Three-dimensional semiconductor nanoheterostructure and method of making same

    公开(公告)号:US10121935B2

    公开(公告)日:2018-11-06

    申请号:US13753844

    申请日:2013-01-30

    申请人: VI Systems GmbH

    摘要: A method for fabrication of three-dimensional nanostructures on top of the surface of a first solid state material is disclosed, which includes steps of (i) deposition of a layer of a second solid state material forming a stable layer-like coverage of the surface, (ii) the subsequent deposition of a third solid state material, having a stronger binding energy with the first solid state material than the second solid state material, (iii) wherein the third solid state material replaces the second solid state material forming an interface with the first material and thus reduces the energy of the system, and (iv) where the resulting excess second solid state material forms three-dimensional nanostructures. The structure can be covered with another (fourth) solid state material, which eventually can be the same as the first material or a different one, and the three dimensional nanostructures form capped quantum dots or quantum wires. The deposition steps can be repeated and extended to provide necessary functionality in the resulting device structure.

    Wavelength-stabilized near-field optoelectronic device

    公开(公告)号:US10777969B1

    公开(公告)日:2020-09-15

    申请号:US16656323

    申请日:2019-10-17

    申请人: VI Systems GmbH

    摘要: An in-plane-emitting semiconductor diode laser employs a surface-trapped optical mode existing at a boundary between a distributed Bragg reflector and a homogeneous medium, dielectric or air. The device can operate in both TM-polarized and TE-polarized modes. The mode exhibits an oscillatory decay in the DBR away from the surface and an evanescent decay in the dielectric or in the air. The active region is preferably placed in the top part of the DBR close to the surface. The mode behavior strongly depends on the wavelength of light, upon increase of the wavelength the mode becomes more and more extended into the homogeneous medium, the optical confinement factor of the mode in the active region drops until the surface-trapped mode vanishes. Upon a decrease of the wavelength, the leakage loss of the mode into the substrate increases. Thus, there is an optimum wavelength, at which the laser threshold current density is minimum, and at which the lasing starts. This optimum wavelength is temperature-stabilized, and shifts upon temperature increase at a low rate less than 0.1 nm/K, indicating wavelength-stabilized operation of the device. The approach applies also to semiconductor optical amplifiers or semiconductor gain chips which are also wavelength-stabilized. Reflectivity of the surface-trapped mode from an uncoated facet of the device can be extremely low, also

    Optoelectronic device with enhanced lateral leakage of high order transverse optical modes into alloy-intermixed regions and method of making same

    公开(公告)号:US10283937B2

    公开(公告)日:2019-05-07

    申请号:US15040965

    申请日:2016-02-10

    申请人: VI Systems GmbH

    摘要: Optoelectronic device undergoes selective chemical transformation like alloy compositional intermixing forming a non-transformed core region and an adjacent to it periphery where transformation has occurred. Activated by selective implantation or diffusion of impurities like Zinc or Silicon, implantation or diffusion of point defects, or laser annealing, transformation results in a change of the refractive index such that the vertical profile of the refractive index at the periphery is distinct from that in the core. Therefore the optical modes of the core are no longer orthogonal to the modes of the periphery, are optically coupled to them and exhibit lateral leakage losses to the periphery. High order transverse optical modes associated to the same vertical optical mode have higher lateral leakage losses to the periphery than the fundamental transverse optical mode, thus supporting single transverse mode operation of the device. This approach applies to single transverse mode vertical cavity surface emitting lasers, edge-emitting lasers and coherently coupled arrays of such devices.

    Optoelectronic device with resonant suppression of high order optical modes and method of making same

    公开(公告)号:US10243330B2

    公开(公告)日:2019-03-26

    申请号:US13771875

    申请日:2013-02-20

    申请人: VI Systems GmbH

    摘要: Optical beam quality of an optoelectronic device is improved by suppression of high-order transverse optical modes by their resonant interaction with the continuum of modes in the surrounding regions, such continuum being realized by replacement of one or several layers by layers having a lower refractive index. In particular, selective oxidation of GaAlAs-based vertical cavity surface emitting laser results in (Ga)AlO layers surrounding the aperture and having a lower refractive index than the original (Ga)AlAs layers. The continuum of optical modes originates due to the modification of the optical field in the areas surrounding the aperture caused by the low index insertions positioned to result in enhancement of the optical field in their vicinity. High-order lateral optical modes in the aperture region exhibit larger leakage losses than the fundamental lateral optical mode due to the resonant interaction with the continuum of modes outside the aperture, enabling single-mode lasing from a broad aperture vertical cavity surface emitting laser.

    Reliable high-speed oxide-confined vertical-cavity surface-emitting laser

    公开(公告)号:US10516251B2

    公开(公告)日:2019-12-24

    申请号:US15632133

    申请日:2017-06-23

    申请人: VI Systems GmbH

    IPC分类号: H01S5/183 H01S5/20

    摘要: An oxide-confined vertical cavity surface emitting laser including a distributed Bragg reflector (DBR) wherein the layers of the (DBR) includes a multi-section layer consisting of a first section having a moderately high aluminum composition, an second section which is an insertion having a low aluminum composition, and a third section which is an oxide-confined aperture formed by partial oxidation of a layer having a high aluminum composition (95% and above). A difference in aluminum composition between a high value in the aperture layer and a moderately high value in the first section prevents non-desirable oxidation of the first section from the mesa side while the aperture layer is being oxidized. A low aluminum composition in the second section prevents non-desirable oxidation in the vertical direction of the layer adjacent to the targeted aperture layer.

    THREE-DIMENSIONAL SEMICONDUCTOR NANOHETEROSTRUCTURE AND METHOD OF MAKING SAME

    公开(公告)号:US20180233624A1

    公开(公告)日:2018-08-16

    申请号:US13753844

    申请日:2013-01-30

    申请人: VI Systems GmbH

    摘要: A method for fabrication of three-dimensional nanostructures on top of the surface of a first solid state material is disclosed, which includes steps of (i) deposition of a layer of a second solid state material forming a stable layer-like coverage of the surface, (ii) the subsequent deposition of a third solid state material, having a stronger binding energy with the first solid state material than the second solid state material, (iii) wherein the third solid state material replaces the second solid state material forming an interface with the first material and thus reduces the energy of the system, and (iv) where the resulting excess second solid state material forms three-dimensional nanostructures. The structure can be covered with another (fourth) solid state material, which eventually can be the same as the first material or a different one, and the three dimensional nanostructures form capped quantum dots or quantum wires. The deposition steps can be repeated and extended to provide necessary functionality in the resulting device structure.