号:US12496946
申请日:2009-07-02
申请人: Shu-Ying Cho , Jiun-Kai Huang , Wen-Sheh Huang , Sally Liu
发明人: Shu-Ying Cho , Jiun-Kai Huang , Wen-Sheh Huang , Sally Liu
CPC分类号: G01R31/2846 , G01R31/27 , G01R31/2884 , Y10T29/49002
摘要: Provided is a method of de-embedding. The method includes forming a test structure having a device-under-test embedded therein, the test structure having left and right pads coupling the device-under-test, the device-under-test dividing the test structure into left and right half structures, the left and right half structures each having intrinsic transmission parameters; forming a plurality of dummy test structures, each dummy test structure including a left pad and a right pad; measuring transmission parameters of the test structure and the dummy test structures; and deriving intrinsic transmission parameters of the device-under-test using the intrinsic transmission parameters of the left and right half structures and the transmission parameters of the test structure and the dummy test structures.
摘要翻译: 提供了一种去嵌入的方法。 该方法包括形成具有嵌入其中的被测器件的测试结构,测试结构具有将测试器件耦合的左垫和右焊盘,被测器件分为测试结构和左半结构和右半结构, 每个都具有固有的传输参数的左,右半结构; 形成多个虚拟测试结构,每个虚拟测试结构包括左垫和右垫; 测量测试结构和虚拟测试结构的传输参数; 并使用左半结构和左半结构的固有传输参数以及测试结构和虚拟测试结构的传输参数导出待测器件的固有传输参数。
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公开(公告)号:US20110001504A1
公开(公告)日:2011-01-06
申请号:US12496946
申请日:2009-07-02
申请人: Shu-Ying Cho , Jiun-Kai Huang , Wen-Sheh Huang , Sally Liu
发明人: Shu-Ying Cho , Jiun-Kai Huang , Wen-Sheh Huang , Sally Liu
CPC分类号: G01R31/2846 , G01R31/27 , G01R31/2884 , Y10T29/49002
摘要: Provided is a method of de-embedding. The method includes forming a test structure having a device-under-test embedded therein, the test structure having left and right pads coupling the device-under-test, the device-under-test dividing the test structure into left and right half structures, the left and right half structures each having intrinsic transmission parameters; forming a plurality of dummy test structures, each dummy test structure including a left pad and a right pad; measuring transmission parameters of the test structure and the dummy test structures; and deriving intrinsic transmission parameters of the device-under-test using the intrinsic transmission parameters of the left and right half structures and the transmission parameters of the test structure and the dummy test structures.
摘要翻译: 提供了一种去嵌入的方法。 该方法包括形成具有嵌入其中的被测器件的测试结构,测试结构具有将测试器件耦合的左垫和右焊盘,被测器件分为测试结构和左半结构和右半结构, 每个都具有固有的传输参数的左,右半结构; 形成多个虚拟测试结构,每个虚拟测试结构包括左垫和右垫; 测量测试结构和虚拟测试结构的传输参数; 并使用左半结构和左半结构的固有传输参数以及测试结构和虚拟测试结构的传输参数来导出被测设备的固有传输参数。
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公开(公告)号:US08193880B2
公开(公告)日:2012-06-05
申请号:US12023184
申请日:2008-01-31
申请人: Shu-Ying Cho , Tzu-Jin Yeh , Sally Liu
发明人: Shu-Ying Cho , Tzu-Jin Yeh , Sally Liu
CPC分类号: H01P3/003 , H01P3/06 , H05K1/0219 , H05K1/0242 , H05K1/025 , H05K2201/09236 , H05K2201/09727 , H05K2201/09781
摘要: A semiconductor device for transmitting a radio frequency signal along a signal line includes a signal line that extends along a principal axis. On one side of the signal line is a first dielectric, and on the opposite side of the signal line is a second dielectric. First and second ground lines are proximate to the first and second dielectrics, respectively, and the ground lines are approximately parallel to the signal line. The device has a transverse cross-section that varies along the principal axis.
摘要翻译: 沿着信号线发送射频信号的半导体装置包括沿主轴延伸的信号线。 在信号线的一侧是第一电介质,信号线的相对侧是第二电介质。 第一和第二接地线分别靠近第一和第二电介质,并且接地线近似平行于信号线。 该装置具有沿主轴变化的横截面。
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公开(公告)号:US20090195327A1
公开(公告)日:2009-08-06
申请号:US12023184
申请日:2008-01-31
申请人: Shu-Ying Cho , Tzu-Jin Yeh , Sally Liu
发明人: Shu-Ying Cho , Tzu-Jin Yeh , Sally Liu
IPC分类号: H01P3/08
CPC分类号: H01P3/003 , H01P3/06 , H05K1/0219 , H05K1/0242 , H05K1/025 , H05K2201/09236 , H05K2201/09727 , H05K2201/09781
摘要: A semiconductor device for transmitting a radio frequency signal along a signal line includes a signal line that extends along a principal axis. On one side of the signal line is a first dielectric, and on the opposite side of the signal line is a second dielectric. First and second ground lines are proximate to the first and second dielectrics, respectively, and the ground lines are approximately parallel to the signal line. The device has a transverse cross-section that varies along the principal axis.
摘要翻译: 沿着信号线发送射频信号的半导体装置包括沿主轴延伸的信号线。 在信号线的一侧是第一电介质,信号线的相对侧是第二电介质。 第一和第二接地线分别靠近第一和第二电介质,并且接地线近似平行于信号线。 该装置具有沿主轴变化的横截面。
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公开(公告)号:US08609479B2
公开(公告)日:2013-12-17
申请号:US13595667
申请日:2012-08-27
申请人: Chia-Chung Chen , Chewn-Pu Jou , Chin Wei Kuo , Sally Liu
发明人: Chia-Chung Chen , Chewn-Pu Jou , Chin Wei Kuo , Sally Liu
IPC分类号: H01L21/02
CPC分类号: H01L29/93 , H01L29/7391 , H01L29/94
摘要: In at least one embodiment, a method of manufacturing a varactor includes forming a well over a substrate. The well has a first type doping. A first source region and a second source region are formed in the well, and the first source region and the second source region have a second type doping. A drain region is formed in the well, and the drain region has the first type doping. A first gate region is formed over the well between the drain region and the first source region. Moreover, a second gate region is formed over the well between the drain region and the second source region.
摘要翻译: 在至少一个实施例中,制造变容二极管的方法包括在衬底上形成阱。 该井具有第一种掺杂。 在阱中形成第一源极区域和第二源极区域,并且第一源极区域和第二源极区域具有第二类型掺杂。 在阱中形成漏极区,漏区具有第一类掺杂。 在漏极区域和第一源极区域之间的阱上形成第一栅极区域。 此外,在漏极区域和第二源极区域之间的阱之上形成第二栅极区域。
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公开(公告)号:US08471358B2
公开(公告)日:2013-06-25
申请号:US12791705
申请日:2010-06-01
申请人: Hsiao-Tsung Yen , Chin-Wei Kuo , Hsien-Pin Hu , Sally Liu , Ming-Fa Chen , Jhe-Ching Lu
发明人: Hsiao-Tsung Yen , Chin-Wei Kuo , Hsien-Pin Hu , Sally Liu , Ming-Fa Chen , Jhe-Ching Lu
IPC分类号: H01L27/08
CPC分类号: H01L23/5227 , H01F17/0013 , H01F27/2804 , H01L23/49822 , H01L2224/16225 , H01L2224/16227 , H01L2924/00014 , H01L2924/01322 , H01L2924/15311 , H01L2924/15321 , H01L2924/00 , H01L2224/0401
摘要: In accordance with an embodiment, a semiconductor device comprises a semiconductor die, an interposer, and conductive bumps bonding the semiconductor die to the interposer. The semiconductor die comprises a first metallization layer, and the first metallization layer comprises a first conductive pattern. The interposer comprises a second metallization layer, and the second metallization layer comprises a second conductive pattern. Some of the conductive bumps electrically couple the first conductive pattern to the second conductive pattern to form a coil. Other embodiments contemplate other configurations of coils, inductors, and/or transformers, and contemplate methods of manufacture.
摘要翻译: 根据实施例,半导体器件包括半导体管芯,插入件和将半导体管芯接合到插入件的导电凸块。 半导体管芯包括第一金属化层,第一金属化层包括第一导电图案。 插入器包括第二金属化层,并且第二金属化层包括第二导电图案。 一些导电凸块将第一导电图案电耦合到第二导电图案以形成线圈。 其他实施例考虑了线圈,电感器和/或变压器的其他配置,并考虑了制造方法。
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公开(公告)号:US20120104387A1
公开(公告)日:2012-05-03
申请号:US12915757
申请日:2010-10-29
申请人: Chia-Chung Chen , Chi-Feng Huang , Tse-Hua Lu , Sally Liu
发明人: Chia-Chung Chen , Chi-Feng Huang , Tse-Hua Lu , Sally Liu
IPC分类号: H01L23/544 , H01L29/92
CPC分类号: H01L23/5223 , H01L22/34 , H01L2924/0002 , H01L2924/00
摘要: A device includes a first MOM capacitor; a second MOM capacitor directly over and vertically overlapping the first MOM capacitor, wherein each of the first and the second MOM capacitors includes a plurality of parallel capacitor fingers; a first and a second port electrically coupled to the first MOM capacitor; and a third and a fourth port electrically coupled to the second MOM capacitor. The first, the second, the third, and the fourth ports are disposed at a surface of a respective wafer.
摘要翻译: 一种器件包括第一MOM电容器; 第二MOM电容器直接在第一MOM电容器上方并垂直重叠,其中第一和第二MOM电容器中的每一个包括多个并联电容指; 电耦合到第一MOM电容器的第一和第二端口; 以及电耦合到第二MOM电容器的第三和第四端口。 第一,第二,第三和第四端口设置在相应晶片的表面。
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公开(公告)号:US08115500B2
公开(公告)日:2012-02-14
申请号:US13015117
申请日:2011-01-27
申请人: Yih-Yuh Doong , Keh-Jeng Chang , Yuh-Jier Mii , Sally Liu , Lien Jung Hung , Victor Chih Yuan Chang
发明人: Yih-Yuh Doong , Keh-Jeng Chang , Yuh-Jier Mii , Sally Liu , Lien Jung Hung , Victor Chih Yuan Chang
IPC分类号: G01R31/28
CPC分类号: G01R31/2853 , G01R31/2884 , H01L22/34 , H01L2924/0002 , H01L2924/00
摘要: Test structures and methods for measuring contact and via parasitic capacitance in an integrated circuit are provided. The accuracy of contact and via capacitance measurements are improved by eliminating not-to-be-measured capacitance from the measurement results. The capacitance is measured on a target test structure that has to-be-measured contact or via capacitance. Measurements are then repeated on a substantially similar reference test structure that is free of to-be-measured contact or via capacitances. By using the capacitance measurements of the two test structures, the to-be-measured contact and via capacitance can be calculated.
摘要翻译: 提供了用于测量集成电路中的接触和通过寄生电容的测试结构和方法。 通过从测量结果中消除不被测量的电容,提高了接触和通孔电容测量的精度。 电容是在必须测量的接触或电容的目标测试结构上测量的。 然后在基本相似的参考测试结构上重复测量,该测试结构不受测量的接触或通过电容。 通过使用两个测试结构的电容测量,可以计算待测量的接触和通孔电容。
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公开(公告)号:US07966558B2
公开(公告)日:2011-06-21
申请号:US11424298
申请日:2006-06-15
CPC分类号: G06F3/0481 , G06F17/24 , G06Q10/107
摘要: Systems and methods for capturing content and performing operations associated with the content are described. A stylus or other pointing device may be used designate content to be captured. After content is designated, a new window is generated that includes the designated content and user interface elements for annotating, conveying or otherwise acting upon the designated content.
摘要翻译: 描述用于捕获内容并执行与内容相关联的操作的系统和方法。 可以使用触笔或其他指示装置来指定要捕获的内容。 在指定内容之后,生成包括指定内容和用户界面元素的新窗口,用于注释,传达或以其他方式对指定内容进行操作。
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公开(公告)号:US20120074515A1
公开(公告)日:2012-03-29
申请号:US12889650
申请日:2010-09-24
申请人: Chia-Chung Chen , Chewn-Pu Jou , Sally Liu
发明人: Chia-Chung Chen , Chewn-Pu Jou , Sally Liu
IPC分类号: H01L29/08
CPC分类号: H01L23/66 , H01L21/76224 , H01L21/76898 , H01L23/481 , H01L23/585 , H01L29/0619 , H01L2223/6616 , H01L2223/6666 , H01L2924/0002 , H01L2924/00
摘要: A device includes a substrate having a front surface and a back surface; an integrated circuit device at the front surface of the substrate; and a metal plate on the back surface of the substrate, wherein the metal plate overlaps substantially an entirety of the integrated circuit device. A guard ring extends into the substrate and encircles the integrated circuit device. The guard ring is formed of a conductive material. A through substrate via (TSV) penetrates through the substrate and electrically couples to the metal plate.
摘要翻译: 一种装置包括具有前表面和后表面的基板; 在基板的前表面上的集成电路器件; 以及在所述基板的背面上的金属板,其中所述金属板与所述集成电路器件的整体重叠。 保护环延伸到基板中并且环绕集成电路装置。 保护环由导电材料形成。 贯穿基板通孔(TSV)穿透基板并与金属板电耦合。
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