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公开(公告)号：US11773488B2
公开(公告)日：2023-10-03
申请号：US16426994
申请日：2019-05-30
发明人： David Joseph Mandia , Angel Yanguas-Gil , Devika Choudhury , Aliraeza Nassiri , Anil U. Mane , Jeffrey W. Elam
IPC分类号： C23C16/455 , C23C16/38 , C23C16/56
CPC分类号： C23C16/45553 , C23C16/38 , C23C16/56
摘要： ALD and p-CVD methods to generate MgB2 and MgB2-containing films in the growth temperature range of 250-300° C. The thermal ALD and p-CVD methods shown herein ensure that the high-temperature-induced roughening, which causes high surface resistances in MgB2 coatings grown by the mentioned conventional techniques, is avoided. The MgB2 and MgB2-containing films exhibit superconductive properties at above 20° K.
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2.发明授权公开(公告)号：US11414756B2
公开(公告)日：2022-08-16
申请号：US17038944
申请日：2020-09-30
发明人： Jeffrey W. Elam , Anil U. Mane , Stephen Magill
IPC分类号： C23C16/455 , C23C16/06 , C23C16/40 , C23C16/22
摘要： Time projection chambers are useful for high energy particle physics, nuclear physics, and astronomy. To enhance the particle detection efficiency and performance of the projection chambers functional bilayer thin film coatings based on the atomic layer deposition method are utilized. Coating material selection is based on Auger neutralization process ion induced electron emission from metallic surfaces (e.g., Mo or W) combined with a high secondary electron emission coefficient. Application of high secondary electron emission materials (e.g., MgO and CaF2) enhances the multiplication of these emitted electrons from ion induction processes. Therefore, using suitable bilayer coatings the overall TPC signal detection efficiency can be increased.
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公开(公告)号：US11351478B2
公开(公告)日：2022-06-07
申请号：US16123382
申请日：2018-09-06
申请人： UCHICAGO ARGONNE LLC
发明人： Seth B. Darling , Jeffrey W. Elam
IPC分类号： B01D17/02 , C02F1/40 , C02F1/28 , C23C16/455 , E02B15/04 , E02B15/10 , C02F101/32 , C02F103/00
摘要： A method of fabricating an coating includes providing a coating comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the coating to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The coating is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.
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公开(公告)号：US20220098736A1
公开(公告)日：2022-03-31
申请号：US17039822
申请日：2020-09-30
发明人： Anil U. Mane , Devika Choudhury , Jeffrey W. Elam
IPC分类号： C23C16/455 , H01M10/0562 , C23C16/38 , C23C16/44
摘要： A lithium boron coating and a method of producing the same. Atomic layer deposition deposits lithium and boron to form a lithium borate layer. The lithium borate maybe deposited as a solid electrolyte.
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公开(公告)号：US20210336240A1
公开(公告)日：2021-10-28
申请号：US16855676
申请日：2020-04-22
发明人： Anil U. Mane , Jason R. Croy , Jeffrey W. Elam , Arturo Gutierrez , Jihyeon Gim , Devika Choudhury , Eungje Lee , Hakim Iddir
IPC分类号： H01M4/04 , H01M10/0525 , C23C16/455 , H01M4/525 , H01M4/48 , H01M4/36
摘要： A method for coating of lithium ion electrode materials via atomic layer deposition. The coated materials may be integrated in part as a dopant in the electrode itself via heat treatment forming a doped lithium electrode.
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公开(公告)号：US20210098262A1
公开(公告)日：2021-04-01
申请号：US16588176
申请日：2019-09-30
发明人： Matthias John Young , Steven Payonk Letourneau , Devika Choudhury , Jeffrey W. Elam , Angel Yanguas-Gil , Anil U. Mane
IPC分类号： H01L21/311 , H01L21/027 , H01L21/033 , H01L21/02
摘要： A method of etching an organic or hybrid inorganic/organic material. The method etches molecular layer deposition coatings. An etching cycle comprises a first half reaction exposing the coating to a precursor. A second half reaction exposes a second precursor, removing or etching a portion of the coating.
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公开(公告)号：US20200378003A1
公开(公告)日：2020-12-03
申请号：US16426994
申请日：2019-05-30
发明人： David Joseph Mandia , Angel Yanguas-Gil , Devika Choudhury , Aliraeza Nassiri , Anil U. Mane , Jeffrey W. Elam
IPC分类号： C23C16/455 , C23C16/38 , C23C16/56
摘要： ALD and p-CVD methods to generate MgB2 and MgB2-containing films in the growth temperature range of 250-300° C. The thermal ALD and p-CVD methods shown herein ensure that the high-temperature-induced roughening, which causes high surface resistances in MgB2 coatings grown by the mentioned conventional techniques, is avoided. The MgB2 and MgB2-containing films exhibit superconductive properties at above 20° K.
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公开(公告)号：US20200339446A1
公开(公告)日：2020-10-29
申请号：US16392461
申请日：2019-04-23
摘要： A foam electrode comprising surface treatment by the steps of: 1) impregnating soft compressible polymeric foams with a conductive coating via sequential infiltration synthesis and 2) functionalizing the chemically altered voids with an ultrathin redox coating to enhance capacitive deionization (CDI). The redox coating will allow treated foam to absorb ions under the application of a bias, and mechanical compression/decompression. The CDI apparatus uses the void volume of the foam in the uncompressed state to flow liquids through it while the compressed state is used to enhance desalination by limiting the diffusion pathways for the ions to find an adsorption surface.
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公开(公告)号：US20200078705A1
公开(公告)日：2020-03-12
申请号：US16123382
申请日：2018-09-06
申请人： UCHICAGO ARGONNE LLC
发明人： Seth B. Darling , Jeffrey W. Elam
摘要： A method of fabricating an coating includes providing a coating comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the coating to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The coating is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.
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公开(公告)号：US10577466B2
公开(公告)日：2020-03-03
申请号：US15332335
申请日：2016-10-24
发明人： Seth B. Darling , Jeffrey W. Elam , Yu-Chih Tseng , Qing Peng
IPC分类号： C08F8/42 , C08G83/00 , H01L21/027 , H01G9/02 , H01J9/02 , H01L51/42 , H01L51/44 , H01M2/16 , H01M10/0565
摘要： A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.
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