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6 条记录 (耗时 0.02 秒)

    Vacuum switch including windmill-shaped electrodes
    1.
    发明授权
    Vacuum switch including windmill-shaped electrodes 有权
    真空开关包括风车形电极

    公开(公告)号：US06479778B1

    公开(公告)日：2002-11-12

    申请号：US09585267

    申请日：2000-06-02

    申请人： Toshinori Kimura ,  Kenichi Koyama ,  Hiromi Koga ,  Atsushi Sawada

    发明人： Toshinori Kimura ,  Kenichi Koyama ,  Hiromi Koga ,  Atsushi Sawada

    IPC分类号： H01H3366

    CPC分类号： H01H33/6642

    摘要： A vacuum switch includes a pair of windmill-shaped electrodes within a vacuum tube and including windmill portions and contact portions. Each of the windmill-shaped electrodes is arranged such that a component of a magnetic flux parallel to a contact surface and serving as an arc driving force with respect to a range of 0.5 mm from the contacting surface contacting the contacting portion of a leg portion of an arc has a magnetic flux density equal to or larger than 0.01 tesla with respect to an electric current of 1 kA, at any point on the contacting surface. The ratio of an inner diameter Di of the contact portion to an outer diameter D of the windmill-shaped electrodes is equal to or greater than 0.4, the difference in thickness between the windmill portions and the contact portions is equal to or less than 5 mm, and each of the windmill-shaped electrodes is connected to one of the pair of electrode rods, and a ratio of a diameter d of the connection portion of the electrode rod to an inner diameter Di of the contacting portion is equal to or less than 0.6. The windmill-shaped electrodes may be a Cu—Cr material including 20-60 weight % of Cr.

    摘要翻译： 真空开关包括在真空管内的一对风车形电极，并且包括风车部分和接触部分。 每个风车形电极被布置成使得磁通量的一部分平行于接触表面并且作为电弧驱动力，相对于与接触表面接触的接触表面的接触表面的距离为0.5mm 相对于1kA的电流，电弧在接触表面的任何点具有等于或大于0.01特斯拉的磁通密度。 接触部分的内径Di与风车型电极的外径D的比例等于或大于0.4，风车部分和接触部分之间的厚度差等于或小于5mm 并且每个风车形电极连接到一对电极棒中的一个，并且电极棒的连接部分的直径d与接触部分的内径Di之比等于或小于 0.6。 风车形电极可以是包含20-60重量％的Cr的Cu-Cr材料。

    Polishing apparatus
    2.
    发明授权
    Polishing apparatus 有权
    抛光设备

    公开(公告)号：US09211627B2

    公开(公告)日：2015-12-15

    申请号：US13985199

    申请日：2012-02-09

    申请人： Kazutoshi Andou ,  Toshinori Kimura ,  Sadaaki Mizuno

    发明人： Kazutoshi Andou ,  Toshinori Kimura ,  Sadaaki Mizuno

    IPC分类号： B24B19/22

    CPC分类号： B24B19/226

    摘要： Provided is a polishing apparatus capable of maintaining polishing precision although fewer expendable parts are periodically replaced. The polishing apparatus includes a polishing disk (20) having a polishing surface (20a) on the front side thereof to polish an end surface of a workpiece, a support mechanism (30) for supporting a back surface (20b) of the polishing disk (20) while allowing the polishing disk (20) to move along a predetermined plane, a workpiece holder (50) for holding the workpiece so as to contact the end surface of the workpiece with the polishing surface of the polishing disk, and a driving mechanism (70) for concurrently causing circular and reciprocating rectilinear motions of the polishing disk (20).

    摘要翻译： 提供了能够保持抛光精度的抛光装置，尽管周期性地更换更少的消耗部件。 抛光装置包括：研磨盘（20），其前侧具有研磨面（20a），以研磨工件的端面;支撑机构（30），用于支撑研磨盘的后表面（20b） 20），同时允许抛光盘（20）沿着预定平面移动，用于保持工件以使工件的端面与抛光盘的抛光表面接触的工件保持器（50）和驱动机构 （70），用于同时引起抛光盘（20）的圆形和往复直线运动。

    POLISHING APPARATUS
    3.
    发明申请
    POLISHING APPARATUS 有权
    抛光装置

    公开(公告)号：US20130331008A1

    公开(公告)日：2013-12-12

    申请号：US13985199

    申请日：2012-02-09

    申请人： Kazutoshi Andou ,  Toshinori Kimura ,  Sadaaki Mizuno

    发明人： Kazutoshi Andou ,  Toshinori Kimura ,  Sadaaki Mizuno

    IPC分类号： B24B19/22

    CPC分类号： B24B19/226

    摘要： Provided is a polishing apparatus capable of maintaining polishing precision although fewer expendable parts are periodically replaced. The polishing apparatus includes a polishing disk (20) having a polishing surface (20a) on the front side thereof to polish an end surface of a workpiece, a support mechanism (30) for supporting a back surface (20b) of the polishing disk (20) while allowing the polishing disk (20) to move along a predetermined plane, a workpiece holder (50) for holding the workpiece so as to contact the end surface of the workpiece with the polishing surface of the polishing disk, and a driving mechanism (70) for concurrently causing circular and reciprocating rectilinear motions of the polishing disk (20).

    摘要翻译： 提供了能够保持抛光精度的抛光装置，尽管周期性地更换更少的消耗部件。 抛光装置包括：研磨盘（20），其前侧具有研磨面（20a），以研磨工件的端面;支撑机构（30），用于支撑研磨盘的后表面（20b） 20），同时允许抛光盘（20）沿着预定平面移动，用于保持工件以使工件的端面与抛光盘的抛光表面接触的工件保持器（50）和驱动机构 （70），用于同时引起抛光盘（20）的圆形和往复直线运动。

    Rental estimation method
    4.
    发明申请
    Rental estimation method 审中-公开
    租赁估算方法

    公开(公告)号：US20060059002A1

    公开(公告)日：2006-03-16

    申请号：US10534410

    申请日：2003-11-05

    申请人： Koichi Shibata ,  Hiroshi Watanabe ,  Hiroyuki Adachi ,  Genroku Sugiyama ,  Shuichi Miura ,  Kiyoshi Ono ,  Itsuo Kondou ,  Toshinori Kimura

    发明人： Koichi Shibata ,  Hiroshi Watanabe ,  Hiroyuki Adachi ,  Genroku Sugiyama ,  Shuichi Miura ,  Kiyoshi Ono ,  Itsuo Kondou ,  Toshinori Kimura

    IPC分类号： G06Q99/00

    CPC分类号： G06Q30/02 ,  G06Q30/0645

    摘要： In a rental estimation method according to the present invention, rental information with regard to rental devices is provided to a customer through a data exchange between a terminal (9) of the customer and a management server (5) of a rental company. The rental estimation method includes a data input step for entering work content data indicating a work content through the customer terminal (9), and a necessary device reporting step for reading out a list of a plurality of necessary devices matching the work content and rental information corresponding to the necessary devices from a predefined database (2 to 4) and for providing them to the customer.

    摘要翻译： 在根据本发明的租赁估计方法中，通过客户的终端（9）和租赁公司的管理服务器（5）之间的数据交换，向客户提供关于租赁设备的租赁信息。 租赁估计方法包括：数据输入步骤，用于输入通过客户终端（9）指示工作内容的工作内容数据;以及必要的设备报告步骤，用于读出与工作内容和租赁信息相匹配的多个必需设备的列表 对应于来自预定义数据库（2至​​4）的必要设备并将其提供给客户。