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    Batch CVD method and apparatus for semiconductor process
    3.
    发明授权
    Batch CVD method and apparatus for semiconductor process 有权
    分批CVD法和半导体工艺装置

    公开(公告)号：US08461059B2

    公开(公告)日：2013-06-11

    申请号：US12838911

    申请日：2010-07-19

    申请人： Toshiyuki Ikeuchi ,  Masayuki Hasegawa ,  Toshihiko Takahashi ,  Keisuke Suzuki

    发明人： Toshiyuki Ikeuchi ,  Masayuki Hasegawa ,  Toshihiko Takahashi ,  Keisuke Suzuki

    IPC分类号： H01L21/473

    CPC分类号： C23C16/402 ,  C23C16/45525 ,  C23C16/45557 ,  H01L21/02164 ,  H01L21/0228 ,  H01L21/3141 ,  H01L21/31608

    摘要： A batch CVD method repeats a cycle including adsorption and reaction steps along with a step of removing residual gas. The adsorption step is preformed while supplying the source gas into the process container by first setting the source gas valve open for a first period and then setting the source gas valve closed, without supplying the reactive gas into the process container by keeping the reactive gas valve closed, and without exhausting gas from inside the process container by keeping the exhaust valve closed. The reaction step is performed without supplying the source gas into the process container by keeping the source gas valve closed, while supplying the reactive gas into the process container by setting the reactive gas valve open, and exhausting gas from inside the process container by setting the exhaust valve to gradually decrease its valve opening degree from a predetermined open state.

    摘要翻译： 分批CVD法重复包括吸附和反应步骤的循环以及除去残余气体的步骤。 通过首先将源气体阀开启第一时间段，然后将源气体阀关闭而将源气体供应到处理容器中，同时将原料气体供给到处理容器中，同时通过保持反应气体阀 关闭，并且不通过保持排气阀关闭从处理容器内部排出气体。 通过将源气体阀保持关闭，同时通过将反应性气体阀打开而将反应性气体供给到处理容器中，并且通过将处理容器内的气体排出到处理容器内部来排出气体，从而进行反应步骤， 排气阀从预定的打开状态逐渐减小阀开度。

    Pneumatic tire with tread having series of depressions in rib
    4.
    发明授权
    Pneumatic tire with tread having series of depressions in rib 有权
    具有胎面的气动轮胎具有肋中的一系列凹陷

    公开(公告)号：US08302644B2

    公开(公告)日：2012-11-06

    申请号：US12567825

    申请日：2009-09-28

    申请人： Toshihiko Takahashi

    发明人： Toshihiko Takahashi

    IPC分类号： B60C11/117

    CPC分类号： B60C11/032 ,  B60C2011/0388

    摘要： A pneumatic tire has a rib sectionalized by main grooves extending along a tire circumferential direction in a center portion of a tread surface. Depressions are arranged in series in a center portion in a width direction of the rib so as to leave a space in the tire circumferential direction. The depressions extend in the tire circumferential direction and become wider from both end portions in a longitudinal direction toward a center portion.

    摘要翻译： 充气轮胎具有在胎面表面的中心部分沿着轮胎周向延伸的主槽分段的肋。 凹陷在肋的宽度方向上的中心部分串联布置，以便在轮胎周向留下空间。 凹部在轮胎周向延伸，从长度方向的两端部向中央部变宽。

    BATCH CVD METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS
    6.
    发明申请
    BATCH CVD METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS 有权
    BATCH CVD方法和半导体工艺的设备

    公开(公告)号：US20110021033A1

    公开(公告)日：2011-01-27

    申请号：US12838911

    申请日：2010-07-19

    申请人： Toshiyuki Ikeuchi ,  Masayuki Hasegawa ,  Toshihiko Takahashi ,  Keisuke Suzuki

    发明人： Toshiyuki Ikeuchi ,  Masayuki Hasegawa ,  Toshihiko Takahashi ,  Keisuke Suzuki

    IPC分类号： H01L21/46

    CPC分类号： C23C16/402 ,  C23C16/45525 ,  C23C16/45557 ,  H01L21/02164 ,  H01L21/0228 ,  H01L21/3141 ,  H01L21/31608

    摘要： A batch CVD method repeats a cycle including adsorption and reaction steps along with a step of removing residual gas. The adsorption step is preformed while supplying the source gas into the process container by first setting the source gas valve open for a first period and then setting the source gas valve closed, without supplying the reactive gas into the process container by keeping the reactive gas valve closed, and without exhausting gas from inside the process container by keeping the exhaust valve closed. The reaction step is performed without supplying the source gas into the process container by keeping the source gas valve closed, while supplying the reactive gas into the process container by setting the reactive gas valve open, and exhausting gas from inside the process container by setting the exhaust valve to gradually decrease its valve opening degree from a predetermined open state.

    摘要翻译： 分批CVD法重复包括吸附和反应步骤的循环以及除去残余气体的步骤。 通过首先将源气体阀开启第一时间段，然后将源气体阀关闭而将源气体供应到处理容器中，同时将原料气体供给到处理容器中，同时通过保持反应气体阀 关闭，并且不通过保持排气阀关闭从处理容器内部排出气体。 通过将源气体阀保持关闭，同时通过将反应性气体阀打开而将反应性气体供给到处理容器中，并且通过将处理容器内的气体排出到处理容器内部来排出气体，进行反应步骤， 排气阀从预定的打开状态逐渐减小阀开度。