公开(公告)号：US4696758A

公开(公告)日：1987-09-29

申请号：US897236

申请日：1986-10-06

申请人： Stanford R. Ovshinsky ,  Subhendu Guha ,  Prem Nath ,  Chi Chung Yang ,  Jeffrey Fournier ,  James Kulman

发明人： Stanford R. Ovshinsky ,  Subhendu Guha ,  Prem Nath ,  Chi Chung Yang ,  Jeffrey Fournier ,  James Kulman

IPC分类号： H01L31/04 ,  H01L21/205 ,  C09K11/07

CPC分类号： H01L21/02422 ,  H01L21/02425 ,  H01L21/0245 ,  H01L21/02505 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262

摘要： Precursor gaseous mixtures from which to glow discharge deposit wide and narrow band gap semiconductor alloy material, said material characterized by improved photoconductivity and stability and improved resistance to photodegradation. There is also specifically disclosed a method of fabricating a narrow band gap semiconductor which method does not suffer from the effects of differential depletion of the components of the precursor gaseous mixture.

公开(公告)号：US4698234A

公开(公告)日：1987-10-06

申请号：US897449

申请日：1986-10-17

申请人： Stanford R. Ovshinsky ,  Subhendu Guha ,  Prem Nath ,  Chi C. Yang ,  Jeffrey Fournier ,  James Kulman

发明人： Stanford R. Ovshinsky ,  Subhendu Guha ,  Prem Nath ,  Chi C. Yang ,  Jeffrey Fournier ,  James Kulman

IPC分类号： H01L31/04 ,  H01L21/205 ,  B05D3/06

CPC分类号： H01L21/02422 ,  H01L21/02425 ,  H01L21/0245 ,  H01L21/02505 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262

摘要： Precursor gaseous mixtures from which to glow discharge deposit wide and narrow band gap semiconductor alloy material, said material characterized by improved photoconductivity and stability and improved resistance to photodegradation. There is also specifically disclosed a method of fabricating a narrow band gap semiconductor which method does not suffer from the effects of differential depletion of the components of the precursor gaseous mixture.

摘要翻译： 用于辉光放电的前体气体混合物沉积宽而窄的带隙半导体合金材料，所述材料的特征在于改善的光电导率和稳定性以及改善的抗光降解性。 还具体公开了制造窄带隙半导体的方法，该方法不会受到前体气体混合物的组分的不均匀耗尽的影响。

公开(公告)号：US4637895A

公开(公告)日：1987-01-20

申请号：US718661

申请日：1985-04-01

申请人： Stanford R. Ovshinsky ,  Subhendu Guha ,  Prem Nath ,  Chi C. Yang ,  Jeffrey Fournier ,  James Kulman

发明人： Stanford R. Ovshinsky ,  Subhendu Guha ,  Prem Nath ,  Chi C. Yang ,  Jeffrey Fournier ,  James Kulman

IPC分类号： H01L31/04 ,  H01L21/205 ,  C09K11/07

CPC分类号： H01L21/02422 ,  H01L21/02425 ,  H01L21/0245 ,  H01L21/02505 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262

摘要： Precursor gaseous mixtures from which to glow discharge deposit wide and narrow band gap semiconductor alloy material, said material characterized by improved photoconductivity and stability and improved resistance to photodegradation. There is also specifically disclosed a method of fabricating a narrow band gap semiconductor which method does not suffer from the effects of differential depletion of the components of the precursor gaseous mixture.

摘要翻译： 用于辉光放电的前体气体混合物沉积宽而窄的带隙半导体合金材料，所述材料的特征在于改善的光电导率和稳定性以及改善的抗光降解性。 还具体公开了制造窄带隙半导体的方法，该方法不会受到前体气体混合物的组分的不均匀耗尽的影响。

公开(公告)号：US20070164267A1

公开(公告)日：2007-07-19

申请号：US11334504

申请日：2006-01-19

申请人： Isamu Asano ,  Natsuki Sato ,  Wolodymyr Czubatyj ,  Jeffrey Fournier

发明人： Isamu Asano ,  Natsuki Sato ,  Wolodymyr Czubatyj ,  Jeffrey Fournier

IPC分类号： H01L29/06 ,  H01L21/00

CPC分类号： H01L45/06 ,  H01L27/2436 ,  H01L45/1233 ,  H01L45/126 ,  H01L45/144 ,  H01L45/1625

摘要： A non-volatile memory element comprises a bottom electrode 12; a top electrode 15; and a recording layer 13 containing phase change material and a block layer 14 that can block phase change of the recording layer 13, provided between the bottom electrode 12 and the top electrode 15. The block layer 14 is constituted of material having an electrical resistance that is higher than that of material constituting the recording layer 13. The block layer 14 suppresses the radiation of heat towards the top electrode 15 and greatly limits the phase change region when a write current is applied. The result is a high heating efficiency. The top electrode 15 itself can be used to constitute a bit line, or a separate bit line can be provided.

摘要翻译： 非易失性存储元件包括底部电极12; 顶部电极15; 以及包含相变材料的记录层13和可以阻挡设置在底部电极12和顶部电极15之间的记录层13的相变的阻挡层14.阻挡层14由具有电阻的材料构成， 比构成记录层13的材料高。阻挡层14抑制向顶部电极15的热辐射，并且在施加写入电流时极大地限制相变区域。 结果是高的加热效率。 顶部电极15本身可以用于构成位线，或者可以提供单独的位线。