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    Method and device for manufacturing structure having pattern, and method for manufacturing mold
    3.
    发明授权
    Method and device for manufacturing structure having pattern, and method for manufacturing mold 有权
    具有图案的制造结构的方法和装置，以及用于制造模具的方法

    公开(公告)号：US08293125B2

    公开(公告)日：2012-10-23

    申请号：US11995170

    申请日：2006-09-05

    申请人： Aya Imada ,  Toru Den ,  Takashi Nakamura

    发明人： Aya Imada ,  Toru Den ,  Takashi Nakamura

    IPC分类号： C03C15/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/09

    摘要： A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.

    摘要翻译： 制造具有图案的结构。 弹性变形过程目标从第一状态沿面内方向弹性变形。 在变形的过程目标上形成第一图案。 使弹性变形的加工对象靠近或返回到第一状态，从而形成具有与第一图案不同的尺寸和形状的第二图案。

    METHOD AND DEVICE FOR MANUFACTURING STRUCTURE HAVING PATTERN, AND METHOD FOR MANUFACTURING MOLD
    4.
    发明申请
    METHOD AND DEVICE FOR MANUFACTURING STRUCTURE HAVING PATTERN, AND METHOD FOR MANUFACTURING MOLD 有权
    用于制造具有图案的结构的方法和装置，以及用于制造模具的方法

    公开(公告)号：US20090120904A1

    公开(公告)日：2009-05-14

    申请号：US11995170

    申请日：2006-09-05

    申请人： Aya Imada ,  Toru Den ,  Takashi Nakamura

    发明人： Aya Imada ,  Toru Den ,  Takashi Nakamura

    IPC分类号： B44C1/22 ,  B29C69/00 ,  C23F1/08 ,  B29C33/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/09

    摘要： A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.

    摘要翻译： 制造具有图案的结构。 弹性变形过程目标从第一状态沿面内方向弹性变形。 在变形的过程目标上形成第一图案。 使弹性变形的加工对象靠近或返回到第一状态，从而形成具有与第一图案不同的尺寸和形状的第二图案。

    Phase grating used for X-ray phase imaging, imaging apparatus for X-ray phase contrast image using phase grating, and X-ray computed tomography system
    5.
    发明授权
    Phase grating used for X-ray phase imaging, imaging apparatus for X-ray phase contrast image using phase grating, and X-ray computed tomography system 失效
    用于X射线相位成像的相位光栅，使用相位光栅的X射线相位对比图像的成像装置和X射线计算机断层摄影系统

    公开(公告)号：US08718228B2

    公开(公告)日：2014-05-06

    申请号：US12922145

    申请日：2009-03-12

    申请人： Takashi Nakamura ,  Aya Imada ,  Hidenosuke Itoh

    发明人： Takashi Nakamura ,  Aya Imada ,  Hidenosuke Itoh

    IPC分类号： G21K1/00

    CPC分类号： G21K1/06 ,  A61B6/06 ,  A61B6/4291 ,  A61B6/484 ,  G02B5/1814 ,  G02B5/1871 ,  G21K2207/005

    摘要： A phase grating used for X-ray phase imaging is provided, in which a pitch can be narrowed by using a diffraction grating with a low aspect ratio. A phase grating used for X-ray phase imaging, characterized in that the phase grating includes a first diffraction grating in which a first projection part whose thickness is formed so that an in-coming X-ray transmits with a phase π-shifted, and a first aperture part with the same aperture width as a width of the first projection part are cyclically arranged, and a second diffraction grating in which a second projection part with the same width as a width of the first projection part, and a second aperture part with the same aperture width as the aperture width of the first aperture part are cyclically arranged, and the second diffraction grating is formed as displaced on the first diffraction grating.

    摘要翻译： 提供了用于X射线相位成像的相位光栅，其中可以通过使用具有低纵横比的衍射光栅来缩小间距。 一种用于X射线相位成像的相位光栅，其特征在于，所述相位光栅包括第一衍射光栅，其中第一突出部分的厚度形成为使得入射X射线以相位移动的方式透射， 并且具有与第一突出部分的宽度相同的孔径宽度的第一开口部分循环地布置;以及第二衍射光栅，其中具有与第一突出部分的宽度相同的宽度的第二突出部分和第二孔径 具有与第一孔部分的孔径宽度相同的孔径宽度的部分循环地布置，并且第二衍射光栅在第一衍射光栅上形成为位移。

    SOURCE GRATING FOR X-RAYS, IMAGING APPARATUS FOR X-RAY PHASE CONTRAST IMAGE AND X-RAY COMPUTED TOMOGRAPHY SYSTEM
    6.
    发明申请
    SOURCE GRATING FOR X-RAYS, IMAGING APPARATUS FOR X-RAY PHASE CONTRAST IMAGE AND X-RAY COMPUTED TOMOGRAPHY SYSTEM 有权
    X射线源扫描，X射线相位对比图像和X射线计算机图像系统成像装置

    公开(公告)号：US20100246764A1

    公开(公告)日：2010-09-30

    申请号：US12594243

    申请日：2009-04-13

    申请人： Hidenosuke Itoh ,  Yoshikatsu Ichimura ,  Takashi Nakamura ,  Aya Imada

    发明人： Hidenosuke Itoh ,  Yoshikatsu Ichimura ,  Takashi Nakamura ,  Aya Imada

    IPC分类号： G21K1/04 ,  G01N23/04

    CPC分类号： G21K1/025 ,  G21K7/00 ,  G21K2207/005

    摘要： A source grating for X-rays and the like which can enhance spatial coherence and is used for X-ray phase contrast imaging is provided. The source grating for X-rays is disposed between an X-ray source and a test object and is used for X-ray phase contrast imaging. The source grating for X-rays includes a plurality of sub-gratings formed by periodically arranging projection parts each having a thickness shielding an X-ray at constant intervals. The plurality of sub-gratings are stacked in layers by being shifted.

    摘要翻译： 提供了可以增强空间相干性并用于X射线相位成像的用于X射线等的源光栅。 用于X射线的源光栅设置在X射线源和测试对象之间，并用于X射线相位成像。 用于X射线的源光栅包括通过周期性地布置各自具有以恒定间隔屏蔽X射线的厚度的突出部分而形成的多个子光栅。 多个子光栅通过移位而层叠。

    Phase grating used to take X-ray phase contrast image, imaging system using the phase grating, and X-ray computer tomography system
    7.
    发明授权
    Phase grating used to take X-ray phase contrast image, imaging system using the phase grating, and X-ray computer tomography system 失效
    相位光栅用于采取X射线相位对比图像，成像系统使用相位光栅和X射线计算机断层扫描系统

    公开(公告)号：US08351570B2

    公开(公告)日：2013-01-08

    申请号：US12891891

    申请日：2010-09-28

    申请人： Takashi Nakamura ,  Aya Imada

    发明人： Takashi Nakamura ,  Aya Imada

    IPC分类号： H05G1/60

    CPC分类号： G21K1/06 ,  G21K2207/005

    摘要： To provide a phase grating capable of acquiring, in photographing of an X-ray phase contrast image by use of X-ray with two wavelengths, an X-ray phase contrast image by a phase grating in the same size as when a single wavelength is used, provided is a phase grating used when an X-ray is directed to take an X-ray phase contrast image, the phase grating including a periodic structure for generating a phase difference between an X-ray transmitted through the structure and an X-ray not transmitted through the structure. The periodic structure has different periods in a plurality of directions in a same surface.

    摘要翻译： 为了提供一种能够通过使用具有两个波长的X射线来拍摄X射线相位对比图像的相位光栅，其具有与单个波长为相同尺寸的相位光栅的X射线相位对比图像 使用的是提供了当X射线被引导以获取X射线相位对比图像时使用的相位光栅，所述相位光栅包括用于产生通过该结构透射的X射线与X射线之间的相位差的周期性结构， 射线不透过结构。 周期性结构在同一表面中在多个方向上具有不同的周期。

    PHASE GRATING USED TO TAKE X-RAY PHASE CONTRAST IMAGE, IMAGING SYSTEM USING THE PHASE GRATING, AND X-RAY COMPUTER TOMOGRAPHY SYSTEM
    9.
    发明申请
    PHASE GRATING USED TO TAKE X-RAY PHASE CONTRAST IMAGE, IMAGING SYSTEM USING THE PHASE GRATING, AND X-RAY COMPUTER TOMOGRAPHY SYSTEM 失效
    用于获取X射线相位对比图像的相位磨砂，使用相位磨粒和X射线计算机图像系统的成像系统

    公开(公告)号：US20110085639A1

    公开(公告)日：2011-04-14

    申请号：US12891891

    申请日：2010-09-28

    申请人： Takashi Nakamura ,  Aya Imada

    发明人： Takashi Nakamura ,  Aya Imada

    IPC分类号： G01N23/04 ,  G21K3/00

    CPC分类号： G21K1/06 ,  G21K2207/005

    摘要： To provide a phase grating capable of acquiring, in photographing of an X-ray phase contrast image by use of X-ray with two wavelengths, an X-ray phase contrast image by a phase grating in the same size as when a single wavelength is used, provided is a phase grating used when an X-ray is directed to take an X-ray phase contrast image, the phase grating including a periodic structure for generating a phase difference between an X-ray transmitted through the structure and an X-ray not transmitted through the structure. The periodic structure has different periods in a plurality of directions in a same surface.

    摘要翻译： 为了提供一种能够通过使用具有两个波长的X射线来拍摄X射线相位对比图像的相位光栅，其具有与单个波长为相同尺寸的相位光栅的X射线相位对比图像 使用的是提供了当X射线被引导以获取X射线相位对比图像时使用的相位光栅，所述相位光栅包括用于产生通过该结构透射的X射线与X射线之间的相位差的周期性结构， 射线不透过结构。 周期性结构在同一表面中在多个方向上具有不同的周期。

    PHASE GRATING USED FOR X-RAY PHASE IMAGING, IMAGING APPARATUS FOR X-RAY PHASE CONTRAST IMAGE USING PHASE GRATING, AND X-RAY COMPUTED TOMOGRAPHY SYSTEM
    10.
    发明申请
    PHASE GRATING USED FOR X-RAY PHASE IMAGING, IMAGING APPARATUS FOR X-RAY PHASE CONTRAST IMAGE USING PHASE GRATING, AND X-RAY COMPUTED TOMOGRAPHY SYSTEM 失效
    用于X射线相位成像的相位磨削，使用相位磨粒和X射线计算机图像系统的X射线相位对比图像的成像装置

    公开(公告)号：US20110013743A1

    公开(公告)日：2011-01-20

    申请号：US12922145

    申请日：2009-03-12

    申请人： Takashi Nakamura ,  Aya Imada ,  Hidenosuke Itoh

    发明人： Takashi Nakamura ,  Aya Imada ,  Hidenosuke Itoh

    IPC分类号： G21K1/06 ,  G01N23/083 ,  A61B6/03

    CPC分类号： G21K1/06 ,  A61B6/06 ,  A61B6/4291 ,  A61B6/484 ,  G02B5/1814 ,  G02B5/1871 ,  G21K2207/005

    摘要： A phase grating used for X-ray phase imaging is provided, in which a pitch can be narrowed by using a diffraction grating with a low aspect ratio. A phase grating used for X-ray phase imaging, characterized in that the phase grating includes a first diffraction grating in which a first projection part whose thickness is formed so that an in-coming X-ray transmits with a phase π-shifted, and a first aperture part with the same aperture width as a width of the first projection part are cyclically arranged, and a second diffraction grating in which a second projection part with the same width as a width of the first projection part, and a second aperture part with the same aperture width as the aperture width of the first aperture part are cyclically arranged, and the second diffraction grating is formed as displaced on the first diffraction grating.

    摘要翻译： 提供了用于X射线相位成像的相位光栅，其中可以通过使用具有低纵横比的衍射光栅来缩小间距。 一种用于X射线相位成像的相位光栅，其特征在于，所述相位光栅包括第一衍射光栅，其中第一突出部分的厚度形成为使得入射X射线以相位移动的方式透射， 并且具有与第一突出部分的宽度相同的孔径宽度的第一开口部分循环地布置;以及第二衍射光栅，其中具有与第一突出部分的宽度相同的宽度的第二突出部分和第二孔径 具有与第一孔部分的孔径宽度相同的孔径宽度的部分循环地布置，并且第二衍射光栅在第一衍射光栅上形成为位移。