公开(公告)号：US08956458B2

公开(公告)日：2015-02-17

申请号：US14001797

申请日：2011-08-31

申请人： Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun ,  Takahiro Ito

发明人： Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun ,  Takahiro Ito

IPC分类号： C23C16/00 ,  H01L21/02 ,  C01B33/027 ,  C01B33/029 ,  C23C16/24 ,  C23C16/452 ,  C23C16/455

CPC分类号： H01L21/0262 ,  C01B33/027 ,  C01B33/029 ,  C23C16/24 ,  C23C16/452 ,  C23C16/45561 ,  H01L21/0237 ,  H01L21/02532

摘要： A vapor deposition device includes a vapor deposition chamber, a heating chamber, a mixing chamber, a first reservoir for storing trichlorosilane gas, and a second reservoir for storing silane gas that reacts with hydrochloric acid gas. The heating chamber communicates with the first reservoir and the mixing chamber, heats the trichlorosilane gas and then supplies the heated gas to the mixing chamber. The mixing chamber communicates with the second reservoir and the vapor deposition chamber, mixes the heated gas supplied from the heating chamber and the silane gas and then supplies the mixed gas to the vapor deposition chamber. A temperature in the heating chamber is higher than a temperature in the mixing chamber.

摘要翻译： 气相沉积装置包括蒸镀室，加热室，混合室，用于储存三氯硅烷气体的第一储存器和用于储存与盐酸气体反应的硅烷气体的第二储存器。 加热室与第一储存器和混合室连通，加热三氯硅烷气体，然后将加热的气体供应到混合室。 混合室与第二储存器和气相沉积室连通，将从加热室供应的加热气体与硅烷气体混合，然后将混合气体供应到气相沉积室。 加热室中的温度高于混合室中的温度。

公开(公告)号：US08703590B2

公开(公告)日：2014-04-22

申请号：US13642973

申请日：2010-12-08

申请人： Takahiro Ito ,  Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun

发明人： Takahiro Ito ,  Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun

IPC分类号： H01L21/20

CPC分类号： H01L21/0262 ,  C23C16/24 ,  C30B29/06 ,  C30B33/06 ,  H01L21/0237 ,  H01L21/02389 ,  H01L21/02532

摘要： A process for supplying a mixed material gas that includes a chlorosilane gas and a carrier gas to a surface of a substrate heated at 1200 to 1400° C. from a direction perpendicular to the surface is provided. A supply rate of the chlorosilane gas is equal to or more than 200 μmol per minute per 1 cm2 of the surface of the substrate. The carrier gas includes a hydrogen gas and at least one or more gases selected from argon, xenon, krypton and neon.

摘要翻译： 提供了一种从垂直于表面的方向向包含氯硅烷气体和载气的混合材料气体供给到加热到1200至1400℃的基板的表面的方法。 氯硅烷气体的供给速度等于或大于200μmol/分钟/ 1cm 2的基材表面。 载气包括氢气和选自氩，氙，氪和氖的至少一种或多种气体。

公开(公告)号：US08497217B2

公开(公告)日：2013-07-30

申请号：US13151081

申请日：2011-06-01

申请人： Takahiro Ito ,  Kenji Nakashima

发明人： Takahiro Ito ,  Kenji Nakashima

IPC分类号： H01L21/205

CPC分类号： C23C16/4411 ,  C23C16/24 ,  C23C16/4401 ,  C23C16/4488 ,  C23C16/45589 ,  C23C16/4585 ,  C30B25/14 ,  C30B29/06 ,  H01L21/02381 ,  H01L21/02532 ,  H01L21/0262

摘要： A film forming apparatus and a film forming method for suppressing a drop in the film forming speed caused by-product gas are provided. A film forming apparatus for forming a film on a wafer includes a chamber in which the wafer is located; a gas introducing member configured to introduce raw material gas into the chamber, in which the raw material gas turning into by-product gas and a substance which adheres to the surface of the wafer by reacting at a surface of the wafer; and a reverse reaction member configured to generate the raw material gas by causing the by-product gas to react in the chamber.

摘要翻译： 提供了一种用于抑制造成副产品气体的成膜速度下降的成膜装置和成膜方法。 用于在晶片上形成膜的成膜装置包括晶片所在的室; 气体导入部件，其将原料气体引入所述室内，原料气体转化为副产物气体;以及物质，其通过在所述晶片的表面反应而附着于所述晶片的表面; 以及反作用构件，其被配置为通过使副产物气体在室中反应而产生原料气体。

公开(公告)号：US20130008610A1

公开(公告)日：2013-01-10

申请号：US13636874

申请日：2011-03-17

申请人： Yu Yan Jiang ,  Masahide Inagaki ,  Kenji Nakashima ,  Soichiro Makino ,  Nariaki Horinouchi ,  Takahiro Ito

发明人： Yu Yan Jiang ,  Masahide Inagaki ,  Kenji Nakashima ,  Soichiro Makino ,  Nariaki Horinouchi ,  Takahiro Ito

IPC分类号： B05C13/02 ,  C23C16/458

CPC分类号： C23C16/45508 ,  C23C16/45504 ,  C23C16/45587 ,  C23C16/45597

摘要： A surface treatment apparatus in which a disk-like sample-holding plate is provided inside an enclosure constituting a cylindrical circumferential wall. A cylindrical portion in an upper portion of the enclosure constitutes a material fluid supplying channel, and a channel provided on the lateral side of the sample-holding plate in the enclosure and shaped spreading as it goes farther from the cylindrical portion constitutes a fluid discharge channel. The fluid discharge channel employs a parabola curve or the like in which the position of the upper end of the outmost circumference of the sample-holding plate is defined as a focus position and the position of the upper end of the outlet that is symmetrically opposite to the focus position is defined as a reference position.

摘要翻译： 一种表面处理装置，其中盘形样品保持板设置在构成圆柱形周壁的外壳的内部。 外壳的上部的圆筒部分构成材料流体供给通道，并且设置在外壳中的样品保持板的侧面上的通道，并且随着与圆柱形部分更远的形状扩散，构成流体排出通道 。 流体排出通道使用抛物线曲线等，其中将样品保持板的最外周的上端的位置定义为聚焦位置，并且出口的上端的位置对称地相对于 焦点位置被定义为参考位置。

公开(公告)号：US09243326B2

公开(公告)日：2016-01-26

申请号：US13636874

申请日：2011-03-17

申请人： Yu Yan Jiang ,  Masahide Inagaki ,  Kenji Nakashima ,  Soichiro Makino ,  Nariaki Horinouchi ,  Takahiro Ito

发明人： Yu Yan Jiang ,  Masahide Inagaki ,  Kenji Nakashima ,  Soichiro Makino ,  Nariaki Horinouchi ,  Takahiro Ito

IPC分类号： C23C16/455

CPC分类号： C23C16/45508 ,  C23C16/45504 ,  C23C16/45587 ,  C23C16/45597

摘要： A surface treatment apparatus in which a disk-like sample-holding plate is provided inside an enclosure constituting a cylindrical circumferential wall. A cylindrical portion in an upper portion of the enclosure constitutes a material fluid supplying channel, and a channel provided on the lateral side of the sample-holding plate in the enclosure and shaped spreading as it goes farther from the cylindrical portion constitutes a fluid discharge channel. The fluid discharge channel employs a parabola curve or the like in which the position of the upper end of the outmost circumference of the sample-holding plate is defined as a focus position and the position of the upper end of the outlet that is symmetrically opposite to the focus position is defined as a reference position.

摘要翻译： 一种表面处理装置，其中盘形样品保持板设置在构成圆柱形周壁的外壳的内部。 外壳的上部的圆筒部分构成材料流体供给通道，并且设置在外壳中的样品保持板的侧面上的通道，并且随着与圆柱形部分更远的形状扩散，构成流体排出通道 。 流体排出通道使用抛物线曲线等，其中将样品保持板的最外周的上端的位置定义为聚焦位置，并且出口的上端的位置对称地相对于 焦点位置被定义为参考位置。

公开(公告)号：US20140038395A1

公开(公告)日：2014-02-06

申请号：US14001797

申请日：2011-08-31

申请人： Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun ,  Takahiro Ito

发明人： Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun ,  Takahiro Ito

IPC分类号： C23C16/24 ,  H01L21/02

CPC分类号： H01L21/0262 ,  C01B33/027 ,  C01B33/029 ,  C23C16/24 ,  C23C16/452 ,  C23C16/45561 ,  H01L21/0237 ,  H01L21/02532

摘要： A vapor deposition device includes a vapor deposition chamber, a heating chamber, a mixing chamber, a first reservoir for storing trichlorosilane gas, and a second reservoir for storing silane gas that reacts with hydrochloric acid gas. The heating chamber communicates with the first reservoir and the mixing chamber, heats the trichlorosilane gas and then supplies the heated gas to the mixing chamber. The mixing chamber communicates with the second reservoir and the vapor deposition chamber, mixes the heated gas supplied from the heating chamber and the silane gas and then supplies the mixed gas to the vapor deposition chamber. A temperature in the heating chamber is higher than a temperature in the mixing chamber.

摘要翻译： 气相沉积装置包括蒸镀室，加热室，混合室，用于储存三氯硅烷气体的第一储存器和用于储存与盐酸气体反应的硅烷气体的第二储存器。 加热室与第一储存器和混合室连通，加热三氯硅烷气体，然后将加热的气体供应到混合室。 混合室与第二储存器和气相沉积室连通，将从加热室供应的加热气体与硅烷气体混合，然后将混合气体供应到气相沉积室。 加热室中的温度高于混合室中的温度。

公开(公告)号：US20130040441A1

公开(公告)日：2013-02-14

申请号：US13642973

申请日：2010-12-08

申请人： Takahiro Ito ,  Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun

发明人： Takahiro Ito ,  Takahiro Kozawa ,  Kenji Nakashima ,  Keeyoung Jun

IPC分类号： H01L21/20

CPC分类号： H01L21/0262 ,  C23C16/24 ,  C30B29/06 ,  C30B33/06 ,  H01L21/0237 ,  H01L21/02389 ,  H01L21/02532

摘要： A process for supplying a mixed material gas that includes a chlorosilane gas and a carrier gas to a surface of a substrate heated at 1200 to 1400° C. from a direction perpendicular to the surface is provided. A supply rate of the chlorosilane gas is equal to or more than 200 μmol per minute per 1 cm2 of the surface of the substrate. The carrier gas includes a hydrogen gas and at least one or more gases selected from argon, xenon, krypton and neon.

摘要翻译： 提供了一种从垂直于表面的方向向包含氯硅烷气体和载气的混合材料气体供给到加热到1200至1400℃的基板的表面的方法。 氯硅烷气体的供给速度等于或大于200μmol/分钟/ 1cm 2的基材表面。 载气包括氢气和选自氩，氙，氪和氖的至少一种或多种气体。

公开(公告)号：US07815545B2

公开(公告)日：2010-10-19

申请号：US11347299

申请日：2006-02-06

申请人： Kenji Nakashima ,  Masaaki Uchida ,  Yoshinobu Kawamoto

发明人： Kenji Nakashima ,  Masaaki Uchida ,  Yoshinobu Kawamoto

IPC分类号： F16H61/32

CPC分类号： B60W30/18018 ,  B60W10/02 ,  B60W10/06 ,  B60W10/107 ,  F16H61/66 ,  F16H2061/661 ,  F16H2312/14 ,  Y10T477/69365 ,  Y10T477/6939 ,  Y10T477/75

摘要： An automatic transmission hydraulic control apparatus includes an oil pump driven by an engine, a forward clutch arranged to be engaged by an engagement pressure from the oil pump at a start of the vehicle, a hydraulic pressure sensing section configured to sense a hydraulic pressure in the automatic transmission, a filling start judging section configured to judge a start of filling to the forward clutch in accordance with the sensed hydraulic pressure; and an engagement pressure control section configured to control the engagement pressure to go through a filling phase and an engagement phase. The engagement pressure control section shifts from the filling phase to the engagement phase when a predetermined time elapses from the judgment of the start of the filling to the forward clutch.

摘要翻译： 一种自动变速器液压控制装置，包括由发动机驱动的油泵，前置离合器，其布置成在车辆起动时通过来自油泵的接合压力接合;液压感测部，其构造成感测在所述油压 自动变速器，填充开始判定部，其根据感测到的液压判断向前方离合器的开始开始; 以及接合压力控制部，被配置为控制所述接合压力经​​过填充阶段和接合阶段。 当从开始填充到前进离合器的判断经过预定时间时，接合压力控制部分从填充阶段转移到接合阶段。

公开(公告)号：US06936484B2

公开(公告)日：2005-08-30

申请号：US10618085

申请日：2003-07-14

申请人： Masakazu Kanechika ,  Kenji Nakashima ,  Yasuichi Mitsushima ,  Tetsu Kachi

发明人： Masakazu Kanechika ,  Kenji Nakashima ,  Yasuichi Mitsushima ,  Tetsu Kachi

IPC分类号： H01L21/265 ,  H01L21/3065 ,  H01L21/308 ,  H01L21/335 ,  H01L21/8242 ,  H01L29/06 ,  H01L29/76 ,  H01L29/788 ,  H01L21/00

CPC分类号： H01L21/26506 ,  H01L21/26566 ,  H01L21/3065 ,  H01L21/3086 ,  H01L27/10864 ,  H01L29/0657 ,  H01L29/66439 ,  H01L29/7613 ,  H01L29/7888

摘要： An impurity precipitation region is formed by introducing an impurity, e.g., oxygen, into a silicon substrate or a silicon layer and thermally treating it, and performing high selectivity anisotropic etching with the precipitation region used as a micro mask. Thus, a cone (conic body or truncated conic body having an annular leading end) having a very sharp and slender needle shape with an aspect ratio of about 10 and a diameter of about 10 nm to 30 nm in the vicinity of its leading end is obtained with the micro mask used as the top. By forming an insulation layer and a drive electrode such as a gate electrode around the cone, the cone can be used for a field emission device, a single electron transistor, a memory device, a high frequency switching device, a probe of a scanning type microscope or the like.

摘要翻译： 通过将诸如氧的杂质引入到硅衬底或硅层中并对其进行热处理并且使用用作微掩模的沉淀区进行高选择性各向异性蚀刻来形成杂质析出区。 因此，在其前端附近具有纵横比为约10和直径约10nm至30nm的非常锋利且细长的针形的锥体（圆锥体或具有环形前端的截头圆锥体） 用微型掩模作为顶部获得。 通过在锥体周围形成绝缘层和诸如栅电极的驱动电极，锥体可用于场致发射器件，单电子晶体管，存储器件，高频开关器件，扫描型探针 显微镜等。

公开(公告)号：US06474428B1

公开(公告)日：2002-11-05

申请号：US09691062

申请日：2000-10-19

申请人： Masato Fujikawa ,  Yasuo Sumi ,  Kenji Nakashima

发明人： Masato Fujikawa ,  Yasuo Sumi ,  Kenji Nakashima

IPC分类号： B60K100

CPC分类号： B60K6/365 ,  B60K6/383 ,  B60K6/40 ,  B60K6/405 ,  B60K6/48 ,  B60K6/547 ,  B60L11/14 ,  B60L2270/40 ,  F16H3/66 ,  F16H3/725 ,  H02K7/006 ,  Y02T10/6221 ,  Y02T10/641 ,  Y02T10/70 ,  Y02T10/7077 ,  Y10S903/903 ,  Y10S903/906 ,  Y10S903/909 ,  Y10S903/91 ,  Y10S903/913 ,  Y10S903/919 ,  Y10S903/951 ,  Y10S903/952

摘要： An electric torque converter mounted on a parallel hybrid vehicle employing a parallel hybrid system, using both an internal combustion engine and an electric motor for propulsion, includes an electric motor generator, and a composition-and-distribution mechanism located between the engine and a transmission for mechanically combining torque produced by the engine and torque produced by the motor generator with each other and for mechanically distributing the torque produced by the engine into the motor generator and a transmission input shaft. A converter case of the electric torque converter has a first casing member partitioning the transmission from the electric torque converter, a second casing member located between the engine and the transmission for partitioning the electric torque converter from the exterior, and a third casing member partitioning the motor generator from the composition-and-distribution mechanism. The third casing member has a large-diameter portion fixed to the first casing member, a medium-diameter portion housing therein the composition-and-distribution mechanism and placing therearound a motor generator rotor so that part of the motor generator rotor overlaps with the composition-and-distribution mechanism in a radial direction, and a small-diameter portion whose inner periphery rotatably supports a motor generator rotor support arranged coaxially with the transmission input shaft.

摘要翻译： 一种使用并联混合动力系统的并联混合动力车辆的电力变矩器，其使用内燃机和用于推进的电动机，包括电动发电机和位于发动机和变速器之间的组合和分配机构 用于机械地组合由发动机产生的扭矩和由电动发电机产生的扭矩彼此并且将由发动机产生的扭矩机械地分配到电动发电机和变速器输入轴中。 电动液力变矩器的转换器壳体具有分隔来自电力变矩器的变速器的第一壳体构件，位于发动机和变速器之间的第二壳体构件，用于将电力变矩器与外部分隔开;第三壳体构件， 电动发电机组成分配机制。 第三壳体构件具有固定到第一壳体构件的大直径部分，容纳组合和分配机构的中等直径部分，并且围绕电动发电机转子放置，使得电动发电机转子的一部分与组合物重叠 以及小径部，其内周部可旋转地支撑与变速器输入轴同轴配置的电动发电机转子支承部。