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    Defect inspecting method and defect inspecting apparatus
    2.
    发明授权
    Defect inspecting method and defect inspecting apparatus 失效
    缺陷检查方法和缺陷检查装置

    公开(公告)号：US08638429B2

    公开(公告)日：2014-01-28

    申请号：US13146428

    申请日：2009-12-15

    申请人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    发明人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    IPC分类号： G01N21/00 ,  G01J4/00

    CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N2021/8809 ,  G01N2021/8848 ,  H01L22/12

    摘要： Provided are a defect inspecting method and a defect inspecting apparatus, wherein defect detecting sensitivity is improved and also haze measurement is performed using polarization detection, while suppressing damages to samples. The defect inspecting apparatus is provided with a light source which oscillates to a sample a laser beam having a wavelength band wherein a small energy is absorbed, and two independent detecting optical systems, i.e., a defect detecting optical system which detects defect scattered light generated by a defect, by radiating the laser beams oscillated by the light source, and a haze detecting optical system which detects roughness scattered light generated due to roughness of the wafer surface. Polarization detection is independently performed with respect to the scattered light detected by the two detecting optical systems, and based on the two different detection signals, defect determination and haze measurement are performed.

    摘要翻译： 提供了一种缺陷检查方法和缺陷检查装置，其中提高了缺陷检测灵敏度，并且在抑制对样本的损害的同时使用偏振检测进行雾度测量。 缺陷检查装置具有向样品振荡的光源，其具有吸收小能量的波长带的激光束，以及两个独立的检测光学系统，即检测由 通过照射由光源振荡的激光束的缺陷，以及检测由于晶片表面的粗糙度而产生的粗糙度散射光的雾度检测光学系统。 相对于由两个检测光学系统检测的散射光独立地进行极化检测，并且基于两个不同的检测信号，执行缺陷确定和雾度测量。

    DEFECT INSPECTING METHOD AND DEFECT INSPECTING APPARATUS
    7.
    发明申请
    DEFECT INSPECTING METHOD AND DEFECT INSPECTING APPARATUS 失效
    缺陷检查方法和缺陷检查装置

    公开(公告)号：US20120019835A1

    公开(公告)日：2012-01-26

    申请号：US13146428

    申请日：2009-12-15

    申请人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    发明人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    IPC分类号： G01B11/30 ,  G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N2021/8809 ,  G01N2021/8848 ,  H01L22/12

    摘要： Provided are a defect inspecting method and a defect inspecting apparatus, wherein defect detecting sensitivity is improved and also haze measurement is performed using polarization detection, while suppressing damages to samples. The defect inspecting apparatus is provided with a light source which oscillates to a sample a laser beam having a wavelength band wherein a small energy is absorbed, and two independent detecting optical systems, i.e., a defect detecting optical system which detects defect scattered light generated by a defect, by radiating the laser beams oscillated by the light source, and a haze detecting optical system which detects roughness scattered light generated due to roughness of the wafer surface. Polarization detection is independently performed with respect to the scattered light detected by the two detecting optical systems, and based on the two different detection signals, defect determination and haze measurement are performed.

    摘要翻译： 提供了一种缺陷检查方法和缺陷检查装置，其中提高了缺陷检测灵敏度，并且在抑制对样本的损害的同时使用偏振检测来进行雾度测量。 缺陷检查装置具有向样品振荡的光源，其具有吸收小能量的波长带的激光束，以及两个独立的检测光学系统，即检测由 通过照射由光源振荡的激光束的缺陷，以及检测由于晶片表面的粗糙度而产生的粗糙度散射光的雾度检测光学系统。 相对于由两个检测光学系统检测的散射光独立地进行极化检测，并且基于两个不同的检测信号，执行缺陷确定和雾度测量。

    Defect inspection apparatus
    8.
    发明授权
    Defect inspection apparatus 有权
    缺陷检查装置

    公开(公告)号：US08477302B2

    公开(公告)日：2013-07-02

    申请号：US12412776

    申请日：2009-03-27

    申请人： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

    发明人： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501 ,  G01N21/9505 ,  G01N2021/8854 ,  G01N2021/8874 ,  G01N2201/103 ,  G01N2201/1045

    摘要： A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.

    摘要翻译： 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台，照射光学系统，其照射激光束以在样品的表面上形成线性照射区域，检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置，用于检测从样品表面的线性照射区域散射的光，并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号，并根据所选择的检测信号检测缺陷。

    DEFECT INSPECTION APPARATUS
    9.
    发明申请
    DEFECT INSPECTION APPARATUS 有权
    缺陷检查装置

    公开(公告)号：US20090279081A1

    公开(公告)日：2009-11-12

    申请号：US12412776

    申请日：2009-03-27

    申请人： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

    发明人： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

    IPC分类号： G01N21/896

    CPC分类号： G01N21/9501 ,  G01N21/9505 ,  G01N2021/8854 ,  G01N2021/8874 ,  G01N2201/103 ,  G01N2201/1045

    摘要： A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.

    摘要翻译： 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台，照射光学系统，其照射激光束以在样品的表面上形成线性照射区域，检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置，用于检测从样品表面的线性照射区域散射的光，并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号，并根据所选择的检测信号检测缺陷。

    Defect Inspection Method and Apparatus
    10.
    发明申请
    Defect Inspection Method and Apparatus 审中-公开
    缺陷检查方法和装置

    公开(公告)号：US20100004875A1

    公开(公告)日：2010-01-07

    申请号：US12488610

    申请日：2009-06-22

    申请人： Yuta Urano ,  Toshifumi Honda ,  Akira Hamamatsu ,  Shunji Maeda

    发明人： Yuta Urano ,  Toshifumi Honda ,  Akira Hamamatsu ,  Shunji Maeda

    IPC分类号： G01N21/88 ,  G06F19/00

    CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N2021/4711 ,  G01N2021/887

    摘要： In a detection step, light produced on a sample in plural directions are collectively detected using a plurality of detectors. Multidimensional features containing information about scattered light distributions are extracted based on a plurality of detector outputs obtained. The feature is compared with data in a scattered light distribution library thereby to determine the types and sizes of defects. In a feature extraction step, a feature outputted based on the magnitude of each of scattered light detected signals of scatterers already known in refractive index and shape, which are obtained in the detection step, is corrected, thereby realizing high precision determination.

    摘要翻译： 在检测步骤中，使用多个检测器共同检测在多个方向上的样品上产生的光。 基于获得的多个检测器输出提取包含关于散射光分布的信息的多维特征。 将该特征与散射光分布库中的数据进行比较，从而确定缺陷的类型和大小。 在特征提取步骤中，校正基于在检测步骤中获得的折射率和形状已知的散射体的散射光检测信号的大小的输出的特征，从而实现高精度的确定。