-
公开(公告)号：US20210356405A1
公开(公告)日：2021-11-18
申请号：US17291207
申请日：2019-10-24
发明人： Naoki AKIYAMA , Hiroyuki NAKAYAMA , Susumu SAITO
IPC分类号： G01N21/88 , G01N21/95 , G01R1/073 , G01R31/265 , G01R31/28
摘要： This inspection apparatus is for inspecting an inspection subject device. The inspection subject device is formed on an object to be inspected, and is a reverse-side irradiation-type imaging device into which light enters from the reverse side opposite to the side where a wiring layer is provided. This inspection apparatus has: a placement table having a transparent surface on which the object to be inspected is placed; a light irradiation mechanism that is provided in the placement table and that irradiates the to-be-inspected object placed on the placement table with light through the placement surface; and an acquisition unit that acquires in-plane distribution of illuminance of light from the placement table.
-
公开(公告)号：US20230005798A1
公开(公告)日：2023-01-05
申请号：US17756372
申请日：2020-11-12
发明人： Susumu SAITO
IPC分类号： H01L21/66 , H01L21/324 , H01L21/67
摘要： The present disclosure is a substrate processing apparatus including: a chamber configured to accommodate a substrate; a heat source configured to heat-treat the substrate; a heat ray sensor provided outside the chamber and configured to receive infrared rays radiated from the substrate; and an infrared ray transmission window provided in the chamber and configured to transmit an infrared ray having a wavelength greater than or equal to 8 μm to the heat ray sensor.
-
公开(公告)号：US20220336238A1
公开(公告)日：2022-10-20
申请号：US17754446
申请日：2020-08-06
发明人： Shosuke ENDO , Yohei MIDORIKAWA , Yohei NAKAGOMI , Yoshihiro KOBAYASHI , Yasuo NAKATANI , Susumu SAITO , Chanseong AHN , Yuta TAKAHASHI , Takahiro KIJIMA
IPC分类号： H01L21/67 , H01L21/66 , H01L21/324 , H01L21/687
摘要： A heating/cooling device includes: a chamber; a plurality of substrate holders provided inside the chamber to support substrates; a plurality of LED light sources provided outside the chamber to irradiate the substrates held on the substrate holders with LED light having a wavelength that heats the substrates; a plurality of transmission windows provided between the plurality of substrate holders and the plurality of LED light sources to transmit the LED light radiated from the LED light sources; and a plurality of gas distribution parts provided inside the chamber to distribute and supply a cooling gas to the substrates held on the substrate holders.
-
公开(公告)号：US20210389366A1
公开(公告)日：2021-12-16
申请号：US17286959
申请日：2019-10-17
发明人： Naoki AKIYAMA , Susumu SAITO , Hiroyuki NAKAYAMA , Shigeru KASAI
摘要： In an inspection apparatus for inspecting an inspection target device formed on an inspection object, the inspection target device is a back-illuminated imaging device into which light is incident from a rear surface opposite to a side of a wiring layer. The inspection apparatus includes a stage having the inspection object placed such that the inspection object faces the rear surface. The stage includes a light transmitter made of a light-transmissive material. The inspection object is placed on the light transmitter below which a light illuminator is disposed. The light illuminator includes a flat light guide plate having a facing surface facing the inspection object. A light source is provided laterally outside the light guide plate configured to diffuse light emitted from the light source incident from a side end surface of the light guide plate, and to emit the light as planar light from the facing surface.
-
公开(公告)号：US20190074166A1
公开(公告)日：2019-03-07
申请号：US16122226
申请日：2018-09-05
发明人： Taro IKEDA , Tomohito KOMATSU , Yuki OSADA , Hiroyuki MIYASHITA , Susumu SAITO , Kazuhiro FURUKI , Mikio SATO , Eiki KAMATA
IPC分类号： H01J37/32
摘要： A plasma probe device includes an antenna unit installed at an opening formed in a wall of a processing chamber or a mounting table through a sealing member configured to seal between a vacuum space and an atmospheric space, an electrode connected to the antenna unit, and a dielectric support portion made of a dielectric material and configured to support the antenna unit from an outer peripheral side. A surface of the antenna unit which is exposed through the opening and separated from a facing surface of the wall or the mounting table facing the antenna unit by a width is depressed from a surface of the wall or the mounting table where the opening is formed, which faces a plasma generation space.
-
公开(公告)号：US20210382105A1
公开(公告)日：2021-12-09
申请号：US17287836
申请日：2019-10-17
发明人： Naoki AKIYAMA , Susumu SAITO , Hiroyuki NAKAYAMA , Shigeru KASAI
IPC分类号： G01R31/28 , G01R31/308
摘要： An inspection apparatus for inspecting a backside irradiation type imaging device formed on an inspection object includes: a stage on which the inspection object is mounted such that the stage faces a rear surface of the backside irradiation type imaging device, wherein the stage includes: a transmitter including a flat plate formed of a light transmitting material, and configured to mount the inspection object on the transmitter; and a light emitter disposed at a location facing the inspection object with the transmitter interposed between the light emitter and the inspection object, and configured to emit light toward the transmitter, and wherein the transmitter transmits the light from the light emitter while diffusing the light.
-
公开(公告)号：US20170243725A1
公开(公告)日：2017-08-24
申请号：US15435202
申请日：2017-02-16
IPC分类号： H01J37/32
CPC分类号： H01J37/32449 , H01J37/32009 , H01J37/321 , H01J37/3211 , H01J2237/334
摘要： In a plasma processing apparatus, insulating members are horizontally and separately arranged above a mounting unit in a processing chamber. Each insulating member serves as a partition between a vacuum atmosphere in the processing chamber and an external atmosphere of the processing chamber. Antennas are provided on the respective insulating members to generate an inductively coupled plasma. A first processing gas is supplied into the processing chamber and adsorbed onto a substrate on the mounting unit. A second processing gas is turned into a plasma by power supplied from the antennas and is supplied to activate the first processing gas adsorbed onto the substrate or react with the first processing gas adsorbed onto the substrate. The supply of the first processing gas and the supply of the second processing gas are alternately repeated multiple times with a process of evacuating an inside of the processing chamber interposed therebetween.
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.017 秒)