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20 条记录 (耗时 0.021 秒)

    Charged particle beam apparatus
    2.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US20060076489A1

    公开(公告)日：2006-04-13

    申请号：US11196399

    申请日：2005-08-04

    申请人： Takashi Ohshima ,  Mitsugu Sato ,  Soichi Katagiri

    发明人： Takashi Ohshima ,  Mitsugu Sato ,  Soichi Katagiri

    IPC分类号： G21K7/00

    CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/0268 ,  H01J2237/04756 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/188 ,  H01J2237/24465 ,  H01J2237/2611 ,  H01J2237/31749

    摘要： A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, and a detector for secondary electrons is located inside the drift tube. This solves the problem associated with the provision of a secondary electron detector, which heretofore has been a bottleneck in making a subminiature high-resolution SEM column.

    摘要翻译： 使用静电透镜作为主聚焦元件以获得超小型高灵敏度高分辨率SEM的带电粒子束装置，用于电子束的漂移管位于电子源和样品之间的列内，并且 用于二次电子的检测器位于漂移管内。 这解决了与提供二次电子检测器相关的问题，这种二次电子检测器迄今已成为制造超小型高分辨率SEM柱的瓶颈。

    Small electron gun
    3.
    发明申请
    Small electron gun 有权
    小电子枪

    公开(公告)号：US20050052103A1

    公开(公告)日：2005-03-10

    申请号：US10873358

    申请日：2004-06-23

    申请人： Soichi Katagiri ,  Takashi Ohshima

    发明人： Soichi Katagiri ,  Takashi Ohshima

    IPC分类号： H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J37/073 ,  H01J41/20

    CPC分类号： H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J2237/022 ,  H01J2237/062 ,  H01J2237/06316 ,  H01J2237/1825 ,  H01J2237/188

    摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

    摘要翻译： 提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。 由非蒸发式吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或 用于非蒸发吸气泵的复合气体。 通过使用电子枪发射电子的高度和宽度约为15cm的小型电子枪，可以保持10 -10乇的高真空压力，而不需要离子泵。

    Small electron gun
    4.
    发明申请
    Small electron gun 审中-公开

    公开(公告)号：US20070236143A1

    公开(公告)日：2007-10-11

    申请号：US11806196

    申请日：2007-05-30

    申请人： Soichi Katagiri ,  Takashi Ohshima

    发明人： Soichi Katagiri ,  Takashi Ohshima

    IPC分类号： H01J17/24

    CPC分类号： H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J2237/022 ,  H01J2237/062 ,  H01J2237/06316 ,  H01J2237/1825 ,  H01J2237/188

    摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

    Small electron gun
    5.
    发明授权
    Small electron gun 有权
    小电子枪

    公开(公告)号：US08232712B2

    公开(公告)日：2012-07-31

    申请号：US12461195

    申请日：2009-08-04

    申请人： Soichi Katagiri ,  Takashi Ohshima

    发明人： Soichi Katagiri ,  Takashi Ohshima

    IPC分类号： G01N23/225

    CPC分类号： H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J2237/022 ,  H01J2237/062 ,  H01J2237/06316 ,  H01J2237/1825 ,  H01J2237/188

    摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

    摘要翻译： 提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。 由非蒸发式吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或 用于非蒸发吸气泵的复合气体。 通过使用电子枪发射电子的高度和宽度约为15cm的小型电子枪，可以保持10-10托的高真空压力，而不需要离子泵。

    Small electron gun
    6.
    发明申请
    Small electron gun 有权
    小电子枪

    公开(公告)号：US20090289186A1

    公开(公告)日：2009-11-26

    申请号：US12461195

    申请日：2009-08-04

    申请人： Soichi Katagiri ,  Takashi Ohshima

    发明人： Soichi Katagiri ,  Takashi Ohshima

    IPC分类号： G01N23/225

    CPC分类号： H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J2237/022 ,  H01J2237/062 ,  H01J2237/06316 ,  H01J2237/1825 ,  H01J2237/188

    摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 1010 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

    摘要翻译： 提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。 由非蒸发式吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或 用于非蒸发吸气泵的复合气体。 在电子枪发射电子的同时，通过使用高度和宽度约为15cm的小型电子枪，可以保持1010Torr的高真空压力，而不需要离子泵。

    Small electron gun
    7.
    发明授权
    Small electron gun 有权
    小电子枪

    公开(公告)号：US07238939B2

    公开(公告)日：2007-07-03

    申请号：US10873358

    申请日：2004-06-23

    申请人： Soichi Katagiri ,  Takashi Ohshima

    发明人： Soichi Katagiri ,  Takashi Ohshima

    IPC分类号： H01J37/18

    CPC分类号： H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J2237/022 ,  H01J2237/062 ,  H01J2237/06316 ,  H01J2237/1825 ,  H01J2237/188

    摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

    摘要翻译： 提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。 由非蒸发吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或 用于非蒸发吸气泵的复合气体。 通过使用高度和宽度约为15cm的小型电子枪，在从电子枪发射电子的同时，可以保持高10 -10乇的高真空压力，而不需要离子泵。

    Polishing apparatus and method for producing semiconductors using the apparatus
    10.
    发明申请
    Polishing apparatus and method for producing semiconductors using the apparatus 有权
    抛光装置及其制造方法

    公开(公告)号：US20050095960A1

    公开(公告)日：2005-05-05

    申请号：US11004991

    申请日：2004-12-07

    申请人： Shigeo Moriyama ,  Yoshihiro Ishida ,  Takashi Kugaya ,  Shigeo Ootsuki ,  Soichi Katagiri ,  Sadayuki Nishimura ,  Ryosei Kawai ,  Kan Yasui

    发明人： Shigeo Moriyama ,  Yoshihiro Ishida ,  Takashi Kugaya ,  Shigeo Ootsuki ,  Soichi Katagiri ,  Sadayuki Nishimura ,  Ryosei Kawai ,  Kan Yasui

    IPC分类号： B24B37/04 ,  B24B41/04 ,  B24B53/12 ,  B24B49/00 ,  B24B1/00

    CPC分类号： B24B53/017 ,  B24B37/042 ,  B24B41/04 ,  B24B53/12

    摘要： The present invention relates to a polishing apparatus, and a semiconductor manufacturing method using the apparatus. Dressing of a grindstone surface is ground by sizing processing whereby dressing of a tool surface can be done while preventing occurrence of cracks on the grindstone surface which is the cause for occurrence of scratches. Further, flatness of the surface of a dressing tool can be guaranteed because of sizing cutting-in; even if a thick grindstone of a few centimeters is used, the flatness can be maintained to the end; and processing with less in-face unevenness can be always carried out. Therefore, the life of the dressing tool can be greatly extended. Further, the present sizing-dressing is carried out jointly with processing of a wafer to thereby enable improvement of throughput of the apparatus as well as maintenance of a processing rate. The present apparatus and method are effective for planarization of various substrate surfaces having irregularities.

    摘要翻译： 本发明涉及一种抛光装置以及使用该装置的半导体制造方法。 磨石表面的磨合通过施胶处理进行研磨，由此可以进行工具表面的修整，同时防止在磨石表面产生裂纹，这是产生划痕的原因。 此外，可以保证修整工具的表面的平整度，因为切割的尺寸大小; 即使使用了几厘米厚的砂轮，也可以保持平坦度， 并且可以总是执行具有较少的面内不均匀性的处理。 因此，修整工具的寿命可以大大延长。 此外，与晶片的处理联合进行本施胶修整，从而能够提高装置的生产量以及维持处理速度。 本装置和方法对于具有不规则性的各种衬底表面的平坦化是有效的。