公开(公告)号：US5164789A

公开(公告)日：1992-11-17

申请号：US789006

申请日：1991-11-07

申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Soichi Katagiri ,  Shuji Sugiyama ,  Yoshimitsu Saze

发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Soichi Katagiri ,  Shuji Sugiyama ,  Yoshimitsu Saze

IPC分类号： G01B9/02

CPC分类号： G01B9/02028 ,  G01B9/02002 ,  G01B9/02003 ,  G01B2290/30 ,  G01B2290/70

摘要： The present invention resides in method and apparatus for measuring a minute displacement, comprising applying a light of a first wavelength at a predetermined angle to a diffraction grating formed on an object whose position is to be detected, subjecting each of the resulting diffracted light and regular reflected light and a light of a second wavelength different from the first wavelength to heterodyne interference with each other to generate a measurement signal and a reference signal, and measuring a phase difference between the measurement signal and the reference signal to thereby determine a minute displacement of the object.

摘要翻译： 本发明在于用于测量微小位移的方法和装置，包括以预定角度将第一波长的光施加到形成在要检测的位置的物体上的衍射光栅，对所得衍射光和规则 反射光和不同于第一波长的第二波长的光与彼此的外差干涉产生测量信号和参考信号，并测量测量信号和参考信号之间的相位差，从而确定 物体。

公开(公告)号：US5324953A

公开(公告)日：1994-06-28

申请号：US12775

申请日：1993-02-03

申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiko Nakayama

发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiko Nakayama

IPC分类号： G02B5/32 ,  G02B27/00 ,  G03F7/23 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G06K7/015

CPC分类号： G03F9/70 ,  G02B27/0037 ,  G02B27/4211 ,  G02B27/4222 ,  G02B5/32

摘要： A novel exposure system includes a reduced-projection lens optimized for a predetermined single exposure wavelength and a chromatic aberration correction system for TTL (Through The Lens) alignment with broadband light. The correction system includes a holographic lens which dispersion has a negative number in contrast to a conventional glass lens which has a positive dispersion number. By employing a holographic lens, the total optical length of an alignment system can be made short enough to avoid the necessity of installing a mirror therein, thus realizing a highly accurate alignment system.

摘要翻译： 一种新颖的曝光系统包括针对预定的单一曝光波长优化的缩小投影透镜和用于与宽带光进行TTL（透镜））对准的色差校正系统。 校正系统包括与具有正色散数的常规玻璃透镜相反的色散具有负数的全息透镜。 通过采用全息透镜，可以使对准系统的总光学长度足够短以避免在其中安装反射镜，从而实现高精度的对准系统。

公开(公告)号：US5016149A

公开(公告)日：1991-05-14

申请号：US439436

申请日：1989-11-20

申请人： Minoru Tanaka ,  Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Tetsuzo Tanimoto

发明人： Minoru Tanaka ,  Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Tetsuzo Tanimoto

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70058 ,  G03F7/70566 ,  G03F7/70583

摘要： An illuminating method and an illuminating apparatus for use in combination, for example, with an exposure apparatus. The illuminating apparatus comprises amplitude distribution control means for converting the intensity distribution of a light beam emitted by a highly directional light source into a substantially linear intensity distribution, beam splitting means for splitting the light beam into a plurality of component beams, and superposing means for superposing the component beams in a desired area on an object, such as a reticle, in an uniform illuminance distribution.

摘要翻译： 照明方法和照明装置，例如用曝光装置组合使用。 该照明装置包括用于将由高度定向的光源发射的光束的强度分布转换为基本线性强度分布的幅度分布控制装置，用于将光束分成多个分量光束的分束装置，以及用于 在均匀的照度分布中将分量光束叠加在物体（例如光罩）上的期望区域中。

公开(公告)号：US5684565A

公开(公告)日：1997-11-04

申请号：US304586

申请日：1994-09-12

申请人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

发明人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F9/7065

摘要： A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.

摘要翻译： 公开了一种用于检测物体表面上的多个图案中的每一个的图案图像的方法和装置。 从包括宽波长的光源或包括多个单波长的光源发射的光被施加到物体。 该物体包括具有多个层的分层结构，其中物体的最上层的至少一部分是光学透明的。 根据关于物体的分层结构和物体的材料的信息，从光源发射的光的光谱照度强度特性是变化的，以获得期望的光谱照度，并且每个图案的图案图像是 基于从对象反射的光被检测为一维或二维图像。

公开(公告)号：US4922290A

公开(公告)日：1990-05-01

申请号：US253562

申请日：1988-10-05

申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida

发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70575 ,  G03F7/70258 ,  G03F7/70841 ,  G03F7/70883

摘要： The invention relates to a semiconductor exposing system for projecting a pattern of a mask onto a semiconductor wafer and, more particularly, to such a system having an apparatus for correcting an influence on the resolution by a fluctuation in wavelength of a laser light source. The system of the invention comprises: a laser light source; an optical projecting system for projecting a laser beam emitted from the laser light source onto the semiconductor wafer through the mask; and an apparatus for receiving a part of the laser beam emitted from the laser light source, for detecting the wavelength fluctuation, and for correcting the position and magnification of the optical projecting system in accordance with the wavelength fluctuation value or an apparatus for correcting the refractive index of the optical projecting system.

摘要翻译： 本发明涉及一种用于将掩模的图案投影到半导体晶片上的半导体曝光系统，更具体地说，涉及具有用于通过激光源的波长波动来校正对分辨率的影响的装置的这种系统。 本发明的系统包括：激光光源; 光学投影系统，用于通过掩模将从激光源发射的激光束投射到半导体晶片上; 以及用于接收从激光光源发射的激光束的一部分的装置，用于检测波长波动，以及根据波长波动值校正光学投影系统的位置和放大率或用于校正折射率的装置 光学投影系统的索引。

公开(公告)号：US4993837A

公开(公告)日：1991-02-19

申请号：US301962

申请日：1989-01-25

申请人： Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Naoto Nakashima ,  Masataka Shiba

发明人： Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Naoto Nakashima ,  Masataka Shiba

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/70

摘要： A method and a system for pattern detection are disclosed in which a laser beam high in directivity is emitted from a laser beam source, the laser beam emitted from the laser beam source is irradiated on an uneven pattern to be detected on an object, the light component of a frequency corresponding to the cut-off frequency of an objective lens is removed from the light reflected from the object when an image of the pattern on the object is formed through an objective lens, the optical image thus formed is received by a photoelectric converting device for producing a signal waveform representing the pattern free of a signal of the frequency corresponding to the cut-off frequency, and the pattern is detected from a signal produced from the photoelectric converting device.

摘要翻译： 公开了一种用于图案检测的方法和系统，其中从激光束源发射高方向性的激光束，从激光束源发射的激光束照射在待检测物体上的不均匀图案上，光 当通过物镜形成物体上的图案的图像时，从物体反射的光中除去与物镜的截止频率相对应的频率的分量，由此形成的光学图像由光电 用于产生表示没有与截止频率相对应的频率的信号的模式的信号波形的转换装置，并且根据从光电转换装置产生的信号检测图案。

公开(公告)号：US4862008A

公开(公告)日：1989-08-29

申请号：US213141

申请日：1988-06-29

申请人： Yoshitada Oshida ,  Naoto Nakashima ,  Yasuhiro Yoshitake

发明人： Yoshitada Oshida ,  Naoto Nakashima ,  Yasuhiro Yoshitake

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/70

摘要： A wafer is aligned by using an alignment light having a longer wavelength than an exposure light. Exposure and alignment are effected through a common reduction lens. A wavefront aberration caused by the use of the long wavelength alignment light is compensated by a hologram. Thus, an alignment precision is improved without exposing a resist layer to a light.

摘要翻译： 通过使用具有比曝光光更长的波长的对准光来对准晶片。 曝光和对准通过公共的减速透镜实现。 由使用长波长对准光引起的波前像差由全息图补偿。 因此，不会使抗蚀剂层暴露于光而提高对准精度。

公开(公告)号：US4819033A

公开(公告)日：1989-04-04

申请号：US113514

申请日：1987-10-28

申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Naoto Nakashima

发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Naoto Nakashima

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  H01S3/101 ,  H01S3/106 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/70558 ,  G03F7/2006 ,  G03F7/70041 ,  G03F7/70058

摘要： An illumination apparatus is disclosed which is suitable for use in a projection/exposure system for projecting an image of a circuit pattern of a reticle on a semiconductor wafer through a projection lens. The illumination apparatus includes an excimer laser for emitting a pulsed laser beam, an optical system for illuminating the reticle with a plurality of laser pulses emitted from the excimer laser so that laser pulses having passed through the reticle impinge on the semiconductor wafer in different directions through the projection lens, and a light intensity control device for controlling the light intensity of each of the laser pulses so that the laser pulses equally contribute to the reaction of a light sensitive material which is provided on the semiconductor wafer, with light.

摘要翻译： 公开了一种适用于投影/曝光系统的照明装置，用于通过投影透镜在半导体晶片上投射标线片的电路图案的图像。 照明装置包括用于发射脉冲激光束的准分子激光器，用于从准分子激光器发射的多个激光脉冲照射标线片的光学系统，使得已经穿过掩模版的激光脉冲以不同方向穿过半导体晶片 投影透镜和用于控制每个激光脉冲的光强度的光强度控制装置，使得激光脉冲同样有助于设置在半导体晶片上的光敏材料与光的反应。

公开(公告)号：US07217573B1

公开(公告)日：2007-05-15

申请号：US09678652

申请日：2000-10-04

申请人： Yoshitada Oshida ,  Toshihiko Nakata ,  Tomoaki Sakata ,  Kenji Yasuda ,  Satoshi Takahashi

发明人： Yoshitada Oshida ,  Toshihiko Nakata ,  Tomoaki Sakata ,  Kenji Yasuda ,  Satoshi Takahashi

IPC分类号： G01N33/00 ,  G01N33/53 ,  C12Q1/68 ,  C12M3/00 ,  C07H21/04 ,  H01J3/14

CPC分类号： G01N21/6428 ,  G01N21/6452 ,  G01N21/6456 ,  Y10S436/80 ,  Y10T436/143333

摘要： A method of inspecting a DNA chip and an apparatus therefor that allow a picture to be reconstructed in the following steps: A plurality of irradiation spots are formed on a DNA probe array mounted on a stage. Then, the stage is displaced in X, Y directions so as to execute a scanning, thereby irradiating substantially all the entire surface of the DNA probe array. Next, a plurality of emitted fluorescent lights, which are generated from the plurality of irradiation spot portions on the DNA probe array, are converged and are then detected simultaneously by multi detectors. Finally, a data processing apparatus processes the detected signals, thereby reconstructing the picture.

摘要翻译： 一种用于检查DNA芯片的方法及其装置，其允许以下列步骤重建图像：在安装在平台上的DNA探针阵列上形成多个照射点。 然后，在X，Y方向上移位台，以进行扫描，从而基本上照射DNA探针阵列的整个表面。 接下来，从DNA探针阵列上的多个照射点部分产生的多个发射荧光灯被会聚，然后由多个检测器同时检测。 最后，数据处理装置处理检测到的信号，从而重建图像。

公开(公告)号：US07092058B2

公开(公告)日：2006-08-15

申请号：US10841487

申请日：2004-05-10

申请人： Aki Sakai ,  Noboru Kunimatsu ,  Yoshitada Oshida

发明人： Aki Sakai ,  Noboru Kunimatsu ,  Yoshitada Oshida

IPC分类号： G02F1/1337

CPC分类号： G02F1/133788

摘要： It is possible to enhance the utilization efficiency of a light source and impart an orientation control performance and a pretilt angle to an orientation film in a short treatment time. Substrates to which orientation films are applied are mounted on stages which are sequentially transported to a main irradiation region and a sub-irradiation region. Light flux irradiated from a light source device having a single light source receives polarization treatment at a polarization unit, thus generating main polarized light and sub-polarized light. The main polarized light is irradiated to the orientation film formed on the substrate which is transported to a main irradiation region, thus imparting orientation control performance to the orientation film. Subsequently, the substrate is transported to a sub-irradiation region, and sub-polarized light is irradiated to the orientation film to which orientation control performance is already imparted, thus imparting a pretilt angle to the orientation film.

摘要翻译： 可以在短的处理时间内提高光源的利用效率并赋予取向膜的取向控制性能和预倾角。 将施加取向膜的基板安装在依次传送到主照射区域和副照射区域的台上。 从具有单个光源的光源装置照射的光束在偏振单元处接收偏振处理，从而产生主偏振光和亚偏振光。 将主偏振光照射到形成在基板上的取向膜，该取向膜被输送到主照射区域，从而赋予取向膜定向控制性能。 随后，将基板输送到副照射区域，并且将亚偏振光照射到已经赋予取向控制性能的取向膜，从而赋予取向膜预倾斜角。