CROSSLINKED RANDOM COPOLYMER FILMS FOR BLOCK COPOLYMER DOMAIN ORIENTATION
    8.
    发明申请
    CROSSLINKED RANDOM COPOLYMER FILMS FOR BLOCK COPOLYMER DOMAIN ORIENTATION 有权
    用于块共聚体域定向的交错随机共聚物膜

    公开(公告)号:US20140263175A1

    公开(公告)日:2014-09-18

    申请号:US13828803

    申请日:2013-03-14

    CPC classification number: C08J7/04 B41N1/14 C08J2325/08 C08J2453/00 G03F7/0002

    Abstract: Surface-modifying layers, including neutral layers for vertical domain-forming block copolymers of styrene and methyl methacrylate are provided. Also provided are self-assembled block copolymer structures incorporating the surface modifying layers, methods of fabricating such structures and methods of using the structures in BCP lithography applications. The surface-modifying layers comprise a crosslinked copolymer film, wherein the crosslinked copolymers are random copolymers polymerized from styrene monomers and/or (meth)acrylate monomers and crosslinkable epoxy group-functionalized monomers. The crosslinked copolymer films are characterized by a high content of the crosslinkable epoxy group-functionalized monomer.

    Abstract translation: 提供表面改性层,包括苯乙烯和甲基丙烯酸甲酯的垂直结构形成嵌段共聚物的中性层。 还提供了包含表面改性层的自组装嵌段共聚物结构,制造这种结构的方法以及在BCP光刻应用中使用该结构的方法。 表面改性层包括交联共聚物膜,其中交联共聚物是由苯乙烯单体和/或(甲基)丙烯酸酯单体和可交联的环氧基官能化单体聚合的无规共聚物。 交联共聚物膜的特征在于交联性环氧基官能化单体的含量高。

    DEGRADABLE NEUTRAL LAYERS FOR BLOCK COPOLYMER LITHOGRAPHY APPLICATIONS
    9.
    发明申请
    DEGRADABLE NEUTRAL LAYERS FOR BLOCK COPOLYMER LITHOGRAPHY APPLICATIONS 有权
    用于嵌段共聚物光刻应用的可降解中性层

    公开(公告)号:US20140263164A1

    公开(公告)日:2014-09-18

    申请号:US13831193

    申请日:2013-03-14

    Abstract: Polymer films comprising crosslinked random copolymers and methods for making the films are provided. Also provided are polymer films comprising random copolymers that are covalently linked to an underlying substrate. The polymer films can be incorporated into structures in which the films are employed as surface-modifying layers for domain-forming block copolymers and the structures can be used for pattern transfer applications via block copolymer lithography. The crosslinks between the random copolymer chains in the polymer films or the links between the random copolymer chains and the substrate surface are characterized in that they can be cleaved under relatively mild conditions.

    Abstract translation: 提供包含交联无规共聚物的聚合物薄膜和制备薄膜的方法。 还提供了包含共价连接到下面的基底的无规共聚物的聚合物膜。 聚合物膜可以结合到其中使用膜作为区域形成嵌段共聚物的表面改性层的结构中,并且该结构可以通过嵌段共聚物光刻用于图案转移应用。 聚合物膜中的无规共聚物链之间的交联或无规共聚物链与基材表面之间的连接的特征在于它们可以在相对温和的条件下裂解。

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