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    Method and apparatus for face-up substrate polishing
    5.
    发明授权
    Method and apparatus for face-up substrate polishing 失效
    面朝上衬底抛光的方法和装置

    公开(公告)号：US06776693B2

    公开(公告)日：2004-08-17

    申请号：US10163796

    申请日：2002-06-04

    申请人： Alain Duboust ,  Shou-Sung Chang ,  Liang-Yuh Chen ,  Yan Wang ,  Siew Neo ,  Lizhong Sun ,  Feng Q. Liu

    发明人： Alain Duboust ,  Shou-Sung Chang ,  Liang-Yuh Chen ,  Yan Wang ,  Siew Neo ,  Lizhong Sun ,  Feng Q. Liu

    IPC分类号： B24B100

    CPC分类号： B24B37/046 ,  B23H5/08 ,  B24B37/042

    摘要： A method and apparatus are provided for polishing a substrate surface. In one aspect, an apparatus for polishing a substrate includes a basin and a polishing head. A carrier is disposed in the basin and has a substrate supporting surface. A retaining ring is disposed on the carrier and at least partially circumscribes the substrate supporting surface. The polishing head is supported above the basin and includes a conductive polishing pad. Embodiments may further include a vent to allow gas to escape through the polishing head. Embodiments may further include an electrolyte supply that flows electrolyte into the polishing head and out through a permeable electrode and the conductive pad to the substrate. Embodiments may also be configured with a polishing head diameter smaller than the substrate supported by the carrier.

    摘要翻译： 提供了一种用于抛光衬底表面的方法和装置。 一方面，用于抛光衬底的装置包括盆和抛光头。 载体布置在盆中并具有基底支撑表面。 保持环设置在载体上并且至少部分地限定基板支撑表面。 抛光头支撑在盆面上方，并包括导电抛光垫。 实施例还可包括通气孔，以允许气体通过抛光头逸出。 实施例还可以包括将电解质流入抛光头并通过可渗透电极流出并将导电垫流到基底的电解质供应。 实施例还可以被配置为具有小于由载体支撑的基板的抛光头直径。

    Control of removal profile in electrochemically assisted CMP
    6.
    发明授权
    Control of removal profile in electrochemically assisted CMP 失效
    电化学辅助CMP中去除曲线的控制

    公开(公告)号：US06991526B2

    公开(公告)日：2006-01-31

    申请号：US10244697

    申请日：2002-09-16

    申请人： Lizhong Sun ,  Liang-Yuh Chen ,  Siew Neo ,  Feng Q. Liu ,  Alain Duboust ,  Stan D. Tsai ,  Rashid Mavliev

    发明人： Lizhong Sun ,  Liang-Yuh Chen ,  Siew Neo ,  Feng Q. Liu ,  Alain Duboust ,  Stan D. Tsai ,  Rashid Mavliev

    IPC分类号： B24B1/00 ,  C25F7/00

    CPC分类号： B24B37/042 ,  B23H5/08

    摘要： Aspects of the invention generally provide a method and apparatus for polishing a substrate using electrochemical deposition techniques. In one aspect, an apparatus for polishing a substrate comprises a counter-electrode and a pad positioned between a substrate and the counter-electrode and a pad positioned between a substrate and the counter-electrode. A dielectric insert is positioned between the counter-electrode and the substrate. The dielectric insert has a plurality of zones, each zone permitting a separate current density between the counter-electrode and the substrate. In another embodiment, an apparatus for polishing a substrate that include a conductive layer comprises a counter-electrode to the material layer. The counter-electrode comprises a plurality of electrically isolated conductive elements. An electrical connector is separately coupled to each of the conductive elements.

    摘要翻译： 本发明的各方面通常提供使用电化学沉积技术来抛光衬底的方法和装置。 一方面，用于研磨衬底的装置包括对电极和位于衬底和对电极之间的衬垫以及位于衬底和对电极之间的衬垫。 电介质插入件位于对电极和衬底之间。 电介质插入件具有多个区域，每个区域允许在对电极和衬底之间分开的电流密度。 在另一个实施例中，用于抛光包括导电层的衬底的装置包括与材料层相对的对电极。 对电极包括多个电绝缘的导电元件。 电连接器分别耦合到每个导电元件。