公开(公告)号：US20120019813A1

公开(公告)日：2012-01-26

申请号：US13145212

申请日：2010-01-22

申请人： Yasuhiro Yoshitake ,  Minoru Yoshida ,  Keiko Oka

发明人： Yasuhiro Yoshitake ,  Minoru Yoshida ,  Keiko Oka

IPC分类号： G01J1/00

CPC分类号： G01M11/0257 ,  G01M11/0207

摘要： Measurement cannot be made when trying to measure a wavefront aberration of a wide-angle lens, being wide in a field of view, comparing to a focus distance, by a Shack-Hartmann sensor, since an inclination of the wavefront exceeds an allowable value of inclination of the Shack-Hartmann sensor.The Shack-Hartmann sensor is inclined at a position of a pupil of a lens, and is controlled so that it lies within the allowable value mentioned above. Photographing is made through step & repeat while overlapping at the same position, to compose in such a manner that overlapping spots are piled up, and thereby measuring the wavefront aberration of the lens having a large pupil diameter.

摘要翻译： 当通过Shack-Hartmann传感器测量广角镜头的波前像差（与视场相比宽的焦点距离）时，不能进行测量，因为波前的倾斜度超过了允许值 Shack-Hartmann传感器的倾角。 Shack-Hartmann传感器在透镜的瞳孔的位置处倾斜，并被控制成使其位于上述容许值内。 通过步骤重复进行拍摄，同时在相同位置重叠，以这样的方式组合，使得重叠的斑点堆积，从而测量具有大瞳孔直径的透镜的波前像差。

公开(公告)号：US08705024B2

公开(公告)日：2014-04-22

申请号：US13145212

申请日：2010-01-22

申请人： Yasuhiro Yoshitake ,  Minoru Yoshida ,  Keiko Oka

发明人： Yasuhiro Yoshitake ,  Minoru Yoshida ,  Keiko Oka

IPC分类号： G01J1/00

CPC分类号： G01M11/0257 ,  G01M11/0207

摘要： Measurement cannot be made when trying to measure a wavefront aberration of a wide-angle lens, being wide in a field of view, comparing to a focus distance, by a Shack-Hartmann sensor, since an inclination of the wavefront exceeds an allowable value of inclination of the Shack-Hartmann sensor. The Shack-Hartmann sensor is inclined at a position of a pupil of a lens, and is controlled so that it lies within the allowable value mentioned above. Photographing is made through step & repeat while overlapping at the same position, to compose in such a manner that overlapping spots are piled up, and thereby measuring the wavefront aberration of the lens having a large pupil diameter.

摘要翻译： 当通过Shack-Hartmann传感器测量广角镜头的波前像差（与视场相比宽的焦点距离）时，不能进行测量，因为波前的倾斜度超过了允许值 Shack-Hartmann传感器的倾角。 Shack-Hartmann传感器在透镜的瞳孔的位置处倾斜，并被控制成使其位于上述容许值内。 通过步骤重复进行拍摄，同时在相同位置重叠，以这样的方式组合，使得重叠的斑点堆积，从而测量具有大瞳孔直径的透镜的波前像差。

公开(公告)号：US08736830B2

公开(公告)日：2014-05-27

申请号：US13145968

申请日：2009-12-10

申请人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

发明人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

IPC分类号： G01N21/00

CPC分类号： G01Q60/22 ,  G01N21/95607 ,  G11B5/84

摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.

摘要翻译： 提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

公开(公告)号：US20120013890A1

公开(公告)日：2012-01-19

申请号：US13145968

申请日：2009-12-10

申请人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

发明人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

IPC分类号： G01N21/956 ,  G01N21/47

CPC分类号： G01Q60/22 ,  G01N21/95607 ,  G11B5/84

摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.

摘要翻译： 提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

公开(公告)号：US08553214B2

公开(公告)日：2013-10-08

申请号：US12876709

申请日：2010-09-07

申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

摘要： An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.

摘要翻译： 一种检查装置和方法，包括光源，具有偏振控制器和物镜的照明单元，用于利用从光源发射并通过偏振控制器和物镜的光照射样本;检测单元，具有用于 检测由所述照明单元照射的样本的光;处理器，其处理从所述传感器输出的信号以检测所述样本上的缺陷;以及显示器，其显示从所述处理器输出的信息。 处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

公开(公告)号：US20100182589A1

公开(公告)日：2010-07-22

申请号：US12626963

申请日：2009-11-30

申请人： Takenori HIROSE ,  Minoru Yoshida ,  Hideaki Sasazawa ,  Yasuhiro Yoshitake

发明人： Takenori HIROSE ,  Minoru Yoshida ,  Hideaki Sasazawa ,  Yasuhiro Yoshitake

IPC分类号： G01J3/08 ,  G01J3/00

CPC分类号： G01J3/02 ,  G01B2210/56 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0229 ,  G01N21/95607

摘要： In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.

摘要翻译： 在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中，有利的是在短波长范围内使用宽波长范围的光。 然而，实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。 本发明提供一种用于检测图案缺陷的检查装置。 检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。 光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜，该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。

公开(公告)号：US20090073443A1

公开(公告)日：2009-03-19

申请号：US12271348

申请日：2008-11-14

申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

IPC分类号： G01J4/00

CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

摘要： An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.

摘要翻译： 一种检查装置和方法，包括发射紫外线激光的光源，具有偏振光控制器和物镜的照明单元，用于利用从光源发出并通过偏振光控制器和物镜的光照射样本， 检测单元，具有用于检测由照明单元照射的样本的光的传感器;处理器，处理从传感器输出的信号以检测样本上的缺陷;以及显示器，显示从处理器输出的信息。 处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

公开(公告)号：US07791725B2

公开(公告)日：2010-09-07

申请号：US12271348

申请日：2008-11-14

申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

IPC分类号： G01J4/00

CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

摘要： An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.

摘要翻译： 一种检查装置和方法，包括发射紫外线激光的光源，具有偏振光控制器和物镜的照明单元，用于利用从光源发出并通过偏振光控制器和物镜的光照射样本， 检测单元，具有用于检测由照明单元照射的样本的光的传感器;处理器，处理从传感器输出的信号以检测样本上的缺陷;以及显示器，显示从处理器输出的信息。 处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

公开(公告)号：US07456963B2

公开(公告)日：2008-11-25

申请号：US11593091

申请日：2006-11-06

申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

IPC分类号： G01J4/00

CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.

摘要翻译： 检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。 照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。 检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。 处理器处理从传感器输出的信号并检测样本上的缺陷。

公开(公告)号：US5684565A

公开(公告)日：1997-11-04

申请号：US304586

申请日：1994-09-12

申请人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

发明人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F9/7065

摘要： A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.

摘要翻译： 公开了一种用于检测物体表面上的多个图案中的每一个的图案图像的方法和装置。 从包括宽波长的光源或包括多个单波长的光源发射的光被施加到物体。 该物体包括具有多个层的分层结构，其中物体的最上层的至少一部分是光学透明的。 根据关于物体的分层结构和物体的材料的信息，从光源发射的光的光谱照度强度特性是变化的，以获得期望的光谱照度，并且每个图案的图案图像是 基于从对象反射的光被检测为一维或二维图像。