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公开(公告)号：US08351022B2
公开(公告)日：2013-01-08
申请号：US12774284
申请日：2010-05-05
CPC分类号： G03B27/54 , G03F7/7025
摘要： A radiation beam modification apparatus for controlling a property of a beam of radiation in a lithographic apparatus includes a flexible sheet provided with a plurality of apertures, and a positioning apparatus comprising a first rotatable member and a second rotatable member, wherein a first end portion of the flexible sheet is coupled to the first rotatable member, a second end portion of the flexible sheet is coupled to the second rotatable member and a central portion of the flexible sheet extends between the first rotatable member and the second rotatable member. The apertures may be used to control the numerical aperture of a projection system of a lithographic apparatus.
摘要翻译： 用于控制光刻设备中的辐射束的性质的辐射束修改设备包括设置有多个孔的柔性片和包括第一可旋转构件和第二可旋转构件的定位装置，其中第一端部 柔性片联接到第一可旋转构件，柔性片的第二端部联接到第二可旋转构件，并且柔性片的中心部分在第一可旋转构件和第二可旋转构件之间延伸。 孔可用于控制光刻设备的投影系统的数值孔径。
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2.发明授权公开(公告)号：US07929116B2
公开(公告)日：2011-04-19
申请号：US12010819
申请日：2008-01-30
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
摘要翻译： 光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。
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3.发明授权公开(公告)号：US07345740B2
公开(公告)日：2008-03-18
申请号：US11101630
申请日：2005-04-08
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
摘要翻译： 光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。
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公开(公告)号：US08675176B2
公开(公告)日：2014-03-18
申请号：US11353230
申请日：2006-02-14
申请人： Marinus Johanes Maria Van Dam , Wilhelmus Petrus De Boeij , Johannes Wilhelmus Wilhelmus De Klerk
发明人： Marinus Johanes Maria Van Dam , Wilhelmus Petrus De Boeij , Johannes Wilhelmus Wilhelmus De Klerk
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70566 , H01J37/3174 , H01J2237/30455 , H01J2237/31769
摘要： A lithographic apparatus includes an illuminator configured to provide a projection beam of radiation and a polarization controller configured to control an intensity of a preferred state of polarization of the projection beam. The lithographic apparatus further includes a support configured to hold a patterning device. The patterning device configured to pattern the projection beam according to a desired pattern. The apparatus also includes a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate.
摘要翻译： 光刻设备包括被配置为提供投射辐射束的照明器和被配置为控制投影光束的偏好偏振状态的强度的偏振控制器。 光刻设备还包括被配置为保持图案形成装置的支撑件。 所述图案形成装置被配置为根据期望的图案对投影光束进行图案化。 该设备还包括被配置为保持基板的基板台和配置成将图案化的光束投影到基板的目标部分上以在基板上形成图案化图像的投影系统。
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5.发明申请Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool 审中-公开无源光罩工具，光刻设备和在光刻工具中构图设备的方法公开(公告)号：US20100182582A1
公开(公告)日：2010-07-22
申请号：US11922018
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。
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6.发明申请Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof 审中-公开平版印刷设备，用于确定其极化特性的方法，极化分析仪和极化传感器公开(公告)号：US20100045956A1
公开(公告)日：2010-02-25
申请号：US11922056
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。
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7.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US06906787B2
公开(公告)日：2005-06-14
申请号：US10716938
申请日：2003-11-20
IPC分类号： G21K5/00 , G01J1/42 , G01J1/58 , G01T1/20 , G02B5/26 , G03F7/20 , G21K5/02 , H01L21/027 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70558 , G01J1/429 , G01J1/58 , G03F7/7085
摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of primary radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, the sensor including a radiation-sensitive material which converts incident primary radiation into secondary radiation, a radiation detector capable of detecting said secondary radiation emerging from said material, and a filter material for preventing secondary radiation from traveling in a direction away from the radiation detector.
摘要翻译： 光刻投影装置包括用于提供初级辐射的投影光束的辐射系统，用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构，用于保持基板的基板台， 系统，用于将图案化的光束投影到基板的目标部分上，辐射传感器，其可在由投影光束穿过的路径中移动，用于将一次辐射从投影光束接收，该传感器包括转换入射的辐射敏感材料 初级辐射进入次级辐射，能够检测从所述材料出射的所述次级辐射的辐射检测器和用于防止二次辐射沿远离辐射检测器的方向行进的过滤材料。
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8.发明申请公开(公告)号：US20100118288A1
公开(公告)日：2010-05-13
申请号：US11922020
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。
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9.发明授权Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby 有权透镜元件，光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07535644B2
公开(公告)日：2009-05-19
申请号：US11202370
申请日：2005-08-12
CPC分类号： G03F7/70275
摘要： A lens element comprises a first face and a second face, where the first face comprises a plurality of concave shaped lens parts. Each concave shaped lens part is arranged to focus a portion of a beam incident on the second face via a liquid on a single flat surface.
摘要翻译： 透镜元件包括第一面和第二面，其中第一面包括多个凹形透镜部分。 每个凹形透镜部分被布置成通过液体将入射在第二面上的光束的一部分聚焦在单个平坦表面上。
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10.发明授权Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing method 有权在光刻设备中的辐射束的横截面中的不同极化和器件制造方法公开(公告)号：US07317512B2
公开(公告)日：2008-01-08
申请号：US11177482
申请日：2005-07-11
CPC分类号： G03F7/70125 , G03F7/70566
摘要： A lithographic apparatus comprises an illumination system having optical elements capable of conditioning a radiation beam to comprise in cross-section a first portion of linearly polarized radiation and a second portion of unpolarized or circularly polarized radiation. The apparatus further comprises a support constructed to support a patterning device is provided, the patterning device being capable of imparting the illuminating radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is provided to hold a substrate, whilst a projection system is provided and configured to project the patterned radiation beam onto a target portion of the substrate.
摘要翻译： 光刻设备包括具有能够调节辐射束的光学元件的照明系统，其横截面包括线偏振辐射的第一部分和非偏振或圆偏振辐射的第二部分。 所述装置还包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予所述照射辐射束图案以形成图案化的辐射束。 提供衬底台以保持衬底，同时提供并配置投影系统以将图案化的辐射束投影到衬底的目标部分上。
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