1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive
compositions containing these compounds
    1.
    发明授权
    1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds 失效
    含有这些化合物的1,2-萘磺酸-2-二亚磺酸 - 酰胺类和感光性组合物

    公开(公告)号:US5162190A

    公开(公告)日:1992-11-10

    申请号:US373036

    申请日:1989-06-29

    摘要: A compound of the general formula I ##STR1## in which D denotes a 1,2-naphthoquinone-2-diazide-4-sulfonyl or - 5-sulfonyl radical,R.sup.1 denotes an alkylene group andR.sup.2 denotes a hydrogen atom, an alkyl group or a group R.sup.1 --OH,or of the general formula II ##STR2## in which X denotes an alkylene group, an arylene group or a group of the formulaNH--Y--NH, wherein Y is an alkylene group or an arylene group,R.sup.3 denotes an alkylene group, which may be interrupted by ether oxygen atoms,n is a number from 1 to 40 andm is a number from 0 to 50,the ratio m:(m+n) being from 0:100 to 95:100 and R.sup.1 and D having the above-indicated meaning, are disclosed. The compounds may be used in positive-working photosenitive materials for the production of printing plates and photoresists. Compounds according to formula II do not require an addition of polymeric binders.

    摘要翻译: 其中D表示1,2-萘醌-2-重氮基-4-磺酰基或-5-磺酰基的通式I(I)的化合物,R 1表示亚烷基,R 2表示氢原子, 烷基或基团R 1 -OH,或通式II其中X表示亚烷基,亚芳基或式NH-Y-NH基,其中Y 是亚烷基或亚芳基,R3表示可被醚氧原子间隔的亚烷基,n为1〜40的数,m为0〜50的数,m:(m + n )为0:100〜95:100,R1和D为上述含义。 这些化合物可用于生产印刷板和光致抗蚀剂的正性光敏材料。 根据式II的化合物不需要加入聚合物粘合剂。

    Positive-working radiation-sensitive mixture
    2.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号:US4506003A

    公开(公告)日:1985-03-19

    申请号:US551025

    申请日:1983-11-14

    摘要: A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.

    摘要翻译: 描述了一种正性辐射敏感性混合物,其由具有至少一个可被酸分解的COC键的化合物,在照射时形成强酸的化合物,不溶于水并且可溶于水的粘合剂 - 碱性溶液和具有与粘合剂不同的溶解性的树脂,其选自(1)由有机异氰酸酯和含有羟基的聚合物得到的聚氨酯树脂,(2)聚乙烯基烷基醚,( 3)丙烯酸烷基酯聚合物,或(4)氢化或部分氢化的松香衍生物。 作为树脂添加剂的结果,获得了对支持物具有良好粘附性的光致抗蚀剂层,良好的柔韧性,显影良好的分辨率和良好的分辨率。

    Light-sensitive, diazonium group-containing polycondensation product,
process for its production, and light-sensitive recording material
containing this polycondensation product
    4.
    发明授权
    Light-sensitive, diazonium group-containing polycondensation product, process for its production, and light-sensitive recording material containing this polycondensation product 失效
    含有感光性重氮基团的缩聚产物,其生产方法和含有该缩聚产物的光敏记录材料

    公开(公告)号:US4661432A

    公开(公告)日:1987-04-28

    申请号:US824257

    申请日:1986-01-23

    CPC分类号: G03F7/021 C08G12/08 C08G61/02

    摘要: A light-sensitive, diazonium group-containing polycondensation product is described which comprises(a) an optionally substituted diphenylamine-dianzonium salt I.(b) a compound corresponding to the formula IIR.sup.4 --O--CH.sub.2 --R.sup.5 (II) whereinR.sup.4 is H, alkyl or acyl, andR.sup.5 is an optionally substituted aromatic radical, and(c) a compound corresponding to the formula IIIR.sup.6 --O--CH.sub.2 --R.sup.8 --CH.sub.2 --O--R.sup.7 (III) whereinR.sup.6 and R.sup.7 are H, alkyl, or acyl andR.sup.8 is the radical of a compound selected from the group consisting of aromatic hydrocarbons, phenols, phenolethers, aromatic thioethers, aromatic heterocyclic compounds, and organic acid amides,with the radicals resulting from compound II being directing linked to the units of the diazonium salt I.In the production of the polycondensation product, I is first condensed with II and then with III. The product is suitable for use as a light-sensitive substance in recording materials, particularly in printing plates, and yields light-hardening products which have an increased oleophilicity.

    摘要翻译: 描述了含有感光的含重氮基团的缩聚产物,其包含(a)任选取代的二苯胺 - 二氮鎓盐I.(b)对应于式II的化合物R4-O-CH2-R5(Ⅱ)的化合物,其中R4是 H,烷基或酰基,R 5是任选取代的芳族基,和(c)对应于式III的化合物R6-O-CH2-R8-CH2-O-R7(Ⅲ),其中R6和R7是H, 或酰基,并且R 8是选自芳族烃,酚,苯醚,芳族硫醚,芳族杂环化合物和有机酸酰胺的化合物的基团,其中由化合物II产生的自由基与 重氮盐I.在缩聚产物的生产中,I首先与II缩合,然后与III缩合。 该产品适用于记录材料中的光敏物质,特别是在印版中,并产生具有增加的亲油性的光硬化产品。

    Process for the preparation of screen printing stencils by an
electroplating method
    6.
    发明授权
    Process for the preparation of screen printing stencils by an electroplating method 失效
    通过电镀法制备丝网印刷模板的方法

    公开(公告)号:US4401520A

    公开(公告)日:1983-08-30

    申请号:US244965

    申请日:1981-03-18

    IPC分类号: B41C1/14 G03F7/12 C25D1/08

    CPC分类号: G03F7/12

    摘要: This invention relates to an improvement in the process for the preparation of screen printing stencils by an electroplating method, which comprises coating a metallic matrix, provided in the manner of a screen with dots of insulating material, with a photoresist layer, exposing the photoresist layer imagewise and developing it by washing out, and rendering those areas of the photoresist layer which have remained in place electrically conductive in the course of imaging, electrodepositing metal up to a desired height on the conductive image stencil and on the matrix ridges surrounding the insulating screen dots, and removing the patterned screen printing stencil thus obtained from the matrix, the improvement which comprises rendering the photoresist layer conductive only on its surface and before developing.

    摘要翻译: 本发明涉及通过电镀方法制备丝网印刷模版的方法的改进,该方法包括以带有点绝缘材料的丝网的方式涂覆金属基体与光致抗蚀剂层,使光致抗蚀剂层曝光 成像并通过洗出来显影,并且在成像过程中使保留在导电的光致抗蚀剂层的那些区域电镀到导电图案模板上的所需高度和围绕绝缘屏幕的矩阵脊上 点,并且从矩阵中去除由此获得的图案化丝网印刷模板,其改进包括使光致抗蚀剂层仅在其表面上导电并且在显影之前。

    Diazo light-sensitive copying composition and process of using in the
manufacture of screen printing stencils
    7.
    发明授权
    Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils 失效
    重氮感光复印组合物和在制造丝网印刷模板中使用的方法

    公开(公告)号:US4021243A

    公开(公告)日:1977-05-03

    申请号:US651317

    申请日:1976-01-22

    CPC分类号: C08G73/00 G03F7/021 G03F7/12

    摘要: This invention relates to a light-sensitive copying composition for the preparation of screen printing stencils comprising a condensation product of an aromatic diazonium compound in admixture with a hydrophilic hardenable binder, the condensation product containing at least one unit each of the general types A(-D).sub.n and B which are connected by bivalent intermediate members derived from a condensable carbonyl compound, whereinA is a radical of a compound containing at least two isocyclic or heterocyclic aromatic nuclei, which compound is capable of condensation in at least one position with an active carbonyl compound in an acid medium,D is a diazonium salt group attached to an aromatic carbon atom of A,n is an integer from 1 to 10, andB is a radical of a compound free of diazonium groups, which compound is capable of condensation in at least one position with an active carbonyl compound in an acid medium,And wherein the anion of the diazonium salt is derived from an aliphatic monosulfonic acid having 1 to 6 carbon atoms.

    摘要翻译: 本发明涉及一种用于制备丝网印刷模版的光敏复印组合物,其包含芳族重氮化合物与亲水性可硬化粘合剂的混合物的缩合产物,所述缩合产物含有至少一个单元,每个单元各自具有一般类型A( - D)n和B,其通过衍生自可缩合羰基化合物的二价中间体连接,其中A是含有至少两个环状或杂环芳族核的化合物的基团,该化合物能够在至少一个位置与 活性羰基化合物,D是与A的芳香族碳原子连接的重氮盐基,n是1〜10的整数,B是不含重氮基的化合物的基团,该化合物能够 在酸性介质中在至少一个位置与活性羰基化合物进行缩合,并且其中DIAZONIUM盐的阴离子衍生自ALIPHA MON 具有1至6个碳原子的有机酸。

    Photopolymerizable mixture and photopolymerizable copying material
containing same
    8.
    发明授权
    Photopolymerizable mixture and photopolymerizable copying material containing same 失效
    可光聚合的混合物和含有它们的可光聚合的复印材料

    公开(公告)号:US5217845A

    公开(公告)日:1993-06-08

    申请号:US766975

    申请日:1991-09-26

    摘要: A photopolymerizable mixture is described which contains a polymeric binder, a polymerizable compound and an acridine compound of the general formula I ##STR1## as photoinitiator, in which R.sup.1 denotes an optionally substituted alkyl or acyl group,R.sup.2, R.sup.3 are identical or different and denoteand R.sup.4 hydrogen or halogen atoms or optionally substituted alkyl or acyl groups,R.sup.5, R.sup.6 are identical or different and denoteand R.sup.7 hydrogen or halogen atoms or optionally substituted alkyl, aryl or acyl groups, or groups of the formula II ##STR2## The photoinitiators yield a mixture having high photosensitivity and have a lower tendency to diffusion than the known 9-phenylacridine.

    摘要翻译: 描述了一种可光聚合的混合物,其包含聚合物粘合剂,可聚合化合物和作为光引发剂的通式I(I)的吖啶化合物,其中R 1表示任选取代的烷基或酰基,R 2,R 3相同或 不同且表示和R 4氢或卤素原子或任选取代的烷基或酰基,R 5,R 6相同或不同,表示和R 7的氢或卤原子或任选取代的烷基,芳基或酰基或式II的基团(II)光引发剂产生具有高光敏性并且具有比已知的9-苯基吖啶更低的扩散倾向的混合物。

    Process for stripping light-hardened photoresist layers
    9.
    发明授权
    Process for stripping light-hardened photoresist layers 失效
    剥离光硬化光致抗蚀剂层的方法

    公开(公告)号:US4776892A

    公开(公告)日:1988-10-11

    申请号:US899993

    申请日:1986-08-22

    CPC分类号: G03F7/425

    摘要: Light-hardened photoresist layers are stripped by treating the layer with an aqueous solution of an organic quaternary ammonium base and, optionally a strong inorganic base. The resulting layer residues are dispersed as relatively small flakes which do not become lodged between conducting paths.

    摘要翻译: 通过用有机季铵碱和任选的强无机碱的水溶液处理该层来剥离光硬化的光致抗蚀剂层。 所得到的层残留物分散成相对较小的薄片,其不会在导电路径之间变窄。

    Photosensitive mixture and photosensitive recording material with
diazonium salt polycondensation product and free radical radiation
polymerizable composition
    10.
    发明授权
    Photosensitive mixture and photosensitive recording material with diazonium salt polycondensation product and free radical radiation polymerizable composition 失效
    光敏混合物和感光记录材料与重氮盐缩聚产物和自由基辐射聚合组合物

    公开(公告)号:US4659645A

    公开(公告)日:1987-04-21

    申请号:US753132

    申请日:1985-07-09

    CPC分类号: G03F7/0955 G03F7/016

    摘要: A photosensitive mixture comprised of(a) a diazonium salt polycondensation product comprising recurring units of the formulas A--N.sub.2 X and B, which units are linked by bivalent intermediate members derived from a carbonyl compound which is capable of condensation, wherein the A--N.sub.2 X units are derived from aromatic diazonium compounds that are capable of condensation with formaldehyde, and the B units are derived from compounds which are free from diazonium groups and are also capable of condensation with formaldehyde in a strongly acidic medium;(b) a compound which can be polymerized by a free-radical process;(c) a photopolymerization initiator; and(d) a polymeric binder that is insoluble in water, but soluble in organic solventscan be used in the production of photosensitive printing plates and photoresists.

    摘要翻译: 一种感光性混合物,其包含(a)包含式A-N2X和B的重复单元的重氮盐缩聚产物,该单元由能够缩合的羰基化合物的二价中间体连接,其中A-N2X单元 衍生自能够与甲醛缩合的芳族重氮化合物,并且B单元衍生自不含重氮基团并且还能够在强酸性介质中与甲醛缩合的化合物; (b)可以通过自由基方法聚合的化合物; (c)光聚合引发剂; 和(d)不溶于水但可溶于有机溶剂的聚合物粘合剂可用于生产光敏印版和光致抗蚀剂。