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    DEPOSITION ANALYSIS FOR ROBOT MOTION CORRECTION
    1.
    发明申请
    DEPOSITION ANALYSIS FOR ROBOT MOTION CORRECTION 审中-公开
    机器人运动校正的沉积分析

    公开(公告)号：US20080101912A1

    公开(公告)日：2008-05-01

    申请号：US11553113

    申请日：2006-10-26

    申请人： Todd W. Martin ,  Steven V. Sansoni ,  Michael R. Rice ,  Eric Ng ,  Jeffrey C. Hudgens ,  Frederick Guckel ,  Russel Kaplan

    发明人： Todd W. Martin ,  Steven V. Sansoni ,  Michael R. Rice ,  Eric Ng ,  Jeffrey C. Hudgens ,  Frederick Guckel ,  Russel Kaplan

    IPC分类号： H01L21/66 ,  G01R31/26

    CPC分类号： H01L21/681 ,  G01R31/2893 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201

    摘要： Methods for correcting motion of a robot are provided in the present invention. In one embodiment, a method for correcting motion of a robot includes transferring a first substrate supported on a robot to a processing position using a robotic motion routine, depositing a material on the first substrate in the processing position, determining an offset between a center of the deposited material and a center of the first substrate, adjusting the robotic motion routine to compensate for the offset. In another embodiment, a processing chamber is provided configured to obtain samples from which motion of a robot operated therein may be corrected to improve substrate placement on a substrate support through analysis of material deposited on the substrate.

    摘要翻译： 在本发明中提供了用于校正机器人运动的方法。 在一个实施例中，一种用于校正机器人运动的方法包括：使用机器人运动程序将支撑在机器人上的第一衬底转移到处理位置，将材料沉积在处理位置的第一衬底上， 沉积材料和第一衬底的中心，调整机器人运动程序以补偿偏移。 在另一个实施例中，提供了一种处理室，其被配置为获得可以通过分析沉积在基板上的材料的方式来校正在其中操作的机器人的运动以便改进衬底支撑件上的衬底放置的样本。

    Electrostatic chuck and methods of use thereof
    3.
    发明授权
    Electrostatic chuck and methods of use thereof 有权
    静电吸盘及其使用方法

    公开(公告)号：US08559159B2

    公开(公告)日：2013-10-15

    申请号：US13198204

    申请日：2011-08-04

    申请人： Shambhu N. Roy ,  Martin Lee Riker ,  Keith A. Miller ,  Vijay D. Parkhe ,  Steven V. Sansoni

    发明人： Shambhu N. Roy ,  Martin Lee Riker ,  Keith A. Miller ,  Vijay D. Parkhe ,  Steven V. Sansoni

    IPC分类号： H01T23/00

    CPC分类号： H01L21/67109 ,  H01L21/67103 ,  H01L21/6831

    摘要： An electrostatic chuck and method of use thereof is provided herein. In some embodiments, an electrostatic chuck may include a disk having a first side to support a substrate thereon and a second side, opposing the first side, to provide an interface to selectively couple the disk to a thermal control plate, a first electrode disposed within the disk proximate the first side to electrostatically couple the substrate to the disk and a second electrode disposed within the disk proximate the opposing side of the disk to electrostatically couple the disk to the thermal control plate. In some embodiments, the second electrode may also be configured to heat the disk.

    摘要翻译： 本文提供了静电卡盘及其使用方法。 在一些实施例中，静电卡盘可以包括具有支撑其上的基板的第一侧的盘和与第一侧相对的第二侧，以提供用于选择性地将盘耦合到热控制板的界面，第一电极设置在 靠近第一侧的盘，以将衬底静电耦合到盘，以及设置在靠近盘的相对侧的盘内的第二电极，以将盘静电耦合到热控制板。 在一些实施例中，第二电极也可以被配置为加热盘。

    Detachable electrostatic chuck having sealing assembly
    5.
    发明申请
    Detachable electrostatic chuck having sealing assembly 有权
    具有密封组件的可拆卸静电卡盘

    公开(公告)号：US20080089001A1

    公开(公告)日：2008-04-17

    申请号：US11549594

    申请日：2006-10-13

    申请人： Vijay D. Parkhe ,  Cheng-Tsiung Tsai ,  Steven V. Sansoni

    发明人： Vijay D. Parkhe ,  Cheng-Tsiung Tsai ,  Steven V. Sansoni

    IPC分类号： H01L21/683 ,  H01R43/00 ,  H02N13/00

    CPC分类号： H01L21/6831 ,  Y10T29/49117 ,  Y10T279/23

    摘要： A detachable electrostatic chuck is capable of being attached to a pedestal in a process chamber. The chuck comprises an electrostatic puck having a ceramic body with an embedded electrode. The chuck also has a baseplate below the electrostatic puck with a lower surface which is bonded to a sealing assembly comprising a sealing plate and sealing ring. The sealing plate and ring are polished to form a gas-tight seal between the chuck and pedestal to prevent gas leakage from or into this region.

    摘要翻译： 可拆卸的静电卡盘能够附接到处理室中的基座。 卡盘包括具有带嵌入电极的陶瓷体的静电压盘。 卡盘还具有位于静电压盘下面的底板，下表面粘合到包括密封板和密封环的密封组件上。 密封板和环被抛光以在卡盘和基座之间形成气密密封，以防止气体从该区域泄漏。

    Ring assembly for substrate processing chamber
    6.
    发明申请
    Ring assembly for substrate processing chamber 审中-公开
    基板处理室的环组件

    公开(公告)号：US20070283884A1

    公开(公告)日：2007-12-13

    申请号：US11444175

    申请日：2006-05-30

    申请人： Jennifer Tiller ,  Allen K. Lau ,  Marc O'Donnell Schweitzer ,  Steven V. Sansoni ,  Keith A. Miller ,  Christopher Boitnott

    发明人： Jennifer Tiller ,  Allen K. Lau ,  Marc O'Donnell Schweitzer ,  Steven V. Sansoni ,  Keith A. Miller ,  Christopher Boitnott

    IPC分类号： C23C16/00 ,  C23F1/00

    CPC分类号： C23C14/564 ,  H01J37/32623 ,  H01J37/32642 ,  H01L21/68735

    摘要： A ring assembly is provided for a substrate support used in a substrate processing chamber, the substrate support comprising an annular ledge and an inner perimeter sidewall. In one version, the ring assembly comprises (i) an L-shaped isolator ring comprising a horizontal leg resting on the annular ledge of the support, and a vertical leg abutting the inner perimeter sidewall of the support, and (ii) a deposition ring comprising an annular band having an overlap ledge that overlaps the horizontal leg of the isolator ring. In another version, the deposition ring comprises a dielectric annular band that surrounds and overlaps the annular ledge of the support, and a bracket and fastener.

    摘要翻译： 提供了用于衬底处理室中的衬底支撑件的环组件，衬底支撑件包括环形凸缘和内周边侧壁。 在一个版本中，环组件包括（i）包括搁置在支撑件的环形凸缘上的水平腿的L形隔离器环和邻接支撑件的内周侧壁的垂直腿，以及（ii）沉积环 包括具有与隔离环的水平支腿重叠的重叠壁架的环形带。 在另一个版本中，沉积环包括围绕和重叠支撑件的环形凸缘的电介质环形带，以及支架和紧固件。

    Detachable electrostatic chuck having sealing assembly
    8.
    发明授权
    Detachable electrostatic chuck having sealing assembly 有权
    具有密封组件的可拆卸静电卡盘

    公开(公告)号：US07589950B2

    公开(公告)日：2009-09-15

    申请号：US11549594

    申请日：2006-10-13

    申请人： Vijay D. Parkhe ,  Cheng-Tsiung Tsai ,  Steven V. Sansoni

    发明人： Vijay D. Parkhe ,  Cheng-Tsiung Tsai ,  Steven V. Sansoni

    IPC分类号： H01L21/683 ,  B23B31/28

    CPC分类号： H01L21/6831 ,  Y10T29/49117 ,  Y10T279/23

    摘要： A detachable electrostatic chuck is capable of being attached to a pedestal in a process chamber. The chuck comprises an electrostatic puck having a ceramic body with an embedded electrode. The chuck also has a baseplate below the electrostatic puck with a lower surface which is bonded to a sealing assembly comprising a sealing plate and sealing ring. The sealing plate and ring are polished to form a gas-tight seal between the chuck and pedestal to prevent gas leakage from or into this region.

    摘要翻译： 可拆卸的静电卡盘能够附接到处理室中的基座。 卡盘包括具有带嵌入电极的陶瓷体的静电压盘。 卡盘还具有位于静电压盘下面的底板，下表面粘合到包括密封板和密封环的密封组件上。 密封板和环被抛光以在卡盘和基座之间形成气密密封，以防止气体从该区域泄漏。