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    Lithographic apparatus and device manufacturing method
    1.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07224440B2

    公开(公告)日：2007-05-29

    申请号：US11019525

    申请日：2004-12-23

    申请人： Stefan Geerte Kruijswijk ,  Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Heine Melle Mulder

    发明人： Stefan Geerte Kruijswijk ,  Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Heine Melle Mulder

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70108 ,  G03F7/70275

    摘要： A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.

    摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统; 图案形成装置，其被配置成图案化所述辐射束以形成图案化的辐射束; 以及投影系统，被配置为将图案化的辐射束投影到基板上。 光学组件包括在辐射源和图案形成装置之间二维布置的多个光学元件，以产生辐射束的预定角度分布。 为了提高辐射束的均匀性，光学元件从具有不同形状和/或尺寸的预定数量的光学元件中选择。

    Lithographic apparatus and method for reducing stray radiation
    3.
    发明授权
    Lithographic apparatus and method for reducing stray radiation 有权
    用于减少杂散辐射的平版印刷设备和方法

    公开(公告)号：US09188881B2

    公开(公告)日：2015-11-17

    申请号：US13376761

    申请日：2010-05-04

    申请人： Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Van Greevenbroek ,  Antonie Hendrik Verweij

    发明人： Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Van Greevenbroek ,  Antonie Hendrik Verweij

    IPC分类号： G03B27/72 ,  G03F7/20

    CPC分类号： G03F7/70941 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70283

    摘要： A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.

    摘要翻译： 光刻设备包括用于提供极紫外辐射束的照明系统，用于通过辐射束控制图案形成装置的照明的掩模装置，用于支撑图案形成装置的支撑件，所述图案形成装置被配置成赋予 辐射束的图案，用于保持基板的基板台，以及用于将图案化的辐射束投影到基板的目标部分上的投影系统。 掩模装置包括掩模刀片，该掩模刀片包括被配置为限定图案形成装置上的照明区域的边界的掩模边缘。 遮蔽刀片被配置为反射入射在掩蔽刀片上的极紫外辐射，使得反射辐射的至少一部分不被投影系统捕获。

    Lithographic apparatus and device manufacturing method
    5.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07333178B2

    公开(公告)日：2008-02-19

    申请号：US11139990

    申请日：2005-05-31

    申请人： Marcel Mathijs Theodore Marie Dierichs ,  Hako Botma ,  Markus Franciscus Antonius Eurlings

    发明人： Marcel Mathijs Theodore Marie Dierichs ,  Hako Botma ,  Markus Franciscus Antonius Eurlings

    IPC分类号： G03B27/54 ,  G03B27/42

    CPC分类号： G03F7/70191 ,  G03F7/70075 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/702

    摘要： A lithographic apparatus includes an illumination system including a field faceted mirror including a plurality of field facets and configured to receive radiation from a radiation source and form a plurality of images of the radiation source on corresponding pupil facets of a pupil faceted mirror. Each of the field facets is configured to provide an illumination slit at a level of a patterning device. The illumination slits are summed together at the level of the patterning device to illuminate the patterning device. First blades are configured to block radiation from a radiation source and each first blade is selectively actuable to cover a portion of a selectable number of field facets. The field faceted mirror further comprises partial field facets, the partial field facets being configured to produce a partial illumination slit at the level of the patterning device, and the pupil faceted mirror further includes pupil facets corresponding to the partial field facets. The partial field facets are configured to produce an illumination slit that is summed with the summed illumination slits of the field facets and/or correct for non-uniformity in the summed illumination slits of the field facets. Second blades are selectively actuable to cover a portion of a selectable number of partial field facets.

    摘要翻译： 光刻设备包括照明系统，该照明系统包括包括多个场面的场分面反射镜，并且被配置为从辐射源接收辐射并且在瞳孔面镜的相应光瞳面上形成辐射源的多个图像。 每个场面被配置为在图案形成装置的水平面上提供照明狭缝。 照明狭缝在图案形成装置的水平面相加在一起，以照亮图案形成装置。 第一刀片被配置为阻挡来自辐射源的辐射，并且每个第一刀片可选择性地致动以覆盖可选择数量的场面的一部分。 场分面镜还包括部分场面，部分场面被配置为在图案形成装置的高度处产生局部照明狭缝，并且瞳孔面镜还包括对应于部分场面的光瞳面。 部分场面被配置为产生与场面的相加的照明狭缝相加的照明狭缝和/或校正场面的相加的照明狭缝中的不均匀性。 第二刀片可选择性地致动以覆盖可选数量的部分场面的一部分。

    LITHOGRAPHIC APPARATUS AND METHOD FOR REDUCING STRAY RADIATION
    6.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD FOR REDUCING STRAY RADIATION 有权
    光栅设备和减少辐射辐射的方法

    公开(公告)号：US20120075610A1

    公开(公告)日：2012-03-29

    申请号：US13376761

    申请日：2010-05-04

    申请人： Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Van Greevenbroek ,  Antonie Hendrik Verweij

    发明人： Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Van Greevenbroek ,  Antonie Hendrik Verweij

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70941 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70283

    摘要： A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.

    摘要翻译： 光刻设备包括用于提供极紫外辐射束的照明系统，用于通过辐射束控制图案形成装置的照明的掩模装置，用于支撑图案形成装置的支撑件，所述图案形成装置被配置成赋予 辐射束的图案，用于保持基板的基板台，以及用于将图案化的辐射束投影到基板的目标部分上的投影系统。 掩模装置包括掩模刀片，该掩模刀片包括被配置为限定图案形成装置上的照明区域的边界的掩模边缘。 遮蔽刀片被配置为反射入射在掩蔽刀片上的极紫外辐射，使得反射辐射的至少一部分不被投影系统捕获。

    Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby
    7.
    发明授权
    Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby 有权
    辐射系统，光刻设备，器件制造方法和由此制造的器件

    公开(公告)号：US07113261B2

    公开(公告)日：2006-09-26

    申请号：US10862819

    申请日：2004-06-08

    申请人： Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Olav Waldemar Vladimir Frijns

    发明人： Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Olav Waldemar Vladimir Frijns

    IPC分类号： G03B27/74 ,  G03B27/68 ,  G03B27/42 ,  G01B11/00

    CPC分类号： G03F7/70141

    摘要： A radiation system includes a radiation generator to generate radiation, a source, and an illumination system configured to receive the radiation and provide a beam of radiation. The illumination system includes a beam measuring system configured measure at least one of position and tilt of the beam of radiation relative to the illumination system and a projecting device configured to redirect only a part of a cross section of the beam of radiation to the beam measuring system. The beam measuring system may include several position sensors, the readouts of which can be used to determine incorrect alignment of the radiation source with respect to the illumination system. Diaphragms are connected to the collector of the radiation generator, so that in addition to X, Y, and Z corrections, Rx, Ry and Rz corrections are possible.

    摘要翻译： 辐射系统包括用于产生辐射的辐射发生器，源和被配置为接收辐射并提供辐射束的照明系统。 所述照明系统包括：束测量系统，被配置为测量所述辐射束相对于所述照明系统的位置和倾斜中的至少一个;以及投影装置，其被配置为仅将所述辐射束的横截面的一部分重定向到所述光束测量 系统。 光束测量系统可以包括几个位置传感器，其读出可用于确定辐射源相对于照明系统的不正确对准。 隔膜连接到辐射发生器的收集器，因此除了X，Y和Z校正之外，Rx，Ry和Rz校正是可能的。