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公开(公告)号：US20090087573A1
公开(公告)日：2009-04-02
申请号：US12093702
申请日：2006-09-21
CPC分类号： C09D5/32 , C03C17/008 , C03C17/009 , C03C17/30 , C03C2217/445 , C03C2217/452 , C03C2217/475 , C03C2217/476 , C03C2217/485 , C03C2218/113 , C08K3/22 , C09D1/00 , C09D7/20 , C09D7/47 , C09D7/61 , C09D183/04
摘要： There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.
摘要翻译： 提供了一种基于热射线屏蔽膜的基底构件的制造方法，包括以下步骤：将通过使用三烷氧基硅烷或三烷氧基硅烷的起始原料形成的溶胶溶液与四烷氧基硅烷混合，加入锡掺杂的氧化铟 分散超细颗粒，制成处理剂; 以及将处理剂施加到基底构件上。 在该制造方法中，处理剂具有作为分散介质的沸点为100〜200℃的有机溶剂，通过使保持处理剂的部件与基材成为接触的方式进行涂布 或通过喷雾处理剂的方法，从而将待形成的膜的雾度值调节至0.5％以下。
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公开(公告)号：US20100143600A1
公开(公告)日：2010-06-10
申请号：US12598876
申请日：2008-04-28
CPC分类号： C09D1/00 , C03C1/008 , C03C17/25 , C03C2217/213 , C03C2218/113 , C09D183/04
摘要： A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.
摘要翻译： 一种用于获得溶胶 - 凝胶膜的涂布溶液，所述涂布溶液由固体物质和溶剂组成，所述固体物质包括通过使烷氧基硅烷在酸性水溶液中水解和缩聚得到的氧化硅低聚物; 溶剂包括沸点为100℃以上，粘度为3.5mPa·s以下的有机溶剂和酸水溶液，聚苯乙烯换算的氧化硅低聚物的数均分子量为500〜 4000，涂布溶液中固体成分的含量为8〜30重量％，固体成分中的氧化硅低聚物的含量为10重量％以上。
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3.发明申请Treatment For Forming Waterdrop Slidable Films And Process For Forming Waterdrop Slidable Films 审中-公开用于形成水滴滑动膜的处理和用于形成水滴可滑动膜的方法公开(公告)号：US20080026163A1
公开(公告)日：2008-01-31
申请号：US11630687
申请日：2005-08-01
IPC分类号： B05D1/38 , B05D3/06 , C08F283/12
CPC分类号： C03C17/3405 , C03C17/30 , C03C2217/76 , C03C2218/32 , C03C2218/33 , C08G77/24 , C08K5/5406 , C09D5/00 , C09D183/04 , C09D183/08 , C09D183/14 , C09K3/18
摘要： The present invention relates to a treatment agent for obtaining a water slidable film, which is obtained by mixing a straight-chain polydimethylsiloxane having two or three of hydrolysable functional groups at at least one end and having 30-400 of dimethylsiloxane units (Si(CH3)2O), a fluoroalkylsilane having a hydrolysable functional group and having 6-12 of fluorocarbon units (CF2 or CF3), and a solution containing an organic solvent, an acid and water. This treatment agent is characterized in that, based on the total amount of the treatment agent, in terms of weight concentration, 0.2-3.0 wt % of the straight-chain polydimethylsiloxane, 0.2-2.0 wt % of the fluoroalkylsilane, and 0.5-3.5 wt % of the total amount of the straight-chain polydimethylsiloxane and the fluoroalkylsilane are mixed together.
摘要翻译： 本发明涉及一种用于获得水滑动膜的处理剂，其通过在至少一端混合具有两个或三个可水解官能团的直链聚二甲基硅氧烷并具有30-400个二甲基硅氧烷单元（Si（CH 具有可水解官能团并且具有6-12个碳氟化合物单元的氟代烷基硅烷（CF 2 O 2或CF 3） 3N）和含有机溶剂，酸和水的溶液。 该处理剂的特征在于，基于处理剂的总量，以重量浓度计，0.2-3.0重量％的直链聚二甲基硅氧烷，0.2-2.0重量％的氟烷基硅烷和0.5-3.5重量％ 将直链聚二甲基硅氧烷和氟代烷基硅烷的总量的％混合在一起。
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公开(公告)号：US08216670B2
公开(公告)日：2012-07-10
申请号：US12377439
申请日：2007-08-22
CPC分类号： C09D183/06 , C03C1/008 , C03C17/008 , C03C17/009 , C03C2217/213 , C03C2217/231 , C03C2217/445 , C03C2217/475 , C03C2217/476 , C03C2217/485 , C03C2217/948 , C03C2218/113 , C08L83/04 , C09D1/00 , C09D5/004 , C09D5/24 , C09D183/04 , Y10T428/256 , Y10T428/259 , Y10T428/265 , Y10T428/31612
摘要： A heat ray shielding glass for vehicle, including a glass substrate and a heat ray shielding film formed on at least one surface of the glass substrate, in which the heat ray shielding film includes: conductive oxide ultrafine particles dispersed in the film; and a silica binder for binding the ultrafine particles to each other, the silica binder including solid contents produced by hydrolysis and polycondensation of tetraalkoxysilane and trialkoxysilane.
摘要翻译： 一种车辆用热线屏蔽玻璃，其特征在于，包括形成在所述玻璃基板的至少一个面上的玻璃基板和热射线屏蔽膜，其中，所述热射线屏蔽膜包括：分散在所述膜中的导电氧化物超微粒子; 以及用于将超细颗粒彼此粘合的二氧化硅粘合剂，所述二氧化硅粘合剂包括通过四烷氧基硅烷和三烷氧基硅烷的水解和缩聚产生的固体内容物。
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5.发明申请公开(公告)号：US20100227159A1
公开(公告)日：2010-09-09
申请号：US12377439
申请日：2007-08-22
CPC分类号： C09D183/06 , C03C1/008 , C03C17/008 , C03C17/009 , C03C2217/213 , C03C2217/231 , C03C2217/445 , C03C2217/475 , C03C2217/476 , C03C2217/485 , C03C2217/948 , C03C2218/113 , C08L83/04 , C09D1/00 , C09D5/004 , C09D5/24 , C09D183/04 , Y10T428/256 , Y10T428/259 , Y10T428/265 , Y10T428/31612
摘要： [Problems] To develop a heat ray shielding glass usable as a vehicle glass having up-and-down function, the heat ray shielding glass having a film hardness and generating no abnormal noise by friction due to up-and-down movement.[Means for Solving Problems] A heat ray shielding glass for vehicle, including a glass substrate and a heat ray shielding film formed on at least one surface of the glass substrate, in which the heat ray shielding film includes: conductive oxide ultrafine particles dispersed in the film; and a silica binder for binding the ultrafine particles to each other, the silica binder including solid contents produced by hydrolysis and polycondensation of tetraalkoxysilane and trialkoxysilane. In the heat ray shielding film, a ratio between the solid content made from the tetraalkoxysilane and the solid content made from the trialkoxysilane is within a range of from 55:45 to 85:15 on a weight percentage basis, and a ratio between the conductive oxide ultrafine particles and the silica binder is within a range of from 35:65 to 70:30 on a weight percentage basis.
摘要翻译： [问题]为了开发可用作具有上下功能的车辆玻璃的热射线屏蔽玻璃，该热射线屏蔽玻璃具有膜硬度并且由于上下运动而不产生由摩擦产生的异常噪声。 解决问题的手段一种车辆用热线屏蔽玻璃，其特征在于，包括形成在玻璃基板的至少一个面上的玻璃基板和热射线屏蔽膜，其中，所述热射线屏蔽膜包括：导电性氧化物超微粒分散在 这个电影; 以及用于将超细颗粒彼此粘合的二氧化硅粘合剂，所述二氧化硅粘合剂包括通过四烷氧基硅烷和三烷氧基硅烷的水解和缩聚产生的固体内容物。 在热射线屏蔽膜中，由四烷氧基硅烷制成的固体含量与由三烷氧基硅烷制成的固体含量之间的比例以重量百分数计为55:45至85:15，导电性 氧化物超细颗粒和二氧化硅粘合剂的重量百分数在35:65至70:30的范围内。
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公开(公告)号：US08299169B2
公开(公告)日：2012-10-30
申请号：US12598876
申请日：2008-04-28
CPC分类号： C09D1/00 , C03C1/008 , C03C17/25 , C03C2217/213 , C03C2218/113 , C09D183/04
摘要： A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.
摘要翻译： 一种用于获得溶胶 - 凝胶膜的涂布溶液，所述涂布溶液由固体物质和溶剂组成，所述固体物质包括通过使烷氧基硅烷在酸性水溶液中水解和缩聚得到的氧化硅低聚物; 溶剂包括沸点为100℃以上，粘度为3.5mPa·s以下的有机溶剂和酸水溶液，聚苯乙烯换算的氧化硅低聚物的数均分子量为500〜 4000，涂布溶液中固体成分的含量为8〜30重量％，固体成分中的氧化硅低聚物的含量为10重量％以上。
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公开(公告)号：US08246848B2
公开(公告)日：2012-08-21
申请号：US12093702
申请日：2006-09-21
IPC分类号： E04B1/74
CPC分类号： C09D5/32 , C03C17/008 , C03C17/009 , C03C17/30 , C03C2217/445 , C03C2217/452 , C03C2217/475 , C03C2217/476 , C03C2217/485 , C03C2218/113 , C08K3/22 , C09D1/00 , C09D7/20 , C09D7/47 , C09D7/61 , C09D183/04
摘要： There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.
摘要翻译： 提供了一种基于热射线屏蔽膜的基底构件的制造方法，包括以下步骤：将通过使用三烷氧基硅烷或三烷氧基硅烷的起始原料形成的溶胶溶液与四烷氧基硅烷混合，加入锡掺杂的氧化铟 分散超细颗粒，制成处理剂; 以及将处理剂施加到基底构件上。 在该制造方法中，处理剂具有作为分散介质的沸点为100〜200℃的有机溶剂，通过使保持处理剂的部件与基材成为接触的方式进行涂布 或通过喷雾处理剂的方法，从而将待形成的膜的雾度值调节至0.5％以下。
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公开(公告)号：US09478407B2
公开(公告)日：2016-10-25
申请号：US12912360
申请日：2010-10-26
申请人： Masanori Saito , Shinobu Arata , Takashi Saio , Soichi Kumon , Hidehisa Nanai , Yoshinori Akamatsu
发明人： Masanori Saito , Shinobu Arata , Takashi Saio , Soichi Kumon , Hidehisa Nanai , Yoshinori Akamatsu
IPC分类号： B08B3/08 , H01L21/02 , H01L21/027 , C11D1/00 , C11D1/04 , C11D1/40 , C11D11/00 , H01L21/306
CPC分类号： H01L21/02068 , C11D1/002 , C11D1/004 , C11D1/04 , C11D1/40 , C11D11/0047 , H01L21/02057 , H01L21/0212 , H01L21/027 , H01L21/306 , H01L21/31127
摘要： Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.
摘要翻译： 公开了一种用于在晶片上形成防水保护膜的液体化学品。 液体化学品是含有防水保护膜形成剂的液体化学品，用于形成防水保护膜，在清洁其表面上具有精细不均匀图案的晶片时，至少含有 至少一种选自钛，氮化钛，钨，铝，铜，锡，氮化钽，钌和硅的至少一种物质的不平坦图案的凹陷部分的表面的一部分，至少在 凹部。 液体化学品的特征在于防水保护膜形成剂是水不溶性表面活性剂。 在清洁步骤中，用液体化学品形成的防水保护膜能够防止晶片的图案塌陷。
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公开(公告)号：US08957005B2
公开(公告)日：2015-02-17
申请号：US12882898
申请日：2010-09-15
IPC分类号： C11D3/43 , H01L21/306 , H01L21/02
CPC分类号： C11D11/0047 , C11D7/30 , C11D7/3209 , C11D11/0064 , C11D11/007 , H01L21/02052
摘要： A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent.
摘要翻译： 硅晶片清洗剂至少包括一种水基清洗液，以及一种用于在清洁过程中至少在凹陷处向不均匀图案提供防水性的防水清洗液。 防水清洗液是由含有与硅晶片中的Si化学结合的反应性部分的疏水性组合物和疏水性基团构成的液体，或其中0.1质量％以上的水溶性化合物， 防水化合物相对于防水性清洗液和有机溶剂的总量的100质量％混合并包含在其中。 可以通过使用清洁剂来改善容易诱发图案塌陷的清洁方法。
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公开(公告)号：US20130056023A1
公开(公告)日：2013-03-07
申请号：US13698244
申请日：2011-05-11
申请人： Soichi Kumon , Takashi Saio , Shinobu Arata , Masanori Saito , Atsushi Ryokawa , Shuhei Yamada , Hidehisa Nanai , Yoshinori Akamatsu
发明人： Soichi Kumon , Takashi Saio , Shinobu Arata , Masanori Saito , Atsushi Ryokawa , Shuhei Yamada , Hidehisa Nanai , Yoshinori Akamatsu
CPC分类号： H01L21/02057 , C09D183/08 , H01L21/0206 , H01L21/302 , H01L21/3105
摘要： Disclosed is a liquid chemical for forming a water repellent protective film on a wafer that has at its surface a finely uneven pattern and contains silicon element at least at a part of the uneven pattern, the water repellent protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains: a silicon compound (A) represented by the general formula R1aSi(H)b(X)4−a−b and an acid; or a silicon compound (C) represented by the general formula R7gSi(H)h(CH3)w(Z)4−g−h−w and a base that contains no more than 35 mass % of water. The total amount of water in the liquid chemical is no greater than 1000 mass ppm relative to the total amount of the liquid chemical. The liquid chemical can improve a cleaning step that easily induces pattern collapse.
摘要翻译： 公开了一种用于在晶片上形成疏水性保护膜的液体化学品，其表面具有精细不均匀的图案，并且至少在不均匀图案的一部分处含有硅元素，所述防水保护膜至少形成在 在清洁晶片时凹凸图案的凹陷部分。 液体化学品包含：由通式R 1a a（H）b（X）4-a-b表示的硅化合物（A）和酸; 或由通式R7gSi（H）h（CH3）w（Z）4-g-h-w表示的硅化合物（C）和含有不超过35质量％的水的碱。 液体化学品中的水的总量相对于液体化学品的总量不超过1000质量ppm。 液体化学品可以改善易于引起图案塌陷的清洁步骤。
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