公开(公告)号：US07629597B2

公开(公告)日：2009-12-08

申请号：US11506998

申请日：2006-08-18

Applicant: Teng-Chao Tao ,  Philip J Ring

Inventor： Teng-Chao Tao ,  Philip J Ring

IPC: G21K5/10

CPC classification number: H01J37/3171 ,  H01J2237/002 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/16 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01L21/265 ,  H01L21/67213

Abstract: A system for controlling the temperature of a semiconductor workpiece processing tool and surrounding structure, thereby reducing the deposition rates within an ion implanter. A faraday flag structure comprising a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the and a base supporting the strike plate that includes a thermally conductive material surrounding at least a portion of an outer perimeter of the strike plate. The faraday flag structure base defines a conduit for routing coolant through the thermally conductive material surrounding the strike plate. Positioned below the faraday flag is a thermally controlled cold trap that receives and retains foreign material appearing in ion implanter.

Abstract translation: 一种用于控制半导体工件加工工具和周围结构的温度的系统，从而降低离子注入机内的沉积速率。 法拉第标志结构，其包括耦合到电路的导电冲击板，用于监测撞击撞击板的离子，以获得支撑击打板的指示和支撑击打板的基座，该基座包括导热材料，该导热材料围绕该导电材料的外周的至少一部分 打板 法拉第标志结构基座定义了用于通过围绕撞击板的导热材料布置冷却剂的导管。 位于法拉第标志下方的是一种热控冷阱，可以接收和保留出现在离子注入机中的异物。

公开(公告)号：US20080073576A1

公开(公告)日：2008-03-27

申请号：US11506998

申请日：2006-08-18

Applicant: Teng-Chao Tao ,  Philip J. Ring

Inventor： Teng-Chao Tao ,  Philip J. Ring

IPC: H01J37/08

CPC classification number: H01J37/3171 ,  H01J2237/002 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/16 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01L21/265 ,  H01L21/67213

Abstract: A system for controlling the temperature of a semiconductor workpiece processing tool and surrounding structure, thereby reducing the deposition rates within an ion implanter. A faraday flag structure comprising a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the and a base supporting the strike plate that includes a thermally conductive material surrounding at least a portion of an outer perimeter of the strike plate. The faraday flag structure base defines a conduit for routing coolant through the thermally conductive material surrounding the strike plate. Positioned below the faraday flag is a thermally controlled cold trap that receives and retains foreign material appearing in ion implanter.

Abstract translation: 一种用于控制半导体工件加工工具和周围结构的温度的系统，从而降低离子注入机内的沉积速率。 法拉第标志结构，其包括耦合到电路的导电冲击板，用于监测撞击撞击板的离子，以获得支撑击打板的指示和支撑击打板的基座，该基座包括导热材料，该导热材料围绕该导电材料的外周的至少一部分 打板 法拉第标志结构基座定义了用于通过围绕撞击板的导热材料布置冷却剂的导管。 位于法拉第标志下方的是一种热控冷阱，可以接收和保留出现在离子注入机中的异物。