公开(公告)号：US20110041765A1

公开(公告)日：2011-02-24

申请号：US12862213

申请日：2010-08-24

申请人： Tatsuya FUJINAMI ,  Shinsuke TAKAHASHI ,  Kouji TONOHARA ,  Jun FUJINAWA

发明人： Tatsuya FUJINAMI ,  Shinsuke TAKAHASHI ,  Kouji TONOHARA ,  Jun FUJINAWA

IPC分类号： C23C16/52

CPC分类号： C23C16/545 ,  C23C16/45519

摘要： The film deposition device includes a CVD film forming room disposed on a travel path of a substrate and having a function of performing the film deposition on a substrate by CVD, a treatment room disposed upstream or downstream of the CVD film forming room on the travel path and having a function of performing a predetermined treatment on the substrate, and a differential room disposed between and communicating with the CVD film forming room and the treatment room. The differential room includes a evacuation unit, a gas introducing unit for introducing at least one of a gas to be supplied to both of the CVD film forming room and the treatment room, and an inert gas, and a controller which controls the evacuation unit and the gas introducing unit to keep the differential room at a higher pressure than the CVD film forming room and the treatment room.

摘要翻译： 该膜沉积装置包括设置在基板的行进路径上并具有通过CVD在基板上进行膜沉积的功能的CVD成膜室，设置在行进路径上的CVD成膜室的上游或下游的处理室 并且具有对基板进行预定处理的功能，以及设置在CVD成膜室和处理室之间并与其连通的差动室。 差速室包括排气单元，用于引入要供应到CVD成膜室和处理室的气体中的至少一种的气体引入单元和惰性气体，以及控制排气单元和 该气体导入单元将差压室保持在比CVD成膜室和处理室更高的压力。

公开(公告)号：US20110064890A1

公开(公告)日：2011-03-17

申请号：US12880615

申请日：2010-09-13

申请人： Tatsuya FUJINAMI ,  Shinsuke TAKAHASHI ,  Jun FUJINAWA ,  Kouji TONOHARA

发明人： Tatsuya FUJINAMI ,  Shinsuke TAKAHASHI ,  Jun FUJINAWA ,  Kouji TONOHARA

IPC分类号： C23C16/458 ,  C23C16/505

CPC分类号： C23C16/50 ,  C23C16/44 ,  C23C16/503 ,  C23C16/505 ,  C23C16/509 ,  C23C16/517 ,  C23C16/54 ,  C23C16/545

摘要： A film deposition method deposits a film on a surface of a substrate in strip form traveling on a peripheral surface of a cylindrical drum in at least one film deposition compartment around the peripheral surface of the drum. The method disposes previously a differential compartment between one film deposition compartment and a compartment including a wrapping space containing at least one of a first position at which the substrate starts to travel on the drum and a second position at which the substrate separates from the drum, the differential compartments communicating with the compartment including the wrapping space and the film deposition compartment, sets a first pressure of the wrapping space lower than a second pressure of the at least one film deposition compartment and performs film deposition in the film deposition compartment with electric power supplied to the drum.

摘要翻译： 薄膜沉积方法将薄膜沉积在基板的表面上，以条带形式在圆筒形滚筒的圆周表面上行进，在至少一个薄膜沉积室周围的圆筒表面上。 该方法事先将一个薄膜沉积隔室和隔室之间的差分隔室置于包含一个包装空间的隔间，该包装空间包含基板开始在滚筒上行进的第一位置和基板与滚筒分离的第二位置中的至少一个， 与包括所述包装空间和所述成膜室的所述隔室连通的所述差动隔间将所述包装空间的第一压力设定为低于所述至少一个成膜室的第二压力，并且利用电力在所述成膜室中进行膜沉积 提供给鼓。

公开(公告)号：US20100239482A1

公开(公告)日：2010-09-23

申请号：US12725577

申请日：2010-03-17

申请人： Toshiya TAKAHASHI ,  Kouji TONOHARA ,  Shinsuke TAKAHASHI

发明人： Toshiya TAKAHASHI ,  Kouji TONOHARA ,  Shinsuke TAKAHASHI

IPC分类号： C23C16/513 ,  C23C16/32 ,  C23C16/52 ,  C23C16/34 ,  C23C16/36 ,  B32B9/00 ,  C01B21/068 ,  C01B31/36 ,  C01B33/00

CPC分类号： H05B33/04 ,  C23C16/345 ,  C23C16/50 ,  C23C16/545 ,  H01L51/5253 ,  H01L51/5256 ,  H01L2251/5338

摘要： A method according to the invention comprises: starting plasma discharge for forming the gas barrier layer in a film deposition chamber; and producing the gas barrier layer by using a plasma after a first predetermined period of time has elapsed from a start of the plasma discharge.

摘要翻译： 根据本发明的方法包括：在成膜室中开始形成阻气层的等离子体放电; 并且在从等离子体放电开始经过第一预定时间段之后通过使用等离子体产生阻气层。

公开(公告)号：US20100151116A1

公开(公告)日：2010-06-17

申请号：US12638223

申请日：2009-12-15

申请人： Shinsuke TAKAHASHI ,  Hiroyuki NISHIDA ,  Tatsuya FUJINAMI

发明人： Shinsuke TAKAHASHI ,  Hiroyuki NISHIDA ,  Tatsuya FUJINAMI

IPC分类号： C23C16/44

CPC分类号： B05D7/24 ,  B05D1/60 ,  B05D5/005 ,  B05D7/54 ,  B05D7/58 ,  C23C16/545

摘要： The method for producing a laminate includes: a film forming step for forming a thin film having one or more layers on a support to obtain a thin film; a defect cover layer forming step for forming a defect cover layer on the thin film by CVD; and an inspection step for detecting a defect whose size is 0.1 μm or more and 20 μm or less through the top of the defect cover layer. This method enables to produce a laminate with fewer defects, which effective allows for the detection of fine defects.

摘要翻译： 层叠体的制造方法包括：成膜步骤，用于在载体上形成具有一层或多层的薄膜以获得薄膜; 通过CVD在薄膜上形成缺陷覆盖层的缺陷覆盖层形成步骤; 以及通过缺陷覆盖层的顶部检测尺寸为0.1μm以上且20μm以下的缺陷的检查步骤。 该方法能够生产具有较少缺陷的层压体，这有效地允许检测细小缺陷。

公开(公告)号：US20090294042A1

公开(公告)日：2009-12-03

申请号：US12474286

申请日：2009-05-29

申请人： Shinsuke TAKAHASHI ,  Kyoushisa Uchiumi ,  Tatsuya Fujinami

发明人： Shinsuke TAKAHASHI ,  Kyoushisa Uchiumi ,  Tatsuya Fujinami

IPC分类号： B32B38/10

CPC分类号： B32B38/0004 ,  B26D1/245 ,  B26D7/08 ,  B26D7/084 ,  B26D7/34 ,  B32B37/203 ,  B32B2037/246 ,  B32B2307/536 ,  B32B2457/20 ,  B32B2457/206 ,  Y10T156/12

摘要： A cutting method and a cutting apparatus are provided which are capable of cutting a film without causing the cracking of a hard thin film or the deformation and/or property change of the layer beneath the hard thin film. The cutting apparatus includes: a conveying device that conveys a layered film including a base material and an inorganic film being a surface layer harder than the base material; a laminating section that attaches a laminate film to a predetermined cutting position of the inorganic film of the traveling layered film; a cutting section that cuts the layered film to which the laminate film is attached along the predetermined cutting position from the side opposite to the laminate film together with the laminate film; and a detaching section that detaches the laminate film after the cutting from the layered film.

摘要翻译： 提供了能够切割薄膜而不引起硬质薄膜的破裂或硬质薄膜下方的层的变形和/或变形的切割方法和切割装置。 切割装置包括：输送包括基材的层状膜和比基材硬的表层的无机膜的输送装置; 将层叠膜附着到行进层叠膜的无机膜的规定切断位置的层叠部， 与叠层膜一起，从与层压膜相反的一侧沿预定的切割位置切割层叠膜的层叠膜的切断部; 以及从层叠膜剥离层压膜后的分离部。