公开(公告)号：US06440636B1

公开(公告)日：2002-08-27

申请号：US09703677

申请日：2000-11-02

申请人： Toru Ushirogouchi ,  Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Akira Takaragi ,  Keizo Inoue

发明人： Toru Ushirogouchi ,  Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Yoshinori Funaki ,  Kiyoharu Tsutsumi ,  Akira Takaragi ,  Keizo Inoue

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  C08F20/18 ,  C08F20/30

摘要： A polymeric compound includes at least one monomeric unit of the following formula (I): wherein R1 is a hydrogen atom or a methyl group; and each of R2 and R3 is independently a hydrogen atom or a hydroxyl group. The polymeric compound may include the monomeric unit and at least one monomeric unit selected from monomeric units represented by the following formulae (IIa) and (IIb): wherein R1 is a hydrogen atom or a methyl group; each of R4 and R5 is, for example, a hydrogen atom, a hydroxyl group, an oxo group, or a carboxyl group, wherein R4 and R5 are not concurrently hydrogen atoms; and each of R7 and R8 is independently a hydrogen atom, a hydroxyl group, or an oxo group. The polymeric compound have a high etching resistance in addition to satisfactory transparency, alkali-solubility, and adhesion.

摘要翻译： 聚合化合物包括至少一种下式（I）的单体单元：其中R1是氢原子或甲基; R2和R3各自独立地为氢原子或羟基。 聚合化合物可以包括单体单元和选自下式（IIa）和（IIb）表示的单体单元的至少一种单体单元：其中R 1是氢原子或甲基; R4和R5各自为例如氢原子，羟基，氧代基或羧基，其中R4和R5不同时为氢原子; R 7和R 8各自独立地为氢原子，羟基或氧代基。 除了令人满意的透明性，碱溶性和粘合性之外，高分子化合物具有高的耐蚀刻性。

公开(公告)号：US07029823B2

公开(公告)日：2006-04-18

申请号：US10937357

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/20 ,  G03F7/40 ,  G03F7/30

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。

公开(公告)号：US06824957B2

公开(公告)日：2004-11-30

申请号：US10635571

申请日：2003-08-07

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F720

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。

公开(公告)号：US5932391A

公开(公告)日：1999-08-03

申请号：US697009

申请日：1996-08-16

申请人： Toru Ushirogouchi ,  Koji Asakawa ,  Naoko Kihara ,  Makoto Nakase ,  Naomi Shida ,  Takeshi Okino

发明人： Toru Ushirogouchi ,  Koji Asakawa ,  Naoko Kihara ,  Makoto Nakase ,  Naomi Shida ,  Takeshi Okino

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/021

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： A resist for alkali development, which comprises an alicyclic compound attached with an acidic substituent group exhibiting pKa of 7 to 11 in an aqueous solution of 25.degree. C. This alicyclic compound is preferably a copolymer comprising as a comonomer component a vinyl compound and exhibiting a light absorbency of 3 or less per 1 .mu.m to the light of 193 nm in wavelength.

摘要翻译： 一种碱显影用抗蚀剂，其包含在25℃的水溶液中具有表现出pKa为7〜11的酸性取代基的脂环族化合物。该脂环族化合物优选为包含乙烯基化合物作为共聚单体成分的共聚物， 对于波长为193nm的光，每1μm的光吸收率为3以下。

公开(公告)号：US20050037284A1

公开(公告)日：2005-02-17

申请号：US10937357

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03C1/76

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。

公开(公告)号：US06410748B1

公开(公告)日：2002-06-25

申请号：US09847387

申请日：2001-05-03

申请人： Naomi Shida ,  Toru Ushirogouchi ,  Koji Asakawa ,  Takeshi Okino ,  Shuji Hayase ,  Yoshihiko Nakano ,  Makoto Nakase

发明人： Naomi Shida ,  Toru Ushirogouchi ,  Koji Asakawa ,  Takeshi Okino ,  Shuji Hayase ,  Yoshihiko Nakano ,  Makoto Nakase

IPC分类号： C07D20948

CPC分类号： G03F7/0397 ,  C08F246/00 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3  (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.

摘要翻译： 由以下通式（m-1）表示的单体：其中R是具有脂环骨架的基团，R 2可以相同或不同，分别为氢原子，卤素原子或一价有机基团，X 1为二价有机基团 含有杂原子，j为0〜3的整数，R1为选自下列基团的基团，具有Si（R1-1）的一价有机基团，X2和X3中的任一个为含有杂原子的二价有机基团，k m为0〜3的整数，R4为二价烷基，R6可以相同或不同，分别为氢原子，卤素原子或一价有机基团。

公开(公告)号：US07070905B2

公开(公告)日：2006-07-04

申请号：US10937577

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/20 ,  G03F7/30 ,  G03F7/40

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。

公开(公告)号：US07063932B2

公开(公告)日：2006-06-20

申请号：US10937832

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/20 ,  G03F7/30 ,  G03F7/40

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

公开(公告)号：US20050037283A1

公开(公告)日：2005-02-17

申请号：US10937313

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03C1/76

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。

公开(公告)号：US06660450B2

公开(公告)日：2003-12-09

申请号：US10246619

申请日：2002-09-19

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03C1492

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.