公开(公告)号：US5324953A

公开(公告)日：1994-06-28

申请号：US12775

申请日：1993-02-03

申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiko Nakayama

发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiko Nakayama

IPC分类号： G02B5/32 ,  G02B27/00 ,  G03F7/23 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G06K7/015

CPC分类号： G03F9/70 ,  G02B27/0037 ,  G02B27/4211 ,  G02B27/4222 ,  G02B5/32

摘要： A novel exposure system includes a reduced-projection lens optimized for a predetermined single exposure wavelength and a chromatic aberration correction system for TTL (Through The Lens) alignment with broadband light. The correction system includes a holographic lens which dispersion has a negative number in contrast to a conventional glass lens which has a positive dispersion number. By employing a holographic lens, the total optical length of an alignment system can be made short enough to avoid the necessity of installing a mirror therein, thus realizing a highly accurate alignment system.

摘要翻译： 一种新颖的曝光系统包括针对预定的单一曝光波长优化的缩小投影透镜和用于与宽带光进行TTL（透镜））对准的色差校正系统。 校正系统包括与具有正色散数的常规玻璃透镜相反的色散具有负数的全息透镜。 通过采用全息透镜，可以使对准系统的总光学长度足够短以避免在其中安装反射镜，从而实现高精度的对准系统。

公开(公告)号：US4993837A

公开(公告)日：1991-02-19

申请号：US301962

申请日：1989-01-25

申请人： Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Naoto Nakashima ,  Masataka Shiba

发明人： Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Naoto Nakashima ,  Masataka Shiba

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/70

摘要： A method and a system for pattern detection are disclosed in which a laser beam high in directivity is emitted from a laser beam source, the laser beam emitted from the laser beam source is irradiated on an uneven pattern to be detected on an object, the light component of a frequency corresponding to the cut-off frequency of an objective lens is removed from the light reflected from the object when an image of the pattern on the object is formed through an objective lens, the optical image thus formed is received by a photoelectric converting device for producing a signal waveform representing the pattern free of a signal of the frequency corresponding to the cut-off frequency, and the pattern is detected from a signal produced from the photoelectric converting device.

摘要翻译： 公开了一种用于图案检测的方法和系统，其中从激光束源发射高方向性的激光束，从激光束源发射的激光束照射在待检测物体上的不均匀图案上，光 当通过物镜形成物体上的图案的图像时，从物体反射的光中除去与物镜的截止频率相对应的频率的分量，由此形成的光学图像由光电 用于产生表示没有与截止频率相对应的频率的信号的模式的信号波形的转换装置，并且根据从光电转换装置产生的信号检测图案。

公开(公告)号：US4819033A

公开(公告)日：1989-04-04

申请号：US113514

申请日：1987-10-28

申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Naoto Nakashima

发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Masataka Shiba ,  Naoto Nakashima

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  H01S3/101 ,  H01S3/106 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/70558 ,  G03F7/2006 ,  G03F7/70041 ,  G03F7/70058

摘要： An illumination apparatus is disclosed which is suitable for use in a projection/exposure system for projecting an image of a circuit pattern of a reticle on a semiconductor wafer through a projection lens. The illumination apparatus includes an excimer laser for emitting a pulsed laser beam, an optical system for illuminating the reticle with a plurality of laser pulses emitted from the excimer laser so that laser pulses having passed through the reticle impinge on the semiconductor wafer in different directions through the projection lens, and a light intensity control device for controlling the light intensity of each of the laser pulses so that the laser pulses equally contribute to the reaction of a light sensitive material which is provided on the semiconductor wafer, with light.

摘要翻译： 公开了一种适用于投影/曝光系统的照明装置，用于通过投影透镜在半导体晶片上投射标线片的电路图案的图像。 照明装置包括用于发射脉冲激光束的准分子激光器，用于从准分子激光器发射的多个激光脉冲照射标线片的光学系统，使得已经穿过掩模版的激光脉冲以不同方向穿过半导体晶片 投影透镜和用于控制每个激光脉冲的光强度的光强度控制装置，使得激光脉冲同样有助于设置在半导体晶片上的光敏材料与光的反应。

公开(公告)号：US5164789A

公开(公告)日：1992-11-17

申请号：US789006

申请日：1991-11-07

申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Soichi Katagiri ,  Shuji Sugiyama ,  Yoshimitsu Saze

发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Soichi Katagiri ,  Shuji Sugiyama ,  Yoshimitsu Saze

IPC分类号： G01B9/02

CPC分类号： G01B9/02028 ,  G01B9/02002 ,  G01B9/02003 ,  G01B2290/30 ,  G01B2290/70

摘要： The present invention resides in method and apparatus for measuring a minute displacement, comprising applying a light of a first wavelength at a predetermined angle to a diffraction grating formed on an object whose position is to be detected, subjecting each of the resulting diffracted light and regular reflected light and a light of a second wavelength different from the first wavelength to heterodyne interference with each other to generate a measurement signal and a reference signal, and measuring a phase difference between the measurement signal and the reference signal to thereby determine a minute displacement of the object.

摘要翻译： 本发明在于用于测量微小位移的方法和装置，包括以预定角度将第一波长的光施加到形成在要检测的位置的物体上的衍射光栅，对所得衍射光和规则 反射光和不同于第一波长的第二波长的光与彼此的外差干涉产生测量信号和参考信号，并测量测量信号和参考信号之间的相位差，从而确定 物体。

公开(公告)号：US5016149A

公开(公告)日：1991-05-14

申请号：US439436

申请日：1989-11-20

申请人： Minoru Tanaka ,  Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Tetsuzo Tanimoto

发明人： Minoru Tanaka ,  Yoshitada Oshida ,  Yasuhiro Yoshitake ,  Tetsuzo Tanimoto

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70058 ,  G03F7/70566 ,  G03F7/70583

摘要： An illuminating method and an illuminating apparatus for use in combination, for example, with an exposure apparatus. The illuminating apparatus comprises amplitude distribution control means for converting the intensity distribution of a light beam emitted by a highly directional light source into a substantially linear intensity distribution, beam splitting means for splitting the light beam into a plurality of component beams, and superposing means for superposing the component beams in a desired area on an object, such as a reticle, in an uniform illuminance distribution.

摘要翻译： 照明方法和照明装置，例如用曝光装置组合使用。 该照明装置包括用于将由高度定向的光源发射的光束的强度分布转换为基本线性强度分布的幅度分布控制装置，用于将光束分成多个分量光束的分束装置，以及用于 在均匀的照度分布中将分量光束叠加在物体（例如光罩）上的期望区域中。

公开(公告)号：US5684565A

公开(公告)日：1997-11-04

申请号：US304586

申请日：1994-09-12

申请人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

发明人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F9/7065

摘要： A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.

摘要翻译： 公开了一种用于检测物体表面上的多个图案中的每一个的图案图像的方法和装置。 从包括宽波长的光源或包括多个单波长的光源发射的光被施加到物体。 该物体包括具有多个层的分层结构，其中物体的最上层的至少一部分是光学透明的。 根据关于物体的分层结构和物体的材料的信息，从光源发射的光的光谱照度强度特性是变化的，以获得期望的光谱照度，并且每个图案的图案图像是 基于从对象反射的光被检测为一维或二维图像。

公开(公告)号：US4922290A

公开(公告)日：1990-05-01

申请号：US253562

申请日：1988-10-05

申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida

发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70575 ,  G03F7/70258 ,  G03F7/70841 ,  G03F7/70883

摘要： The invention relates to a semiconductor exposing system for projecting a pattern of a mask onto a semiconductor wafer and, more particularly, to such a system having an apparatus for correcting an influence on the resolution by a fluctuation in wavelength of a laser light source. The system of the invention comprises: a laser light source; an optical projecting system for projecting a laser beam emitted from the laser light source onto the semiconductor wafer through the mask; and an apparatus for receiving a part of the laser beam emitted from the laser light source, for detecting the wavelength fluctuation, and for correcting the position and magnification of the optical projecting system in accordance with the wavelength fluctuation value or an apparatus for correcting the refractive index of the optical projecting system.

摘要翻译： 本发明涉及一种用于将掩模的图案投影到半导体晶片上的半导体曝光系统，更具体地说，涉及具有用于通过激光源的波长波动来校正对分辨率的影响的装置的这种系统。 本发明的系统包括：激光光源; 光学投影系统，用于通过掩模将从激光源发射的激光束投射到半导体晶片上; 以及用于接收从激光光源发射的激光束的一部分的装置，用于检测波长波动，以及根据波长波动值校正光学投影系统的位置和放大率或用于校正折射率的装置 光学投影系统的索引。

公开(公告)号：US4862008A

公开(公告)日：1989-08-29

申请号：US213141

申请日：1988-06-29

申请人： Yoshitada Oshida ,  Naoto Nakashima ,  Yasuhiro Yoshitake

发明人： Yoshitada Oshida ,  Naoto Nakashima ,  Yasuhiro Yoshitake

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/70

摘要： A wafer is aligned by using an alignment light having a longer wavelength than an exposure light. Exposure and alignment are effected through a common reduction lens. A wavefront aberration caused by the use of the long wavelength alignment light is compensated by a hologram. Thus, an alignment precision is improved without exposing a resist layer to a light.

摘要翻译： 通过使用具有比曝光光更长的波长的对准光来对准晶片。 曝光和对准通过公共的减速透镜实现。 由使用长波长对准光引起的波前像差由全息图补偿。 因此，不会使抗蚀剂层暴露于光而提高对准精度。

公开(公告)号：US06542830B1

公开(公告)日：2003-04-01

申请号：US09142546

申请日：1998-09-10

申请人： Fumio Mizuno ,  Seiji Isogai ,  Kenji Watanabe ,  Yasuhiro Yoshitake ,  Terushige Asakawa ,  Yuichi Ohyama ,  Hidekuni Sugimoto ,  Seiji Ishikawa ,  Masataka Shiba ,  Jun Nakazato ,  Makoto Ariga ,  Tetsuji Yokouchi ,  Toshimitsu Hamada ,  Ikuo Suzuki ,  Masami Ikota ,  Mari Nozoe ,  Isao Miyazaki ,  Yoshiharu Shigyo

发明人： Fumio Mizuno ,  Seiji Isogai ,  Kenji Watanabe ,  Yasuhiro Yoshitake ,  Terushige Asakawa ,  Yuichi Ohyama ,  Hidekuni Sugimoto ,  Seiji Ishikawa ,  Masataka Shiba ,  Jun Nakazato ,  Makoto Ariga ,  Tetsuji Yokouchi ,  Toshimitsu Hamada ,  Ikuo Suzuki ,  Masami Ikota ,  Mari Nozoe ,  Isao Miyazaki ,  Yoshiharu Shigyo

IPC分类号： H01L2166

CPC分类号： H01L22/20 ,  G01N21/9501 ,  G01R31/2894 ,  G01R33/06 ,  H01L2223/54466 ,  H01L2924/0002 ,  H01L2924/00

摘要： A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.

摘要翻译： 根据本发明的处理管理系统包括用于检查晶片上的缺陷的检查装置，通过通信网络连接的检查装置，从这些检查装置获得的检查信息和图像信息被收集以构建数据库和图像 文件，其中缺陷的定义通过基于检查信息和从检查装置获得的图像信息来表征缺陷的元件的组合来给出。 通过给出缺陷的定义，可以细分和知道缺陷的特征。 因此，可以研究缺陷的原因。

公开(公告)号：US06456951B1

公开(公告)日：2002-09-24

申请号：US09553944

申请日：2000-04-21

申请人： Shunji Maeda ,  Yasuhiro Yoshitake ,  Kenji Oka ,  Masataka Shiba ,  Atsushi Shimoda

发明人： Shunji Maeda ,  Yasuhiro Yoshitake ,  Kenji Oka ,  Masataka Shiba ,  Atsushi Shimoda

IPC分类号： G06F1132

CPC分类号： H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention is related to an inspection data processing method for processing inspection data composed of coordinates data and characteristic quantity data about a defect generated on a subject of inspection detected with a visual inspection apparatus. The inspection data processing method comprises the following steps: a preparation step of storing a first fatality judgment data group corresponding to the kinds of areas on the subject of inspection and a second fatality judgment data group corresponding to categories of defects beforehand; a first fatality judgment step of judging a first fatality level of a defect corresponding to the kind of an area where the defect exists; a category giving step of giving category to the defect in the inspection data; and a second fatality judgment step of judging a second fatality of the defect based on second fatality judgment data selected according to the category which are given based on the first fatality level of defects judged in the first fatality judgment step.

摘要翻译： 本发明涉及一种用于处理检查数据的检查数据处理方法，该检查数据由关于在用目视检查装置检测到的检查对象上产生的缺陷的坐标数据和特征量数据组成。 检查数据处理方法包括以下步骤：预先存储与检查对象的区域的种类对应的第一死亡判定数据组和对应于缺陷类别的第二死亡判定数据组的准备步骤; 判断与存在缺陷的区域的种类相对应的缺陷的第一死亡水平的第一死亡判定步骤; 类别给出检查数据中的缺陷类别的步骤; 以及第二死亡判定步骤，基于根据在第一死亡判定步骤中判断的缺陷的第一死亡水平给出的根据类别选择的第二死亡判定数据来判断缺陷的第二死亡。