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1.发明申请公开(公告)号：US20110096305A1
公开(公告)日：2011-04-28
申请号：US12879852
申请日：2010-09-10
申请人： Takeshi KANEKO , Erik Henricus Egidius Catharina Eummelen , Nina Vladimirovna Dziomkina , Matthias Kruizinga
发明人： Takeshi KANEKO , Erik Henricus Egidius Catharina Eummelen , Nina Vladimirovna Dziomkina , Matthias Kruizinga
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table, the substrate, or both. The swap table has a shutter surface configured to be under the fluid handling structure during, for example, swap of the substrate on the substrate table. In use, a transfer surface between a surface of the substrate table and a surface of the swap table is moved under the fluid handling structure to help stop escaping immersion liquid. A shutter member and a method are also disclosed.
摘要翻译： 一种浸没式光刻设备，包括基板台，流体处理结构和互换台。 衬底台被配置为支撑衬底。 流体处理结构被配置为将浸没液体供应并限制在在投影系统和衬底台，衬底或两者之间限定的空间中。 交换台具有构造成在例如衬底台上的衬底的交换处于流体处理结构之下的快门表面。 在使用中，在基板台的表面和交换台的表面之间的转印面在流体处理结构下方移动以帮助停止逸出的浸没液。 还公开了一种快门构件和方法。
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2.发明授权公开(公告)号：US08599356B2
公开(公告)日：2013-12-03
申请号：US12879852
申请日：2010-09-10
申请人： Takeshi Kaneko , Erik Henricus Egidius Catharina Eummelen , Nina Vladimirovna Dziomkina , Matthias Kruizinga
发明人： Takeshi Kaneko , Erik Henricus Egidius Catharina Eummelen , Nina Vladimirovna Dziomkina , Matthias Kruizinga
CPC分类号： G03F7/70341 , G03F7/70733
摘要： An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table, the substrate, or both. The swap table has a shutter surface configured to be under the fluid handling structure during, for example, swap of the substrate on the substrate table. In use, a transfer surface between a surface of the substrate table and a surface of the swap table is moved under the fluid handling structure to help stop escaping immersion liquid. A shutter member and a method are also disclosed.
摘要翻译： 一种浸没式光刻设备，包括基板台，流体处理结构和互换台。 衬底台被配置为支撑衬底。 流体处理结构被配置为将浸没液体供应并限制在在投影系统和衬底台，衬底或两者之间限定的空间中。 交换台具有构造成在例如衬底台上的衬底的交换处于流体处理结构之下的快门表面。 在使用中，在基板台的表面和交换台的表面之间的转印面在流体处理结构下方移动以帮助停止逸出的浸没液。 还公开了一种快门构件和方法。
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公开(公告)号：US08189174B2
公开(公告)日：2012-05-29
申请号：US12616279
申请日：2009-11-11
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70733
摘要： A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement.
摘要翻译： 光刻设备包括两个阶段，每个阶段被配置为保持基底，其中每个阶段设置有短行程模块，以移动具有基底的台面和长行程模块以移动该阶段的短冲程模块。 光刻设备包括用于耦合级的交换桥，并且其中，在使用中，在第一配置中，所述级可相对于彼此移动，并且其中，在使用中，在第二配置中，所述级经由 互换桥联合运动。
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