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公开(公告)号：US5332557A
公开(公告)日：1994-07-26
申请号：US5602
申请日：1993-01-19
IPC分类号： B01J19/00 , C03C17/25 , C23C18/12 , G05D23/22 , H01L21/00 , H01L21/324 , H01L21/677 , F28D21/00 , G05D23/19 , H05H1/24
CPC分类号： H01L21/67757 , G05D23/1934 , G05D23/22 , H01L21/67115 , Y10S422/906
摘要： A plurality of workpieces are supported on a workpiece holder disposed over an opening defined in a horizontal base plate and connected to an evacuating device. A reaction chamber, which is supported on an arm of a lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the reaction chamber defines a closed space which accommodates the workpieces therein and a lifted position in which the workpieces are exposed out of the reaction chamber. A heating device, which is supported on an arm of another lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the heating device surrounds the reaction chamber and a lifted position in which the reaction chamber is exposed out of the heating device.
摘要翻译： 多个工件被支撑在设置在水平基板中限定的开口上并连接到抽空装置的工件保持件上。 支撑在提升和降低装置的臂上的反应室可在下降位置之间相对于基板垂直移动，其中反应室限定容纳工件的封闭空间和提升位置， 工件暴露在反应室外。 支撑在另一升降装置的臂上的加热装置可相对于基板垂直移动，该下降位置在加热装置围绕反应室的下降位置和反应室暴露于其中的提升位置之间 离开加热装置。
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公开(公告)号：US5972426A
公开(公告)日：1999-10-26
申请号：US005495
申请日：1998-01-12
CPC分类号： B05C5/0254 , B05C11/08 , B05C5/0208 , B05B13/04 , B05C5/027
摘要： A coating nozzle includes an elongate nozzle body having a coating solution reservoir defined longitudinally therein for being supplied with a coating solution from an external coating solution supply. The elongate nozzle body also has a coating solution holder defined therein and opening away from the coating solution reservoir, for holding a coating solution against falling off as droplets under surface tension of the coating solution. A plurality of passages are defined in the elongate nozzle body and held in communication with the coating solution reservoir and the coating solution holder, for supplying the coating solution from the coating solution reservoir to the coating solution holder.
摘要翻译： 涂布喷嘴包括细长的喷嘴体，其具有纵向地限定在其中的涂布溶液储存器，以从外部涂布溶液供应源供应涂布溶液。 细长喷嘴体还具有限定在其中的涂覆溶液保持器，并且远离涂覆溶液储存器，用于在涂布溶液的表面张力下保持涂布溶液不会作为液滴脱落。 多个通道被限定在细长喷嘴体中，并且与涂布液储存器和涂布液保持器保持连通，用于将涂布溶液从涂布液储存器提供到涂布溶液保持器。
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公开(公告)号：US5769946A
公开(公告)日：1998-06-23
申请号：US627694
申请日：1996-03-29
IPC分类号： G03F7/16 , B05B1/14 , B05B13/04 , B05C5/02 , B05C11/08 , G02B5/20 , H01L21/027 , B05C3/02 , B05B13/02 , B05C3/00 , B05C5/00
CPC分类号： B05C5/0254 , B05C11/08 , B05C5/0208 , B05B13/04 , B05C5/027
摘要： A coating nozzle includes an elongate nozzle body having a coating solution reservoir defined longitudinally therein for being supplied with a coating solution from an external coating solution supply. The elongate nozzle body also has a coating solution holder defined therein and opening away from the coating solution reservoir, for holding a coating solution against falling off as droplets under surface tension of the coating solution. A plurality of passages are defined in the elongate nozzle body and held in communication with the coating solution reservoir and the coating solution holder, for supplying the coating solution from the coating solution reservoir to the coating solution holder. The arrangement of the reservoir, the solution holder and the passages in the elongate nozzle body assures that a uniform layer of coating solution is deposited by the nozzle on a surface of a planar substrate.
摘要翻译： 涂布喷嘴包括细长的喷嘴体，其具有纵向地限定在其中的涂布溶液储存器，以从外部涂布溶液供应源供应涂布溶液。 细长喷嘴体还具有限定在其中的涂覆溶液保持器，并且远离涂覆溶液储存器，用于在涂布溶液的表面张力下保持涂布溶液不会作为液滴脱落。 多个通道被限定在细长喷嘴主体中，并且与涂布液储存器和涂布液保持器保持连通，用于将涂布溶液从涂布液储存器提供到涂布溶液保持器。 储存器，溶液保持器和细长喷嘴体中的通道的布置确保了通过喷嘴将均匀的涂层溶液层沉积在平面基板的表面上。
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公开(公告)号：US5591262A
公开(公告)日：1997-01-07
申请号：US410315
申请日：1995-03-24
申请人： Hiroyoshi Sago , Hideya Kobari , Koji Ueda , Hidenori Miyamoto , Ryuzo Takatsuki
发明人： Hiroyoshi Sago , Hideya Kobari , Koji Ueda , Hidenori Miyamoto , Ryuzo Takatsuki
IPC分类号： G03F7/16 , B05C11/08 , H01L21/00 , H01L21/027 , H01L21/304 , H01L21/306 , H01L21/683 , B05C7/00
CPC分类号： H01L21/67051 , Y10S134/902
摘要： The invention disclosed defined a vertically extending passage through the rotary center of an inner cup or the rotary center of a spinner in a notary chemical treater, disposes a stationary cleaning fluid nozzle in the passage, and injects the cleaning fluid from the nozzle to clean a lid of the rotary chemical treater and the underside of an object treatment within the treater. The underside of the lid and the underside of the objective part are efficiently cleaned, and the need for sealing the movable parts against the cleaning fluid is eliminated because the nozzle is stationary, ensuring the prevention of the cleaning fluid from leaking.
摘要翻译： 本发明公开了一种通过内杯的旋转中心或旋转器在公证化学处理器中的旋转中心的垂直延伸的通道，将固定的清洁流体喷嘴置于通道中，并将喷嘴从喷嘴喷射到清洁 旋转化学处理器的盖子和处理器内的物体处理的下侧。 盖子的下侧和目标部分的下侧被有效地清洁，并且由于喷嘴是静止的，消除了将可动部件密封在清洁流体上的需要，从而确保防止清洗液体泄漏。
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公开(公告)号：US09027504B2
公开(公告)日：2015-05-12
申请号：US13484625
申请日：2012-05-31
申请人： Hidenori Miyamoto , Tsutomu Sahoda
发明人： Hidenori Miyamoto , Tsutomu Sahoda
IPC分类号： B05C13/02 , F24J3/00 , F27B5/16 , H01L21/67 , H01L21/677 , H01L31/032
CPC分类号： H01L21/67173 , H01L21/67109 , H01L21/67253 , H01L21/6776 , H01L31/0322 , H01L31/0326 , Y02E10/541
摘要： A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part.
摘要翻译： 一种加热装置，包括：第一加热部和第二加热部，在所述第一加热部和第二加热部之间，在所述膜厚度方向的基板位置配置有具有涂膜的基板; 以及距离控制部，其控制所述基板位置与所述第一加热部之间的第一距离和所述基板位置与所述第二加热部之间的第二距离中的至少一个。
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公开(公告)号：US20120238075A1
公开(公告)日：2012-09-20
申请号：US13412910
申请日：2012-03-06
申请人： Hidenori Miyamoto , Tsutomu Sahoda
发明人： Hidenori Miyamoto , Tsutomu Sahoda
IPC分类号： H01L21/208 , B05B1/02 , B05B15/04
CPC分类号： C23C2/003 , C23C18/12 , C23C18/1204 , C23C18/1275 , C23C26/02 , H01L21/6715 , H01L21/67173 , H01L21/6776 , Y02E10/541 , Y02P70/521
摘要： A coating apparatus including a coating part which applies a liquid material containing an oxidizable metal and a solvent to a substrate; a chamber having a coating space in which the coating part applies the liquid material to the substrate and a transport space into which the substrate is transported; and a removal part which removes the liquid material from the atmosphere inside the chamber when a concentration of the solvent in the atmosphere inside the chamber exceeds a threshold value.
摘要翻译： 一种涂布设备，包括：将含有可氧化金属和溶剂的液体材料施加到基材上的涂布部分; 一个具有涂层空间的腔室，其中涂层部分将液体材料施加到衬底上，以及传送空间，衬底被运送到该腔室中; 以及当室内的大气中的溶剂的浓度超过阈值时，从室内的大气中除去液体物质的去除部。
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公开(公告)号：US20120309179A1
公开(公告)日：2012-12-06
申请号：US13484642
申请日：2012-05-31
申请人： Hidenori Miyamoto , Tsutomu Sahoda
发明人： Hidenori Miyamoto , Tsutomu Sahoda
IPC分类号： H01L21/208 , B05C9/14
CPC分类号： H01L31/18 , H01L31/0322 , H01L31/0326 , Y02E10/541
摘要： A substrate treating apparatus including: a first chamber having a coating part which forms a coating film of a liquid material containing an oxidizable metal and a solvent on a substrate; a second chamber having a first heating part which heats the coating film; and a connection part which connects the first chamber and the second chamber, wherein the connection part is provided with a second heating part which heats the coating film coated on the substrate and a pressure control part which controls the pressure around the coating film.
摘要翻译： 一种基板处理装置，包括：第一室，其具有涂布部，其在基板上形成含有可氧化金属和溶剂的液体材料的涂膜; 第二室，具有加热涂膜的第一加热部; 以及连接第一室和第二室的连接部，其中，连接部设置有加热涂布在基板上的涂膜的第二加热部和控制涂膜周围的压力的压力控制部。
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公开(公告)号：US20120308715A1
公开(公告)日：2012-12-06
申请号：US13484728
申请日：2012-05-31
申请人： Hidenori Miyamoto , Tsutomu Sahoda
发明人： Hidenori Miyamoto , Tsutomu Sahoda
IPC分类号： H01L31/18
CPC分类号： H01L21/6715 , H01L21/67173 , H01L21/6776 , Y02E10/541
摘要： A coating apparatus including: a coating part having a nozzle which ejects a liquid material containing an oxidizable metal and a solvent to a substrate; a supplying system which supplies the liquid material to the coating part; and a recycling system which recovers the liquid material from at least one of the supplying system and the coating part, and supplies the recovered liquid material to at least one of the supplying system and the coating part.
摘要翻译： 一种涂布装置，包括：涂布部，其具有将含有可氧化金属和溶剂的液体材料喷射到基材的喷嘴; 供给系统，其将液体材料供给到涂布部; 以及回收系统，其从供给系统和涂布部中的至少一个回收液体材料，并将回收的液体材料供给到供给系统和涂布部中的至少一个。
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公开(公告)号：US5879457A
公开(公告)日：1999-03-09
申请号：US783988
申请日：1997-01-14
申请人： Tsutomu Sahoda , Koji Ueda , Hiroki Endo , Hidenori Miyamoto
发明人： Tsutomu Sahoda , Koji Ueda , Hiroki Endo , Hidenori Miyamoto
CPC分类号： H01L21/6715 , B05C11/08
摘要： A rotating cup type liquid coating device with structure for suppressing pulsatory movement of the coated liquid when stopping rotation of the inner cup 3, includes a buffer space S formed for connecting an inner space of the inner cup 3 and an inner space of an outer cup 2 surrounding the inner cup, on an outer periphery of the inner cup 3 , through respective throttle portions 16, 17.
摘要翻译： 具有用于在停止内杯3的旋转时抑制被涂液体的脉动运动的结构的旋转杯式液体涂布装置包括形成为用于连接内杯3的内部空间和外杯的内部空间的缓冲空间S 2通过相应的节流部分16,17围绕内杯3在内杯3的外周上。
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公开(公告)号：US20120304921A1
公开(公告)日：2012-12-06
申请号：US13484625
申请日：2012-05-31
申请人： Hidenori Miyamoto , Tsutomu Sahoda
发明人： Hidenori Miyamoto , Tsutomu Sahoda
CPC分类号： H01L21/67173 , H01L21/67109 , H01L21/67253 , H01L21/6776 , H01L31/0322 , H01L31/0326 , Y02E10/541
摘要： A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part.
摘要翻译： 一种加热装置，包括：第一加热部和第二加热部，在所述第一加热部和第二加热部之间，在所述膜厚度方向的基板位置配置有具有涂膜的基板; 以及距离控制部，其控制所述基板位置与所述第一加热部之间的第一距离和所述基板位置与所述第二加热部之间的第二距离中的至少一个。
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