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公开(公告)号:US09791789B2
公开(公告)日:2017-10-17
申请号:US15307797
申请日:2015-04-17
发明人: Ming Zhang , Yu Zhu , Fan Zhi , Rong Cheng , Kaiming Yang , Zhao Liu , Li Zhang , Huichao Qin , Yanpo Zhao , Li Tian , Weinan Ye , Jin Zhang , Wensheng Yin , Haihua Mu , Jinchun Hu
IPC分类号: G03F7/20
CPC分类号: G03F7/70758 , G03F7/20 , G03F7/70716 , G03F7/70766 , G03F7/70775
摘要: A magnetically suspended coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100), a balance mass (200), a drive motor, a mask plate (101), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
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公开(公告)号:US09904183B2
公开(公告)日:2018-02-27
申请号:US15307752
申请日:2015-04-17
发明人: Yu Zhu , Ming Zhang , Fan Zhi , Zhao Liu , Rong Cheng , Kaiming Yang , Li Zhang , Huichao Qin , Yanpo Zhao , Li Tian , Weinan Ye , Jin Zhang , Wensheng Yin , Haihua Mu , Jinchun Hu
IPC分类号: G03F7/20
CPC分类号: G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70766 , G03F7/70775
摘要: A coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100) of the reticle stage, a balance mass (200), a drive motor, a mask plate (101, 102), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
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公开(公告)号:US09903704B2
公开(公告)日:2018-02-27
申请号:US14900111
申请日:2014-06-05
申请人: TSINGHUA UNIVERSITY
发明人: Yu Zhu , Leijie Wang , Ming Zhang , Zhao Liu , Rong Cheng , Kaiming Yang , Dengfeng Xu , Weinan Ye , Li Zhang , Yanpo Zhao , Huichao Qin , Li Tian , Jin Zhang , Wensheng Yin , Haihua Mu , Jinchun Hu
CPC分类号: G01B9/02007 , G01B9/02003 , G01B9/02021 , G01B9/02022 , G01B9/02027 , G01B11/14 , G01B2290/70
摘要: A three-DOF (Degree of Freedom) heterodyne grating interferometer displacement measurement system comprises a dual-frequency laser, a grating interferometer, a measurement grating, receivers and an electronic signal processing component; the grating interferometer comprises a polarizing beam splitter, a reference grating and dioptric elements; the measurement system realizes displacement measurement on the basis of grating diffraction, the optical Doppler Effect and the optical beat frequency principle. Three linear displacements can be output by the system when the grating interferometer and the measurement grating perform a three-DOF linear relative motion. The measurement system can reach sub-nanometer and higher resolution and precision, and can simultaneously measure three linear displacements. The measurement system has the advantages of being environmentally insensitive, high in measurement precision, small in size, light in weight, and is capable of improving the overall performances of an ultra-precision stage of a lithography machine as a position measurement system for this stage.
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