摘要:
Aspects of the invention are directed to a method of forming graphene structures. Initially, a cluster of particles is received. The cluster of particles comprises a plurality of particles with each particle in the plurality of particles contacting one or more other particles in the plurality of particles. Subsequently, one or more layers are deposited on the cluster of particles with the one or more layers comprising graphene. The plurality of particles are then etched away without substantially etching the deposited one or more layers. Lastly, the remaining one or more layers are dried. The resultant graphene structures are particularly resistant to the negative effects of aggregation and compaction.
摘要:
A silicon graphene-incorporated rechargeable Li-ion battery with enhanced energy delivery and cycling life comprising a high-performance Si/graphene composite anode, a cathode film and electrolyte is disclosed. The anode and cathode are immersed in or partially immersed in the electrolyte; wherein the anode is formed of a mixture of carbon coated Si and graphene composite with a polymer binder and a conductive additive. A method for fabricating such Si and graphene-based anode comprises the steps synthesis of carbon coated Si particles by polymer encapsulation and carbonization; enveloping the coated Si particles in graphene by mechanical agitation; formulating the carbon coated Si and graphene with a polymer binder and conductive additive; depositing the mixture onto current collectors. The anode structure affords a combination of superior rate capability, cycling life and improved volumetric capacity.
摘要:
Aspects of the invention are directed to a method of forming graphene structures. Initially, a cluster of particles is received. The cluster of particles comprises a plurality of particles with each particle in the plurality of particles contacting one or more other particles in the plurality of particles. Subsequently, one or more layers are deposited on the cluster of particles with the one or more layers comprising graphene. The plurality of particles are then etched away without substantially etching the deposited one or more layers. Lastly, the remaining one or more layers are dried. The resultant graphene structures are particularly resistant to the negative effects of aggregation and compaction.
摘要:
Aspects of the invention are directed to a method for forming a graphene composite structure. Initially, an encapsulating film is formed on a substrate. The encapsulating film comprises graphene. Subsequently, a plurality of particles are deposited on the encapsulating film, and then a temporary layer is deposited on the plurality of active particles and the encapsulating film. The substrate is then removed. Lastly, the temporary layer is also removed so as to cause the plurality of particles to form a cluster that is at least partially encapsulated by the encapsulating film.
摘要:
In general, in one aspect, a graphene film is used as a protective layer for current collectors in electrochemical energy conversion and storage devices. The graphene film inhibits passivation or corrosion of the underlying metals of the current collectors without adding additional weight or volume to the devices. The graphene film is highly conductive so the coated current collectors maintain conductivity as high as that of underlying metals. The protective nature of the graphene film enables less corrosion resistant, less costly and/or lighter weight metals to be utilized as current collectors. The graphene film may be formed directly on Cu or Ni current collectors using chemical vapor deposition (CVD) or may be transferred to other types of current collectors after formation. The graphene film coated current collectors may be utilized in batteries, super capacitors, dye-sensitized solar cells, and fuel and electrolytic cells.
摘要:
Aspects of the invention are directed to a method for forming a graphene composite structure. Initially, an encapsulating film is formed on a substrate. The encapsulating film comprises graphene. Subsequently, a plurality of particles are deposited on the encapsulating film, and then a temporary layer is deposited on the plurality of active particles and the encapsulating film. The substrate is then removed. Lastly, the temporary layer is also removed so as to cause the plurality of particles to form a cluster that is at least partially encapsulated by the encapsulating film.
摘要:
An article of manufacture comprises an electrically conductive plate and one or more hybrid layers stacked on the electrically conductive plate. Each of the one or more hybrid layers comprises a respective sheet comprising graphene. Each of the one or more hybrid layers also comprises a respective plurality of particles disposed on the respective sheet. Finally, each of the one or more hybrid layers comprises a respective ion conducting film disposed on the respective plurality of particles and the respective sheet.
摘要:
Graphene transistor devices and methods of their fabrication are disclosed. One such graphene transistor device includes source and drain electrodes and a gate structure including a dielectric sidewall spacer that is disposed between the source and drain electrodes. The device further includes a graphene layer that is adjacent to at least one of the source and drain electrodes, where an interface between the source/drain electrode(s) and the graphene layer maintains a consistent degree of electrical conductivity throughout the interface.
摘要:
Aspects of the invention are directed to a method of forming a thin film adhered to a target substrate. The method comprises the steps of: (i) forming the thin film on a deposition substrate; (ii) depositing a support layer on the thin film; (iii) removing the deposition substrate without substantially removing the thin film and the support layer; (iv) drying the thin film and the support layer while the thin film is only adhered to the support layer; (v) placing the dried thin film and the dried support layer on the target substrate such that the thin film adheres to the target substrate; and (vi) removing the support layer without substantially removing the thin film and the target substrate.
摘要:
A silicon nitride layer is provided on an uppermost surface of a graphene layer and then a hafnium dioxide layer is provided on an uppermost surface of the silicon nitride layer. The silicon nitride layer acts as a wetting agent for the hafnium dioxide layer and thus prevents the formation of discontinuous columns of hafnium dioxide atop the graphene layer. The silicon nitride layer and the hafnium dioxide layer, which collectively form a low EOT bilayer gate dielectric, exhibit continuous morphology atop the graphene layer.