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公开(公告)号:US20110317143A1
公开(公告)日:2011-12-29
申请号:US13226103
申请日:2011-09-06
IPC分类号: G03B27/54
CPC分类号: G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
摘要翻译: 提供了一种光刻设备,其具有在基底水平的传感器,所述传感器包括辐射接收器,支撑辐射接收器的透射板和辐射探测器,其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失 辐射探测器的元件。
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公开(公告)号:US20160282727A1
公开(公告)日:2016-09-29
申请号:US15178522
申请日:2016-06-09
申请人: Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MElJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertu MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Helmar VAN SANTEN
发明人: Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MElJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertu MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Helmar VAN SANTEN
IPC分类号: G03F7/20
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
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公开(公告)号:US20130250270A1
公开(公告)日:2013-09-26
申请号:US13615190
申请日:2012-09-13
申请人: Joeri LOF , Erik Theodorus Maria BIJLAART , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Antonius Theodorus Anna Maria DERKSEN
发明人: Joeri LOF , Erik Theodorus Maria BIJLAART , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Antonius Theodorus Anna Maria DERKSEN
IPC分类号: G03F7/20
CPC分类号: G03F7/70858 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F7/7085
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译: 公开了一种光刻投影装置,其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体,以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。 光刻投影装置包括被配置为保持图案形成装置的支撑结构,所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统,被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统,被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门,被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号:US20110273677A1
公开(公告)日:2011-11-10
申请号:US13186991
申请日:2011-07-20
申请人: Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erick Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
发明人: Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erick Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
IPC分类号: G03B27/52
CPC分类号: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译: 公开了一种浸没式光刻投影装置,其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡,有助于减少与液体接触后的元件上的残留物,就可以在设备的各种元件上使用液体和液体两层。
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