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    Apparatus for forming deposited films with microwave plasma CVD method
    2.
    发明授权
    Apparatus for forming deposited films with microwave plasma CVD method 失效
    用微波等离子体CVD法形成沉积膜的装置

    公开(公告)号：US5232507A

    公开(公告)日：1993-08-03

    申请号：US876472

    申请日：1992-04-30

    申请人： Hirokazu Ohtoshi ,  Tetsuya Takei ,  Ryuji Okamura ,  Yasuyoshi Takai

    发明人： Hirokazu Ohtoshi ,  Tetsuya Takei ,  Ryuji Okamura ,  Yasuyoshi Takai

    IPC分类号： C08J7/00 ,  C23C16/50 ,  C23C16/511 ,  H01J37/32 ,  H01L21/205

    CPC分类号： H01J37/32238 ,  C23C16/511 ,  H01J37/32743 ,  H01J2237/3321

    摘要： An apparatus for forming deposited films with a microwave plasma CVD method comprises a reactor vessel within which the pressure can be reduced, means for supplying a source gas into the reactor vessel, means for introducing the microwave into the reactor vessel and exciting a microwave discharge plasma, and means for holding a plurality of substrates so as to enclose a discharge space formed within the reactor vessel, and is characterized by comprising a holding member holding together dielectric windows for introducing the microwave into the reactor vessel, substrates for the formation of deposited films disposed so as to surround the dielectric windows and a cooling device for cooling the dielectric windows, and conveying means for conveying the holding member into and out of the reactor vessel in a vacuum atmosphere.

    摘要翻译： 用微波等离子体CVD方法形成沉积膜的装置包括一个反应器容器，在该反应容器中压力可以减小，用于将源气体供应到反应器容器中的装置，用于将微波引入反应器容器并激发微波放电等离子体的装置 ，以及用于保持多个基板以包围形成在反应容器内的放电空间的装置，其特征在于包括：保持构件，其保持用于将微波引入反应器容器的电介质窗口，用于形成沉积膜的基板 设置成围绕电介质窗口和用于冷却电介质窗口的冷却装置，以及用于在真空环境中将保持构件输入和流出反应容器的输送装置。

    Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member
    3.
    发明授权
    Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member 失效
    电子照相感光构件用基板的处理方法及电子照相感光体的制造方法

    公开(公告)号：US5480627A

    公开(公告)日：1996-01-02

    申请号：US200651

    申请日：1994-02-23

    申请人： Tetsuya Takei ,  Hirokazu Ohtoshi ,  Ryuji Okamura ,  Hiroyuki Katagiri ,  Yasuyoshi Takai

    发明人： Tetsuya Takei ,  Hirokazu Ohtoshi ,  Ryuji Okamura ,  Hiroyuki Katagiri ,  Yasuyoshi Takai

    IPC分类号： G03G5/10 ,  B23B51/06

    CPC分类号： G03G5/102 ,  G03G5/10 ,  Y10S29/095 ,  Y10T408/44 ,  Y10T82/10

    摘要： A method of treating a substrate for an electrophotographic photosensitive member by a process comprises the steps;a) cutting the surface of the substrate to remove the surface in the desired thickness; andb) bringing the cut surface of the substrate into contact with water having a temperature of from 5.degree. C. to 90.degree. C., having a resistivity of not less than 11 M.OMEGA..multidot.cm at 25.degree. C., containing fine particles with a particle diameter of not smaller than 0.2 .mu.m in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for at least 10 seconds at a pressure of from 1 kg.multidot.f/cm.sup.2 to 300 kg.multidot.f/cm.sup.2.

    摘要翻译： 通过该方法处理电子照相感光构件的基板的方法包括以下步骤： a）切割基材的表面以除去所需厚度的表面; 和b）使基材的切割表面与温度为5℃至90℃的水接触，其在25℃下的电阻率不小于11M OMEGA xcm，其中包含具有 每毫升不超过10,000个颗粒的粒径不小于0.2μm的粒径，含有总活细胞数不超过100毫升的微生物，并且含有不大于10的有机物质 在1kgxf / cm 2至300kgxf / cm 2的压力下至少10秒钟。

    Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member
    4.
    发明授权
    Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member 失效
    电子照相感光体用金属基材的处理方法及电子照相感光体的制造方法

    公开(公告)号：US5314780A

    公开(公告)日：1994-05-24

    申请号：US841989

    申请日：1992-02-26

    申请人： Tetsuya Takei ,  Hirokazu Ohtoshi ,  Ryuji Okamura ,  Hiroyuki Katagiri ,  Yasuyoshi Takai

    发明人： Tetsuya Takei ,  Hirokazu Ohtoshi ,  Ryuji Okamura ,  Hiroyuki Katagiri ,  Yasuyoshi Takai

    IPC分类号： G03G5/10 ,  G03G5/00

    CPC分类号： G03G5/102 ,  G03G5/10 ,  Y10S29/095 ,  Y10T408/44 ,  Y10T82/10

    摘要： A method of treating a substrate for an electrophotographic photosensitive member by a process comprises the steps of;a) cutting the surface of the substrate to remove the surface in the desired thickness; andb) bringing the cut surface of the substrate into contact with water having a temperature of from 5.degree. C. to 90.degree. C., having a resistivity of not less than 11 M.OMEGA..multidot.cm at 25.degree. C., containing fine particles with a particle diameter of not smaller than 0.2 .mu.m in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for at least 10 seconds at a pressure of from 1 kg.multidot.f/cm.sup.2 to 300 kg.multidot.f/cm.sup.2.

    摘要翻译： 通过该方法处理电子照相感光构件的基板的方法包括以下步骤： a）切割基材的表面以除去所需厚度的表面; 和b）使基材的切割表面与温度为5℃至90℃的水接触，其在25℃下的电阻率不小于11M OMEGA xcm，其中包含具有 每毫升不超过10,000个颗粒的粒径不小于0.2μm的粒径，含有总活细胞数不超过100毫升的微生物，并且含有不大于10的有机物质 在1kgxf / cm 2至300kgxf / cm 2的压力下至少10秒钟。

    Electrophotographic light-receiving member
    5.
    发明授权
    Electrophotographic light-receiving member 失效
    电子照相光接收元件

    公开(公告)号：US5284730A

    公开(公告)日：1994-02-08

    申请号：US925617

    申请日：1992-08-06

    申请人： Tetsuya Takei ,  Shigeru Shirai ,  Hirokazu Ohtoshi ,  Ryuji Okamura ,  Yasuyoshi Takai ,  Hiroyuki Katagiri

    发明人： Tetsuya Takei ,  Shigeru Shirai ,  Hirokazu Ohtoshi ,  Ryuji Okamura ,  Yasuyoshi Takai ,  Hiroyuki Katagiri

    IPC分类号： C23C16/30 ,  G03G5/082 ,  G03G5/14

    CPC分类号： C23C16/30 ,  G03G5/08221

    摘要： An electrophotographic light-receiving member has a surface layer of a non-single crystal material (Si.sub.x C.sub.y O.sub.z).sub.t H.sub.u F.sub.v (wherein 0.1.ltoreq.x.ltoreq.0.4, 0.4.ltoreq.y.ltoreq.0.7, 0.05.ltoreq.z.ltoreq.0.2, x+y+z=1, 0.299.ltoreq.t.ltoreq.0.589, 0.41.ltoreq.u.ltoreq.0.7, 0.001.ltoreq.v.ltoreq.0.1 and t+u+v=1), in which the ratio of silicon atoms bonded to carbon atoms in the surface layer is at least 50% of the total number of silicon atoms, and the ratio of silicon atoms bonded to oxygen atoms is 10 to 30 atomic % of the total number of silicon atoms.

    摘要翻译： 电子照相光接收元件具有非单晶材料（SixCyOz）tHuFv（其中0.1≤x≤0.4,0.4≤y≤0.7,0.05≤z≤0.2，x + y）的表面层 + z = 1，0.299 <= t <= 0.589，0.41 <= u <= 0.7，0.001 <= v <= 0.1，t + u + v = 1），其中与碳原子键合的硅原子比 表面层为硅原子总数的至少50％，与氧原子键合的硅原子的比例为硅原子总数的10〜30原子％。

    Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C
    6.
    发明授权
    Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C 失效
    具有与C结合的高比率的表面区域的电子照相光接收元件

    公开(公告)号：US5273851A

    公开(公告)日：1993-12-28

    申请号：US780780

    申请日：1991-10-23

    申请人： Tetsuya Takei ,  Shigeru Shirai ,  Hirokazu Ootoshi ,  Ryuji Okamura ,  Yasuyoshi Takai

    发明人： Tetsuya Takei ,  Shigeru Shirai ,  Hirokazu Ootoshi ,  Ryuji Okamura ,  Yasuyoshi Takai

    IPC分类号： G03G5/08 ,  C23C16/30 ,  G03G5/082 ,  G03G5/14

    CPC分类号： C23C16/30 ,  G03G5/08221

    摘要： An electrophotographic light-receiving member comprises a substrate, a photoconductive layer formed on the substrate and composed of a non-single crystal material containing a base component silicon atoms and a surface layer (surface-side region) made of a non-single crystal material containing silicon, carbon and hydrogen atoms, in which the ratio of silicon atoms having at least one bond to a carbon atom in the surface layer is at least 50% of the total number of silicon atoms. The electrophotographic light-receiving member has good initial electrophotographic properties and particularly good durability under a high-humidity environment.

    摘要翻译： 电子照相受光部件包括：基板，形成在基板上的由非晶单晶材料构成的光电导层和由非单晶材料构成的表面层（表面侧区域） 含有硅，碳和氢原子，其中具有至少一个键的硅原子与表面层中的碳原子的比例为硅原子总数的至少50％。 电摄影光接收元件在高湿度环境下具有良好的初始电子照相特性和特别好的耐久性。

    Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure
    10.
    发明授权
    Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure 失效
    微波等离子体CVD装置，包括同轴排列的多个气体管道气体馈送结构

    公开(公告)号：US5443645A

    公开(公告)日：1995-08-22

    申请号：US173948

    申请日：1993-12-28

    申请人： Hirokazu Otoshi ,  Tetsuya Takei ,  Yasuyoshi Takai ,  Ryuji Okamura ,  Shigeru Shirai ,  Teruo Misumi

    发明人： Hirokazu Otoshi ,  Tetsuya Takei ,  Yasuyoshi Takai ,  Ryuji Okamura ,  Shigeru Shirai ,  Teruo Misumi

    IPC分类号： C23C16/24 ,  C23C16/44 ,  C23C16/455 ,  C23C16/511 ,  C23C16/50

    CPC分类号： C23C16/24 ,  C23C16/455 ,  C23C16/45578 ,  C23C16/511

    摘要： A deposited film-forming apparatus comprising a reaction chamber capable of maintaining at a reduced pressure, means for arranging a substrate on which a film is to be formed in said reaction chamber, a gas feed means for supplying a gaseous raw material into said reaction chamber and means for introducing a microwave energy into said reaction chamber, characterized in that said gas feed means is arranged in the space circumscribed by said substrate, said gas feed means comprises a multiple pipe structure, said multiple pipe structure being connected to a gas supply source for supplying said gaseous raw material, the respective constituent pipes of said multiple pipe structure being provided with a plurality of gas spouting holes such that said gas spouting holes are in communication with each other, and means for applying a bias voltage between said substrate and said gas feed means.

    摘要翻译： 一种沉积膜形成装置，包括能够在减压下保持的反应室，用于布置在其上形成有膜的基板的装置，用于将气态原料供给到所述反应室中的气体供给装置 以及用于将微波能量引入所述反应室的装置，其特征在于，所述气体供给装置布置在由所述基板限定的空间中，所述气体供给装置包括多个管道结构，所述多个管道结构连接到气体供应源 为了供应所述气态原料，所述多管结构的各构成管设置有多个气体喷出孔，使得所述气体喷出孔彼此连通，以及用于在所述基板和所述 气体进料装置。