公开(公告)号：US20170032983A1

公开(公告)日：2017-02-02

申请号：US15220653

申请日：2016-07-27

申请人： TOKYO ELECTRON LIMITED

发明人： Koshi MUTA ,  Tsuyoshi MORIYA ,  Takuya MORI ,  Kazuhiro TAKESHITA ,  Tomonori ESAKI ,  Kouichi MIZUNAGA ,  Masataka TANAKA ,  Kouzou KANAGAWA ,  Keigo NAKANO

IPC分类号： H01L21/67 ,  G03F7/16

CPC分类号： G03F7/16 ,  G03F7/168 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/67748

摘要： A thermal catalytic layer is formed on the inner surface of a processing container and heated. Thus, when a sublimate sublimated from a coating film on a wafer W and received within the processing container reaches the vicinity of the thermal catalytic layer, the sublimate is decomposed and removed by the thermal activation of the thermal catalytic layer. In removing a sublimate attached to a light transmission window, a cleaning substrate formed with the thermal catalytic layer on the surface thereof is carried into the processing container and caused to approach the light transmission window. Thereafter, the cleaning substrate is heated so that the sublimate attached to the surface of the light transmission window is removed.

摘要翻译： 在处理容器的内表面上形成热催化剂层并加热。 因此，当从晶片W上的涂膜升华并接收在处理容器内的升华达到热催化层附近时，通过热催化层的热活化来分解和去除升华。 在移除附着在透光窗口上的升华中，在其表面上形成有热催化层的清洁基板被运送到处理容器中并使其接近透光窗。 此后，加热清洁基板，使得附着在透光窗的表面上的升华被去除。

公开(公告)号：US20160163560A1

公开(公告)日：2016-06-09

申请号：US14957164

申请日：2015-12-02

申请人： TOKYO ELECTRON LIMITED

发明人： Tomonori ESAKI ,  Shinichiro KAWAKAMI ,  Takashi YAMAUCHI

IPC分类号： H01L21/3105 ,  H01L21/31

CPC分类号： H01L21/0271 ,  H01L21/31138 ,  H01L21/67178 ,  H01L21/67748

摘要： There is provided a method of processing a substrate using a block copolymer composed of a first polymer containing an oxygen atom and a second polymer containing no oxygen atom, the method including: coating the block copolymer onto the substrate on which a predetermined pattern is formed; phase-separating the block copolymer into the first polymer and the second polymer; and heating the substrate in a low oxygen atmosphere to selectively remove the first polymer from the phase-separated block copolymer.

摘要翻译： 提供了使用由含有氧原子的第一聚合物和不含氧原子的第一聚合物构成的嵌段共聚物来处理基板的方法，该方法包括：将嵌段共聚物涂布到其上形成有规定图案的基板上; 将嵌段共聚物相分离成第一聚合物和第二聚合物; 并在低氧气氛中加热该衬底以选择性地从相分离的嵌段共聚物中除去第一种聚合物。