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公开(公告)号：US4999271A
公开(公告)日：1991-03-12
申请号：US298221
申请日：1989-01-17
IPC分类号： C08F2/48 , C08F290/00 , C08F299/06 , C09D5/00 , C09D5/03 , G03F7/00 , G03F7/027
CPC分类号： G03F7/027
摘要： A printing plate precursor comprises a substrate coated with a radiation sensitive composition comprising a photoinitiator and a photopolymerizable urethane acrylate or methacrylate. The urethane acrylate or methacrylate is produced by partial acrylation or methacrylation of a tetrafunctional polyol and the remaining hydroxy groups of the polyol are reacted with a di or polyisocyanate.
摘要翻译： 印版前体包括涂覆有包含光引发剂和可光聚合的聚氨酯丙烯酸酯或甲基丙烯酸酯的辐射敏感组合物的基材。 氨基甲酸酯丙烯酸酯或甲基丙烯酸酯通过四官能多元醇的部分丙烯酸酯化或甲基丙烯酸酯化制备，并且多元醇的剩余羟基与二异氰酸酯或多异氰酸酯反应。
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2.发明授权Radiation sensitive polymeric diazonium salt and methods of making the polymeric diazonium salt 失效辐射敏感聚合物重氮盐和制备聚合重氮盐的方法
公开(公告)号：US4902601A
公开(公告)日：1990-02-20
申请号：US300699
申请日：1989-01-19
CPC分类号： G03F7/021
摘要： Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula: ##STR1## in which, R represents H or CH.sub.3 ; each R.sub.1, which may be the same or different represents H or alkyl; R.sub.2 represents a single bond or a substituted or unsubstituted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.
摘要翻译： 适用于生产用于平版印刷版制造的辐射敏感板的辐射敏感材料基于包含由下式表示的多个结构单元的聚合物：其中R表示H或CH 3; 每个R 1可以相同或不同，表示H或烷基; R2表示单键或取代或未取代的二价基; Ar表示衍生自芳族或杂芳族化合物的取代或未取代的二价基团; X表示O，S或NH; A代表阴离子; Y表示羰基氧基或芳基; n为1以上的整数。
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