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公开(公告)号：US5747120A
公开(公告)日：1998-05-05
申请号：US799085
申请日：1997-02-11
CPC分类号： C23C14/0605 , B82Y35/00 , C23C14/28 , G01Q70/14 , Y10S427/104 , Y10S977/879
摘要： Wear-resistant coatings composed of laser ablated hard carbon films, are deposited by pulsed laser ablation using visible light, on instruments such as microscope tips and micro-surgical tools. Hard carbon, known as diamond-like carbon (DLC), films produced by pulsed laser ablation using visible light enhances the abrasion resistance, wear characteristics, and lifetimes of small tools or instruments, such as small, sharp silicon tips used in atomic probe microscopy without significantly affecting the sharpness or size of these devices. For example, a 10-20 nm layer of diamond-like carbon on a standard silicon atomic force microscope (AFM) tip, enables the useful operating life of the tip to be increased by at least twofold. Moreover, the low inherent friction coefficient of the DLC coating leads to higher resolution for AFM tips operating in the contact mode.
摘要翻译： 由激光烧蚀的硬质碳膜组成的耐磨涂层通过脉冲激光烧蚀法使用可见光沉积在仪器如显微镜尖端和微型手术工具上。 被称为类金刚石碳（DLC）的硬质碳，通过使用可见光的脉冲激光烧蚀产生的膜增强了小型工具或仪器的耐磨性，磨损特性和使用寿命，例如在原子探针显微镜中使用的小而尖锐的硅尖端 而不会显着影响这些设备的清晰度或尺寸。 例如，在标准硅原子力显微镜（AFM）尖端上的10-20nm的类金刚石层，使尖端的有效工作寿命增加至少两倍。 此外，DLC涂层的低固有摩擦系数导致在接触模式下操作的AFM尖端的更高分辨率。
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公开(公告)号：US07118630B1
公开(公告)日：2006-10-10
申请号：US09636134
申请日：2000-08-10
申请人： Mehdi Balooch , Long N. Dinh , Wigbert J. Siekhaus
发明人： Mehdi Balooch , Long N. Dinh , Wigbert J. Siekhaus
IPC分类号： C23C16/00
CPC分类号： C23C14/0026 , C23C14/022 , C23C14/28
摘要： Short-wavelength photons are used to ablate material from a low work function target onto a suitable substrate. The short-wavelength photons are at or below visible wavelength. The elemental composition of the deposit is controlled by the composition of the target and the gaseous environment in which the ablation process is performed. The process is carried out in a deposition chamber to which a short-wavelength laser is mounted and which includes a substrate holder which can be rotated, tilted, heated, or cooled. The target material is mounted onto a holder that spins the target during laser ablation. In addition, the deposition chamber is provided with a vacuum pump, an external gas supply with atomizer and radical generator, a gas generator for producing a flow of molecules on the substrate, and a substrate cleaning device, such as an ion gun. The substrate can be rotated and tilted, for example, whereby only the tip of an emitter can be coated with a low work function material.
摘要翻译： 短波长光子用于将材料从低功函数目标消融到合适的基底上。 短波长光子处于或低于可见波长。 沉积物的元素组成由靶的组成和进行消融处理的气体环境控制。 该过程在安装有短波长激光器的沉积室中进行，其包括可旋转，倾斜，加热或冷却的衬底保持器。 目标材料安装在激光烧蚀过程中旋转目标的支架上。 此外，沉积室设置有真空泵，具有雾化器和自由基发生器的外部气体供应器，用于在基板上产生分子流的气体发生器和诸如离子枪的基板清洁装置。 例如，衬底可以旋转和倾斜，由此只有发射器的尖端可以用低功函数材料涂覆。
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3.发明授权Low work function surface layers produced by laser ablation using short-wavelength photons 失效使用短波长光子通过激光烧蚀产生的低功函数表面层
公开(公告)号：US6120857A
公开(公告)日：2000-09-19
申请号：US80109
申请日：1998-05-18
申请人： Mehdi Balooch , Long N. Dinh , Wigbert J. Siekhaus
发明人： Mehdi Balooch , Long N. Dinh , Wigbert J. Siekhaus
CPC分类号： C23C14/0026 , C23C14/022 , C23C14/28
摘要： Short-wavelength photons are used to ablate material from a low work function target onto a suitable substrate. The short-wavelength photons are at or below visible wavelength. The elemental composition of the deposit is controlled by the composition of the target and the gaseous environment in which the ablation process is performed. The process is carried out in a deposition chamber to which a short-wavelength laser is mounted and which includes a substrate holder which can be rotated, tilted, heated, or cooled. The target material is mounted onto a holder that spins the target during laser ablation. In addition, the deposition chamber is provided with a vacuum pump, an external gas supply with atomizer and radical generator, a gas generator for producing a flow of molecules on the substrate, and a substrate cleaning device, such as an ion gun. The substrate can be rotated and tilted, for example, whereby only the tip of an emitter can be coated with a low work function material.
摘要翻译： 短波长光子用于将材料从低功函数目标消融到合适的基底上。 短波长光子处于或低于可见波长。 沉积物的元素组成由靶的组成和进行消融处理的气体环境控制。 该过程在安装有短波长激光器的沉积室中进行，其包括可旋转，倾斜，加热或冷却的衬底保持器。 目标材料安装在激光烧蚀过程中旋转目标的支架上。 此外，沉积室设置有真空泵，具有雾化器和自由基发生器的外部气体供应器，用于在基板上产生分子流的气体发生器和诸如离子枪的基板清洁装置。 例如，衬底可以旋转和倾斜，由此只有发射器的尖端可以用低功函数材料涂覆。
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公开(公告)号：US5461907A
公开(公告)日：1995-10-31
申请号：US35741
申请日：1993-03-23
CPC分类号： G01Q60/38 , B82Y35/00 , G01Q70/10 , Y10S977/856
摘要： Instrumentation and techniques to image small objects, such as but not limited to individual human chromosomes, with nanometer resolution, to cut-off identified parts of such objects, to move around and manipulate such cut-off parts on the substrate on which they are being imaged to predetermined locations on the substrate, and to remove the cut-off parts from the substrate. This is accomplished using an atomic force microscope (AFM) and by modification of the conventional cantilever stylus assembly of an AFM, such that plural cantilevers are used with either sharp-tips or knife-edges thereon. In addition, the invention can be utilized for measuring hardness of materials.
摘要翻译： 用于将小物体（例如但不限于单个人类染色体）以纳米分辨率成像的仪器和技术，以截断所述物体的识别部分，以移动并操纵其正在其上的基底上的这种截止部分 成像到基板上的预定位置，并从基板去除截止部分。 这是使用原子力显微镜（AFM）和通过修改AFM的常规悬臂测针组件来实现的，使得在其上使用尖锐尖端或刀刃的多个悬臂。 此外，本发明可用于测量材料的硬度。
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公开(公告)号：US06351254B2
公开(公告)日：2002-02-26
申请号：US09110166
申请日：1998-07-06
IPC分类号： G09G320
CPC分类号： H01J1/308
摘要： A junction-based field emission display, wherein the junctions are formed by depositing a semiconducting or dielectric, low work function, negative electron affinity (NEA) silicon-based compound film (SBCF) onto a metal or n-type semiconductor substrate. The SBCF can be doped to become a p-type semiconductor. A small forward bias voltage is applied across the junction so that electron transport is from the substrate into the SBCF region. Upon entering into this NEA region, many electrons are released into the vacuum level above the SBCF surface and accelerated toward a positively biased phosphor screen anode, hence lighting up the phosphor screen for display. To turn off, simply switch off the applied potential across the SBCF/substrate. May be used for field emission flat panel displays.
摘要翻译： 一种基于结的场致发射显示器，其中通过将半导体或电介质，低功函数，负电子亲和力（NEA）硅基化合物膜（SBCF）沉积到金属或n型半导体衬底上而形成结。 可以将SBCF掺杂成为p型半导体。 在整个结上施加小的正向偏置电压，使得电子传输从衬底到SBCF区域。 在进入该NEA区域时，许多电子被释放到SBCF表面上方的真空水平中，并朝向正偏压的荧光屏阳极加速，从而点亮荧光屏以进行显示。 要关闭，只需关闭SBCF /基板上施加的电位。 可用于场致发射平板显示器。
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6.发明授权Generation of low work function, stable compound thin films by laser ablation 失效产生低功函数，通过激光烧蚀稳定复合薄膜公开(公告)号：US06235615B1
公开(公告)日：2001-05-22
申请号：US09504302
申请日：2000-02-15
申请人： Long N. Dinh , William McLean, II , Mehdi Balooch , Edward J. Fehring, Jr. , Marcus A. Schildbach
发明人： Long N. Dinh , William McLean, II , Mehdi Balooch , Edward J. Fehring, Jr. , Marcus A. Schildbach
IPC分类号： H01L2120
CPC分类号： C23C14/08 , C23C14/28 , Y10S117/904 , Y10S438/93
摘要： Generation of low work function, stable compound thin films by laser ablation. Compound thin films with low work function can be synthesized by simultaneously laser ablating silicon, for example, and thermal evaporating an alkali metal into an oxygen environment. For example, the compound thin film may be composed of Si/Cs/O. The work functions of the thin films can be varied by changing the silicon/alkali metal/oxygen ratio. Low work functions of the compound thin films deposited on silicon substrates were confirmed by ultraviolet photoelectron spectroscopy (UPS). The compound thin films are stable up to 500° C. as measured by x-ray photoelectron spectroscopy (XPS). Tests have established that for certain chemical compositions and annealing temperatures of the compound thin films, negative electron affinity (NEA) was detected. The low work function, stable compound thin films can be utilized in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.
摘要翻译： 产生低功函数，通过激光烧蚀稳定复合薄膜。 可以通过同时激光烧蚀硅来合成具有低功函数的复合薄膜，并将碱金属热蒸发到氧气环境中。 例如，化合物薄膜可以由Si / Cs / O组成。 可以通过改变硅/碱金属/氧比例来改变薄膜的功函数。 通过紫外光电子能谱（UPS）证实沉积在硅衬底上的复合薄膜的低功函数。 通过X射线光电子能谱（XPS）测量，复合薄膜可稳定至高达500℃。 测试确定了对于化合物薄膜的某些化学组成和退火温度，检测到负电子亲和力（NEA）。 低功函数，稳定的复合薄膜可用于太阳能电池，场致发射平板显示器，电子枪和冷阴极电子枪。
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公开(公告)号：US6162707A
公开(公告)日：2000-12-19
申请号：US80096
申请日：1998-05-18
申请人： Long N. Dinh , William McLean, II , Mehdi Balooch , Edward J. Fehring, Jr. , Marcus A. Schildbach
发明人： Long N. Dinh , William McLean, II , Mehdi Balooch , Edward J. Fehring, Jr. , Marcus A. Schildbach
CPC分类号： C23C14/08 , C23C14/28 , Y10S117/904 , Y10S438/93
摘要： Generation of low work function, stable compound thin films by laser ablation. Compound thin films with low work function can be synthesized by simultaneously laser ablating silicon, for example, and thermal evaporating an alkali metal into an oxygen environment. For example, the compound thin film may be composed of Si/Cs/O. The work functions of the thin films can be varied by changing the silicon/alkali metal/oxygen ratio. Low work functions of the compound thin films deposited on silicon substrates were confirmed by ultraviolet photoelectron spectroscopy (UPS). The compound thin films are stable up to 500.degree. C. as measured by x-ray photoelectron spectroscopy (XPS). Tests have established that for certain chemical compositions and annealing temperatures of the compound thin films, negative electron affinity (NEA) was detected. The low work function, stable compound thin films can be utilized in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.
摘要翻译： 产生低功函数，通过激光烧蚀稳定复合薄膜。 可以通过同时激光烧蚀硅来合成具有低功函数的复合薄膜，并将碱金属热蒸发到氧气环境中。 例如，化合物薄膜可以由Si / Cs / O组成。 可以通过改变硅/碱金属/氧比例来改变薄膜的功函数。 通过紫外光电子能谱（UPS）证实沉积在硅衬底上的复合薄膜的低功函数。 通过X射线光电子能谱（XPS）测量，复合薄膜在高达500℃时是稳定的。 测试确定了对于化合物薄膜的某些化学组成和退火温度，检测到负电子亲和力（NEA）。 低功函数，稳定的复合薄膜可用于太阳能电池，场致发射平板显示器，电子枪和冷阴极电子枪。
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公开(公告)号：US06019913A
公开(公告)日：2000-02-01
申请号：US80110
申请日：1998-05-18
CPC分类号： C23C14/22 , C23C14/0021 , C23C14/06 , H01J1/30 , H01J9/022
摘要： Low work function, stable compound clusters are generated by co-evaporation of a solid semiconductor (i.e., Si) and alkali metal (i.e., Cs) elements in an oxygen environment. The compound clusters are easily patterned during deposition on substrate surfaces using a conventional photo-resist technique. The cluster size distribution is narrow, with a peak range of angstroms to nanometers depending on the oxygen pressure and the Si source temperature. Tests have shown that compound clusters when deposited on a carbon substrate contain the desired low work function property and are stable up to 600.degree. C. Using the patterned cluster containing plate as a cathode baseplate and a faceplate covered with phosphor as an anode, one can apply a positive bias to the faceplate to easily extract electrons and obtain illumination.
摘要翻译： 通过在氧环境中共同蒸发固体半导体（即Si）和碱金属（即Cs）元素来产生低功函数，稳定的化合物簇。 使用常规的光刻胶技术，在沉积在衬底表面上时，化合物簇很容易被图案化。 簇尺寸分布窄，根据氧气压力和Si源温度，峰值范围为埃至纳米。 测试表明，当沉积在碳基板上时，化合物簇含有所需的低功函数特性，并且在600℃下是稳定的。使用图案化的聚集体板作为阴极底板和用磷光体作阳极覆盖的面板， 对面板施加正偏压以容易地提取电子并获得照明。
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9.发明申请公开(公告)号：US20100197144A1
公开(公告)日：2010-08-05
申请号：US12366141
申请日：2009-02-05
申请人： Curtis Dove , Cindy Dutton , Greg Bauer , Christopher Myers , Mehdi Balooch
发明人： Curtis Dove , Cindy Dutton , Greg Bauer , Christopher Myers , Mehdi Balooch
IPC分类号： H01L21/306
CPC分类号： H01L31/02363 , Y02E10/50
摘要： Methods for performing damage etch and texturing of single crystal silicon substrates, particularly for use as solar cells or photovoltaic cells. Damage etch with a TMAH solution followed by texturing using solution of KOH or NaOH mixed with IPA is particularly advantageous. The substitution of some of the IPA with ethylene glycol further improves results. Also disclosed is a process that combines both damage etch and texturing etch into a single step.
摘要翻译： 用于执行单晶硅衬底的损伤蚀刻和纹理化的方法，特别是用作太阳能电池或光伏电池的方法。 使用TMAH溶液进行损伤蚀刻，然后使用与IPA混合的KOH或NaOH溶液进行纹理化是特别有利的。 一些IPA与乙二醇的取代进一步提高了结果。 还公开了将损伤蚀刻和纹理蚀刻两者结合到单个步骤中的过程。
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公开(公告)号：US5019552A
公开(公告)日：1991-05-28
申请号：US482131
申请日：1990-02-20
CPC分类号： C04B41/009 , C04B41/5074 , C04B41/85 , C23C14/087 , C23C14/28 , H01L39/2448 , Y10S505/73 , Y10S505/732
摘要： A method of depositing thin films by means of laser vaporization employs a long-pulse laser (Nd-glass of about one millisecond duration) with a peak power density typically in the range 10.sup.5 -10.sup.6 W/cm.sup.2. The method may be used to produce high T.sub.c superconducting films of perovskite material. In one embodiment, a few hundred nanometers thick film of YBa.sub.2 Cu.sub.3 O.sub.7-x is produced on a SrTiO.sub.3 crystal substrate in one or two pulses. In situ-recrystallization and post-annealing, both at elevated temperature and in the presence of an oxidizing agenThe invention described herein arose in the course of, or under, Contract No. DE-C03-76SF0098 between the United States Department of Energy and the University of California.
摘要翻译： 通过激光蒸发沉积薄膜的方法采用通常在105-106W / cm 2范围内的峰值功率密度的长脉冲激光（大约1毫秒持续时间的Nd玻璃）。 该方法可用于生产钙钛矿材料的高Tc超导膜。 在一个实施例中，在一个或两个脉冲中，在SrTiO3晶体衬底上产生几百纳米厚的YBa2Cu3O7-x膜。 在高温和氧化剂存在下，原位重结晶和后退火有助于提高膜质量。 薄膜厚度表现出具有蒸汽发射角的cosθ依赖性，并且薄膜组成与该角度无关。
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