-
公开(公告)号:US20170269482A1
公开(公告)日:2017-09-21
申请号:US15453049
申请日:2017-03-08
申请人: Stichting VU , Universiteit van Amsterdam , Stichting voor Fundamenteel Onderzoek der Materie , ASML Netherlands B.V.
IPC分类号: G03F7/20 , G01B11/00 , G01N21/956 , G01N21/47
CPC分类号: G03F7/7065 , G01B11/00 , G01N21/4788 , G01N21/956 , G01N2201/061 , G01N2201/0635 , G02B21/16 , G03F7/70625 , G03F7/70633 , H05G2/003 , H05G2/008
摘要: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.
-
公开(公告)号:US10459347B2
公开(公告)日:2019-10-29
申请号:US15453049
申请日:2017-03-08
摘要: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.
-