Manufacturing method
    2.
    发明授权
    Manufacturing method 有权
    制造方法

    公开(公告)号:US06455726B2

    公开(公告)日:2002-09-24

    申请号:US09782291

    申请日:2001-02-14

    IPC分类号: C07C22900

    摘要: A compound of the following formula (II) and a process for preparing of the compound of the following formula (I) its preparation wherein R1 is carboxy or protected carboxy; R2 is lower alkoxy or higher alkoxy; A1 is a divalent aromatic ring, a divalent heterocyclic group or a divalent cyclo(lower)alkane; and A2 is a divalent aromatic ring, a divalent heterocyclic group or a divalent cyclo(lower)alkane, or a salt thereof. The process comprises, reacting a compound of the formula (III): wherein R1, R2, A1 and A2 are each as defined above or a salt thereof, with an acid ammonium salt to give a compound of the formula (II).

    摘要翻译: 下式(II)的化合物及其制备方法,其中R1为羧基或被保护的羧基; R2为低级烷氧基或高级烷氧基; A1为二价芳环,二价杂环 基团或二价环(低级)烷烃; 和A 2是二价芳环,二价杂环基或二价环(低级)烷烃或其盐。 该方法包括使式(III)化合物:其中R1,R2,A1和A2各自如上定义,或其盐与酸性铵盐反应,得到式(II)化合物。

    Production process
    3.
    发明授权
    Production process 有权
    生产过程

    公开(公告)号:US06291680B1

    公开(公告)日:2001-09-18

    申请号:US09446359

    申请日:1999-12-20

    IPC分类号: C07D261106

    摘要: A compound of formula (1) or a salt thereof: wherein R1 is a carboxy or a protected carboxy; R2 is a lower alkoxy or a higher alkoxy; A1 is a divalent aromatic ring, a divalent heterocyclic group or a divalent cyclo(lower)alkane; and A2 a divalent aromatic ring, a divalent heterocyclic group or a divalent cyclo(lower)alkane; is prepared by reacting a compound of formula (III) or a salt thereof with acid ammonium salt: wherein R1, R2, A1 and A2 are each as defined above; to give a compound of formula (II) or a salt thereof which is further reacted with a salt of hydroxylamine: wherein R1, R2, A1 and A2 are each as defined above.

    摘要翻译: 式(1)的化合物或其盐:其中R1是羧基或被保护的羧基; R2是低级烷氧基或高级烷氧基; A1是二价芳环,二价杂环基或二价环(低级)烷烃; 和A2为二价芳环,二价杂环基或二价环(低级)烷烃; 通过使式(III)的化合物或其盐与酸性铵盐反应制备:其中R1,R2,A1和A2各自如上所定义; 得到与羟胺盐进一步反应的式(II)化合物或其盐:其中R1,R2,A1和A2各自如上所定义。