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    Positive type resist composition and resist pattern formation method using same
    1.
    发明授权
    Positive type resist composition and resist pattern formation method using same 有权
    正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法

    公开(公告)号：US07316888B2

    公开(公告)日：2008-01-08

    申请号：US11347102

    申请日：2006-02-02

    申请人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    发明人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

    摘要翻译： 提供一种正型树脂组合物，其包含（A）树脂组分，其在主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团 （B）在暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元 酯和衍生自丙烯酸酯的结构单元。 根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

    Positive type resist composition and resist pattern formation method using same
    3.
    发明授权
    Positive type resist composition and resist pattern formation method using same 有权
    正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法

    公开(公告)号：US07501221B2

    公开(公告)日：2009-03-10

    申请号：US11347167

    申请日：2006-02-02

    申请人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    发明人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, whereinthe component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

    摘要翻译： 提供一种正型树脂组合物，其包含（A）树脂组分，其在主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团 （B）在暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元 酯和衍生自丙烯酸酯的结构单元。 根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

    Positive type resist composition and resist pattern formation method using same
    4.
    发明授权
    Positive type resist composition and resist pattern formation method using same 有权
    正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法

    公开(公告)号：US07435530B2

    公开(公告)日：2008-10-14

    申请号：US11621437

    申请日：2007-01-09

    申请人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    发明人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

    摘要翻译： 一种正型树脂组合物，其包含（A）树脂组分，其在所述主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团， 在碱的作用下，碱的溶解度增加，（B）暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元和 衍生自丙烯酸酯的结构单元。 根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

    POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD USING SAME
    6.
    发明申请
    POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD USING SAME 有权
    使用相同类型的积极类型抗蚀剂组合物和抗蚀剂图案形成方法

    公开(公告)号：US20070190455A1

    公开(公告)日：2007-08-16

    申请号：US11621437

    申请日：2007-01-09

    申请人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    发明人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

    摘要翻译： 一种正型树脂组合物，其包含（A）树脂组分，其在所述主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团， 在碱的作用下，碱的溶解度增加，（B）暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元和 衍生自丙烯酸酯的结构单元。 根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

    Positive type resist composition and resist pattern formation method using same
    9.
    发明申请
    Positive type resist composition and resist pattern formation method using same 有权
    正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法

    公开(公告)号：US20050095535A1

    公开(公告)日：2005-05-05

    申请号：US11004798

    申请日：2004-12-07

    申请人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    发明人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/76

    CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

    摘要翻译： 提供一种正型树脂组合物，其包含（A）树脂组分，其在主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团 （B）在暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元 酯和衍生自丙烯酸酯的结构单元。 根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。