公开(公告)号：US07989902B2

公开(公告)日：2011-08-02

申请号：US12487248

申请日：2009-06-18

申请人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Vijay Narayanan

发明人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Vijay Narayanan

IPC分类号： H01L29/76 ,  H01L29/94 ,  H01L31/062 ,  H01L31/113 ,  H01L31/119

CPC分类号： H01L21/28088 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/518 ,  H01L29/665 ,  H01L29/6659 ,  H01L29/7833

摘要： A stack of a high-k gate dielectric and a metal gate structure includes a lower metal layer, a scavenging metal layer, and an upper metal layer. The scavenging metal layer meets the following two criteria 1) a metal (M) for which the Gibbs free energy change of the reaction Si+2/y MxOy→2x/y M+SiO2 is positive 2) a metal that has a more negative Gibbs free energy per oxygen atom for formation of oxide than the material of the lower metal layer and the material of the upper metal layer. The scavenging metal layer meeting these criteria captures oxygen atoms as the oxygen atoms diffuse through the gate electrode toward the high-k gate dielectric. In addition, the scavenging metal layer remotely reduces the thickness of a silicon oxide interfacial layer underneath the high-k dielectric. As a result, the equivalent oxide thickness (EOT) of the total gate dielectric is reduced and the field effect transistor maintains a constant threshold voltage even after high temperature processes during CMOS integration.

摘要翻译： 高k栅极电介质和金属栅极结构的堆叠包括下部金属层，清除金属层和上部金属层。 清除金属层满足以下两个标准：1）反应Si + 2 / y MxOy→2x / y M + SiO2的吉布斯自由能变化为正的金属（M）2）具有更负的金属 每个氧原子吉布斯自由能用于形成氧化物，而不是下金属层的材料和上金属层的材料。 符合这些标准的清除金属层随着氧原子通过栅电极向高k栅极电介质扩散而捕获氧原子。 此外，清除金属层远远地降低了高k电介质下面的氧化硅界面层的厚度。 结果，即使在CMOS积分期间的高温处理之后，总栅极电介质的等效氧化物厚度（EOT）减小，并且场效应晶体管保持恒定的阈值电压。

公开(公告)号：US20100187610A1

公开(公告)日：2010-07-29

申请号：US12359520

申请日：2009-01-26

申请人： Unoh Kwon ,  Siddarth A. Krishnan ,  Takashi Ando ,  Michael P. Chudzik ,  Martin M. Frank ,  William K. Henson ,  Rashmi Jha ,  Yue Liang ,  Vijay Narayanan ,  Ravikumar Ramachandran ,  Keith Kwong Hon Wong

发明人： Unoh Kwon ,  Siddarth A. Krishnan ,  Takashi Ando ,  Michael P. Chudzik ,  Martin M. Frank ,  William K. Henson ,  Rashmi Jha ,  Yue Liang ,  Vijay Narayanan ,  Ravikumar Ramachandran ,  Keith Kwong Hon Wong

IPC分类号： H01L29/78 ,  H01L21/3205

CPC分类号： H01L21/823842 ,  H01L21/28088 ,  H01L21/823807 ,  H01L21/823857 ,  H01L29/1054 ,  H01L29/4966 ,  H01L29/517

摘要： A semiconductor device includes: a semiconductor substrate; a PFET formed on the substrate, the PFET includes a SiGe layer disposed on the substrate, a high-K dielectric layer disposed on the SiGe layer, a first metallic layer disposed on the high-k dielectric layer, a first intermediate layer disposed on the first metallic layer, a second metallic layer disposed on the first intermediate layer, a second intermediate layer disposed on the second metallic layer, and a third metallic layer disposed on the second intermediate layer; an NFET formed on the substrate, the NFET includes the high-k dielectric layer, the high-k dielectric layer being disposed on the substrate, the second intermediate layer, the second intermediate layer being disposed on the high-k dielectric layer, and the third metallic layer, the third metallic layer being disposed on the second intermediate layer. Alternatively, the first metallic layer is omitted. A method to fabricate the device includes providing SiO2 and alpha-silicon layers or a dBARC layer.

摘要翻译： 半导体器件包括：半导体衬底; 形成在衬底上的PFET，PFET包括设置在衬底上的SiGe层，设置在SiGe层上的高K电介质层，设置在高k电介质层上的第一金属层，设置在第一中间层上的第一中间层 第一金属层，设置在第一中间层上的第二金属层，设置在第二金属层上的第二中间层和设置在第二中间层上的第三金属层; 形成在衬底上的NFET，NFET包括高k电介质层，高k电介质层设置在衬底上，第二中间层，第二中间层设置在高k电介质层上，并且 第三金属层，第三金属层设置在第二中间层上。 或者，省略第一金属层。 制造该器件的方法包括提供SiO 2和α-硅层或dBARC层。

公开(公告)号：US20130032886A1

公开(公告)日：2013-02-07

申请号：US13195316

申请日：2011-08-01

申请人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Unoh Kwon ,  Vijay Narayanan

发明人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Unoh Kwon ,  Vijay Narayanan

IPC分类号： H01L27/092 ,  H01L21/8238

CPC分类号： H01L27/0922 ,  H01L21/823807 ,  H01L29/16 ,  H01L29/161 ,  H01L29/42364 ,  H01L29/4966 ,  H01L29/517

摘要： A structure has a semiconductor substrate and an nFET and a pFET disposed upon the substrate. The pFET has a semiconductor SiGe channel region formed upon or within a surface of the semiconductor substrate and a gate dielectric having an oxide layer overlying the channel region and a high-k dielectric layer overlying the oxide layer. A gate electrode overlies the gate dielectric and has a lower metal layer abutting the high-k layer, a scavenging metal layer abutting the lower metal layer, and an upper metal layer abutting the scavenging metal layer. The metal layer scavenges oxygen from the substrate (nFET) and SiGe (pFET) interface with the oxide layer resulting in an effective reduction in Tinv and Vt of the pFET, while scaling Tiny and maintaining Vt for the nFET, resulting in the Vt of the pFET becoming closer to the Vt of a similarly constructed nFET with scaled Tinv values.

摘要翻译： 结构具有半导体衬底以及设置在衬底上的nFET和pFET。 pFET具有形成在半导体衬底的表面上或其表面上的半导体SiGe沟道区，以及覆盖沟道区的氧化物层和覆盖氧化物层的高k电介质层的栅极电介质。 栅电极覆盖在栅极电介质上，并且具有邻接高k层的下金属层，邻接下金属层的清除金属层和与清除金属层邻接的上金属层。 金属层清除了衬底（nFET）中的氧和与氧化物层的SiGe（pFET）界面，导致pFET的Tinv和Vt有效降低，同时缩小Tiny并维持nFET的Vt，导致Vt pFET变得更接近具有缩放Tinv值的类似构造的nFET的Vt。

公开(公告)号：US20100320547A1

公开(公告)日：2010-12-23

申请号：US12487248

申请日：2009-06-18

申请人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Vijay Narayanan

发明人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Vijay Narayanan

IPC分类号： H01L29/78 ,  H01L21/314 ,  H01L21/336

CPC分类号： H01L21/28088 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/518 ,  H01L29/665 ,  H01L29/6659 ,  H01L29/7833

摘要： A stack of a high-k gate dielectric and a metal gate structure includes a lower metal layer, a scavenging metal layer, and an upper metal layer. The scavenging metal layer meets the following two criteria 1) a metal (M) for which the Gibbs free energy change of the reaction Si+2/y MxOy→2x/y M+SiO2 is positive 2) a metal that has a more negative Gibbs free energy per oxygen atom for formation of oxide than the material of the lower metal layer and the material of the upper metal layer. The scavenging metal layer meeting these criteria captures oxygen atoms as the oxygen atoms diffuse through the gate electrode toward the high-k gate dielectric. In addition, the scavenging metal layer remotely reduces the thickness of a silicon oxide interfacial layer underneath the high-k dielectric. As a result, the equivalent oxide thickness (EOT) of the total gate dielectric is reduced and the field effect transistor maintains a constant threshold voltage even after high temperature processes during CMOS integration.

摘要翻译： 高k栅极电介质和金属栅极结构的堆叠包括下部金属层，清除金属层和上部金属层。 清除金属层满足以下两个标准：1）反应Si + 2 / y MxOy→2x / y M + SiO2的吉布斯自由能变化为正的金属（M）2）具有更负的金属 每个氧原子吉布斯自由能用于形成氧化物，而不是下金属层的材料和上金属层的材料。 符合这些标准的清除金属层随着氧原子通过栅电极向高k栅极电介质扩散而捕获氧原子。 此外，清除金属层远远地降低了高k电介质下面的氧化硅界面层的厚度。 结果，即使在CMOS积分期间的高温处理之后，总栅极电介质的等效氧化物厚度（EOT）减小，并且场效应晶体管保持恒定的阈值电压。

公开(公告)号：US07838908B2

公开(公告)日：2010-11-23

申请号：US12359520

申请日：2009-01-26

申请人： Unoh Kwon ,  Siddarth A. Krishnan ,  Takashi Ando ,  Michael P. Chudzik ,  Martin M. Frank ,  William K. Henson ,  Rashmi Jha ,  Yue Liang ,  Vijay Narayanan ,  Ravikumar Ramachandran ,  Keith Kwong Hon Wong

发明人： Unoh Kwon ,  Siddarth A. Krishnan ,  Takashi Ando ,  Michael P. Chudzik ,  Martin M. Frank ,  William K. Henson ,  Rashmi Jha ,  Yue Liang ,  Vijay Narayanan ,  Ravikumar Ramachandran ,  Keith Kwong Hon Wong

IPC分类号： H01L27/10

CPC分类号： H01L21/823842 ,  H01L21/28088 ,  H01L21/823807 ,  H01L21/823857 ,  H01L29/1054 ,  H01L29/4966 ,  H01L29/517

摘要： A semiconductor device includes: a semiconductor substrate; a PFET formed on the substrate, the PFET includes a SiGe layer disposed on the substrate, a high-K dielectric layer disposed on the SiGe layer, a first metallic layer disposed on the high-k dielectric layer, a first intermediate layer disposed on the first metallic layer, a second metallic layer disposed on the first intermediate layer, a second intermediate layer disposed on the second metallic layer, and a third metallic layer disposed on the second intermediate layer; an NFET formed on the substrate, the NFET includes the high-k dielectric layer, the high-k dielectric layer being disposed on the substrate, the second intermediate layer, the second intermediate layer being disposed on the high-k dielectric layer, and the third metallic layer, the third metallic layer being disposed on the second intermediate layer. Alternatively, the first metallic layer is omitted. A method to fabricate the device includes providing SiO2 and alpha-silicon layers or a dBARC layer.

摘要翻译： 半导体器件包括：半导体衬底; 形成在衬底上的PFET，PFET包括设置在衬底上的SiGe层，设置在SiGe层上的高K电介质层，设置在高k电介质层上的第一金属层，设置在第一中间层上的第一中间层 第一金属层，设置在第一中间层上的第二金属层，设置在第二金属层上的第二中间层和设置在第二中间层上的第三金属层; 形成在衬底上的NFET，NFET包括高k电介质层，高k电介质层设置在衬底上，第二中间层，第二中间层设置在高k电介质层上，并且 第三金属层，第三金属层设置在第二中间层上。 或者，省略第一金属层。 制造该器件的方法包括提供SiO 2和α-硅层或dBARC层。

公开(公告)号：US08853751B2

公开(公告)日：2014-10-07

申请号：US13614962

申请日：2012-09-13

申请人： Takashi Ando ,  Martin M. Frank ,  Vijay Narayanan

发明人： Takashi Ando ,  Martin M. Frank ,  Vijay Narayanan

IPC分类号： H01L29/772 ,  H01L29/78 ,  H01L21/8234

CPC分类号： H01L21/823462 ,  H01L21/28255 ,  H01L21/28264 ,  H01L21/82345 ,  H01L29/1054 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/518 ,  H01L29/66477 ,  H01L29/665 ,  H01L29/66522

摘要： A semiconductor structure includes a high mobility semiconductor, an interfacial oxide layer, a high dielectric constant (high-k) layer, a stack, a gate electrode, and a gate dielectric. The stack comprises a lower metal layer, a scavenging metal layer comprising a scavenging metal, and an upper metal layer formed on the scavenging metal layer. A Gibbs free energy change of a chemical reaction, in which an atom constituting the high mobility semiconductor layer that directly contacts the interfacial oxide layer combines with a metal oxide material comprising the scavenging metal and oxygen to form the scavenging metal in elemental form and oxide of the atom constituting the high mobility semiconductor layer that directly contacts the interfacial oxide layer, is positive.

摘要翻译： 半导体结构包括高迁移率半导体，界面氧化物层，高介电常数（高k）层，堆叠，栅极电极和栅极电介质。 堆叠包括下金属层，包含清除金属的清除金属层和形成在扫气金属层上的上金属层。 化学反应的吉布斯自由能变化，其中构成直接与界面氧化物层接触的高迁移率半导体层的原子与包含清除金属和氧的金属氧化物材料结合，以形成元素形式的清除金属和氧化物 构成与界面氧化物层直接接触的高迁移率半导体层的原子为正。

公开(公告)号：US08865551B2

公开(公告)日：2014-10-21

申请号：US13536764

申请日：2012-06-28

申请人： Takashi Ando ,  Martin M. Frank ,  Vijay Narayanan

发明人： Takashi Ando ,  Martin M. Frank ,  Vijay Narayanan

IPC分类号： H01L29/772 ,  H01L29/78 ,  H01L21/8234

CPC分类号： H01L21/823462 ,  H01L21/28255 ,  H01L21/28264 ,  H01L21/82345 ,  H01L29/1054 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/518 ,  H01L29/66477 ,  H01L29/665 ,  H01L29/66522

摘要： A high mobility semiconductor layer is formed over a semiconductor substrate. An interfacial oxide layer is formed over the high mobility semiconductor layer. A high dielectric constant (high-k) dielectric layer is formed over the interfacial oxide layer. A stack is formed over the high-k dielectric layer. The stack comprises a lower metal layer, a scavenging metal layer comprising a scavenging metal, and an upper metal layer formed on the scavenging metal layer. A Gibbs free energy change of a chemical reaction, in which an atom constituting the high mobility semiconductor layer that directly contacts the interfacial oxide layer combines with a metal oxide material comprising the scavenging metal and oxygen to form the scavenging metal in elemental form and oxide of the atom constituting the high mobility semiconductor layer that directly contacts the interfacial oxide layer, is positive. A gate electrode and a gate dielectric are formed.

摘要翻译： 在半导体衬底上形成高迁移率半导体层。 在高迁移率半导体层上形成界面氧化物层。 在界面氧化物层上形成高介电常数（high-k）介电层。 堆叠形成在高k电介质层上。 堆叠包括下金属层，包含清除金属的清除金属层和形成在扫气金属层上的上金属层。 化学反应的吉布斯自由能变化，其中构成直接与界面氧化物层接触的高迁移率半导体层的原子与包含清除金属和氧的金属氧化物材料结合，以形成元素形式的清除金属和氧化物 构成与界面氧化物层直接接触的高迁移率半导体层的原子为正。 形成栅极电极和栅极电介质。

公开(公告)号：US20110207280A1

公开(公告)日：2011-08-25

申请号：US13099790

申请日：2011-05-03

申请人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Vijay Narayanan

发明人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Vijay Narayanan

IPC分类号： H01L21/336

CPC分类号： H01L21/28088 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/518 ,  H01L29/665 ,  H01L29/6659 ,  H01L29/7833

摘要： A stack of a high-k gate dielectric and a metal gate structure includes a lower metal layer, a scavenging metal layer, and an upper metal layer. The scavenging metal layer meets the following two criteria 1) a metal (M) for which the Gibbs free energy change of the reaction Si+2/y MxOy→2x/y M+SiO2 is positive 2) a metal that has a more negative Gibbs free energy per oxygen atom for formation of oxide than the material of the lower metal layer and the material of the upper metal layer. The scavenging metal layer meeting these criteria captures oxygen atoms as the oxygen atoms diffuse through the gate electrode toward the high-k gate dielectric. In addition, the scavenging metal layer remotely reduces the thickness of a silicon oxide interfacial layer underneath the high-k dielectric. As a result, the equivalent oxide thickness (EOT) of the total gate dielectric is reduced and the field effect transistor maintains a constant threshold voltage even after high temperature processes during CMOS integration.

摘要翻译： 高k栅极电介质和金属栅极结构的堆叠包括下部金属层，清除金属层和上部金属层。 清除金属层满足以下两个标准：1）反应Si + 2 / y MxOy→2x / y M + SiO2的吉布斯自由能变化为正的金属（M）2）具有更负的金属 每个氧原子吉布斯自由能用于形成氧化物，而不是下金属层的材料和上金属层的材料。 符合这些标准的清除金属层随着氧原子通过栅电极向高k栅极电介质扩散而捕获氧原子。 此外，清除金属层远远地降低了高k电介质下面的氧化硅界面层的厚度。 结果，即使在CMOS积分期间的高温处理之后，总栅极电介质的等效氧化物厚度（EOT）减小，并且场效应晶体管保持恒定的阈值电压。

公开(公告)号：US08367496B2

公开(公告)日：2013-02-05

申请号：US13099790

申请日：2011-05-03

申请人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Vijay Narayanan

发明人： Takashi Ando ,  Changhwan Choi ,  Martin M. Frank ,  Vijay Narayanan

IPC分类号： H01L21/8238

CPC分类号： H01L21/28088 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/518 ,  H01L29/665 ,  H01L29/6659 ,  H01L29/7833

摘要： A stack of a high-k gate dielectric and a metal gate structure includes a lower metal layer, a scavenging metal layer, and an upper metal layer. The scavenging metal layer meets the following two criteria 1) a metal (M) for which the Gibbs free energy change of the reaction Si+2/y MxOy→2x/y M+SiO2 is positive 2) a metal that has a more negative Gibbs free energy per oxygen atom for formation of oxide than the material of the lower metal layer and the material of the upper metal layer. The scavenging metal layer meeting these criteria captures oxygen atoms as the oxygen atoms diffuse through the gate electrode toward the high-k gate dielectric. In addition, the scavenging metal layer remotely reduces the thickness of a silicon oxide interfacial layer underneath the high-k dielectric. As a result, the equivalent oxide thickness (EOT) of the total gate dielectric is reduced and the field effect transistor maintains a constant threshold voltage even after high temperature processes during CMOS integration.

摘要翻译： 高k栅极电介质和金属栅极结构的堆叠包括下部金属层，清除金属层和上部金属层。 清除金属层满足以下两个标准：1）反应Si + 2 / y MxOy→2x / y M + SiO2的吉布斯自由能变化为正的金属（M）2）具有更负的金属 每个氧原子吉布斯自由能用于形成氧化物，而不是下金属层的材料和上金属层的材料。 符合这些标准的清除金属层随着氧原子通过栅电极向高k栅极电介质扩散而捕获氧原子。 此外，清除金属层远远地降低了高k电介质下面的氧化硅界面层的厚度。 结果，即使在CMOS积分期间的高温处理之后，总栅极电介质的等效氧化物厚度（EOT）减小，并且场效应晶体管保持恒定的阈值电压。

公开(公告)号：US08786030B2

公开(公告)日：2014-07-22

申请号：US13570388

申请日：2012-08-09

申请人： Takashi Ando ,  Kisik Choi ,  Vijay Narayanan ,  Tenko Yamashita ,  Junli Wang

发明人： Takashi Ando ,  Kisik Choi ,  Vijay Narayanan ,  Tenko Yamashita ,  Junli Wang

IPC分类号： H01L21/02

CPC分类号： H01L29/517 ,  H01L21/28079 ,  H01L21/28088 ,  H01L29/4958 ,  H01L29/4966 ,  H01L29/66545

摘要： A quarter-gap p-type field effect transistor (PFET) formed by gate-last fabrication includes a gate stack formed on a silicon substrate, the gate stack including: a high-k dielectric layer located on the silicon substrate; and a gate metal layer located over the high-k dielectric layer, the gate metal layer including titanium nitride and having a thickness of about 20 angstroms; and a metal contact formed over the gate stack. A quarter-gap n-type field effect transistor (NFET) formed by gate-last fabrication includes a gate stack formed on a silicon substrate, the gate stack including: a high-k dielectric layer located on the silicon substrate; and a first gate metal layer located over the high-k dielectric layer, the first gate metal layer including titanium nitride; and a metal contact formed over the gate stack.

摘要翻译： 通过栅极最终制造形成的四分之一间隙p型场效应晶体管（PFET）包括形成在硅衬底上的栅极堆叠，所述栅极堆叠包括：位于硅衬底上的高k电介质层; 以及位于高k电介质层上方的栅极金属层，所述栅极金属层包括氮化钛并且具有约20埃的厚度; 以及形成在栅极堆叠上的金属接触。 通过栅极最后制造形成的四分之一间隙n型场效应晶体管（NFET）包括形成在硅衬底上的栅极堆叠，该栅极堆叠包括：位于硅衬底上的高k电介质层; 以及位于所述高k电介质层上方的第一栅极金属层，所述第一栅极金属层包括氮化钛; 以及形成在栅极堆叠上的金属接触。