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    Defect inspection method and its system
    4.
    发明授权
    Defect inspection method and its system 有权
    缺陷检查方法及其系统

    公开(公告)号：US07943903B2

    公开(公告)日：2011-05-17

    申请号：US12320574

    申请日：2009-01-29

    申请人： Shinji Okazaki ,  Shoji Hotta ,  Yasunari Sohda ,  Yoshinori Nakayama

    发明人： Shinji Okazaki ,  Shoji Hotta ,  Yasunari Sohda ,  Yoshinori Nakayama

    IPC分类号： H01J37/153 ,  G01N23/00

    CPC分类号： H01L22/12 ,  G06T7/0006 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A method for enabling management of fatal defects of semiconductor integrated patterns easily, the method enables storing of design data of each pattern designed by a semiconductor integrated circuit designer, as well as storing of design intent data having pattern importance levels ranked according to their design intents respectively. The method also enables anticipating of defects to be generated systematically due to the characteristics of the subject exposure system, etc. while each designed circuit pattern is exposed and delineated onto a wafer in a simulation carried out beforehand and storing those defects as hot spot information. Furthermore, the method also enables combining of the design intent data with hot spot information to limit inspection spots that might include systematic defects at high possibility with respect to the characteristics of the object semiconductor integrated circuit and shorten the defect inspection time significantly.

    摘要翻译： 一种能够容易地管理半导体集成图案的致命缺陷的方法，该方法能够存储由半导体集成电路设计者设计的每个图案的设计数据，以及存储具有根据其设计意图排列的图案重要性级别的设计意图数据 分别。 该方法还可以预测由于目标曝光系统等的特性而系统地产生的缺陷，同时在预先进行的模拟中将每个设计的电路图案暴露并描绘到晶片上，并将这些缺陷存储为热点信息。 此外，该方法还能够将设计意图数据与热点信息组合，以限制可能包括关于对象半导体集成电路的特性的高可能性的系统缺陷的检查点，并显着缩短缺陷检查时间。

    Defect inspection method and its system
    5.
    发明申请
    Defect inspection method and its system 有权
    缺陷检查方法及其系统

    公开(公告)号：US20090206252A1

    公开(公告)日：2009-08-20

    申请号：US12320574

    申请日：2009-01-29

    申请人： Shinji Okazaki ,  Shoji Hotta ,  Yasunari Sohda ,  Yoshinori Nakayama

    发明人： Shinji Okazaki ,  Shoji Hotta ,  Yasunari Sohda ,  Yoshinori Nakayama

    IPC分类号： G01N23/00

    CPC分类号： H01L22/12 ,  G06T7/0006 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A method for enabling management of fatal defects of semiconductor integrated patterns easily, the method enables storing of design data of each pattern designed by a semiconductor integrated circuit designer, as well as storing of design intent data having pattern importance levels ranked according to their design intents respectively. The method also enables anticipating of defects to be generated systematically due to the characteristics of the subject exposure system, etc. while each designed circuit pattern is exposed and delineated onto a wafer in a simulation carried out beforehand and storing those defects as hot spot information. Furthermore, the method also enables combining of the design intent data with hot spot information to limit inspection spots that might include systematic defects at high possibility with respect to the characteristics of the object semiconductor integrated circuit and shorten the defect inspection time significantly.

    摘要翻译： 一种能够容易地管理半导体集成图案的致命缺陷的方法，该方法能够存储由半导体集成电路设计者设计的每个图案的设计数据，以及存储具有根据其设计意图排列的图案重要性级别的设计意图数据 分别。 该方法还可以预测由于目标曝光系统等的特性而系统地产生的缺陷，同时在预先进行的模拟中将每个设计的电路图案暴露并描绘到晶片上，并将这些缺陷存储为热点信息。 此外，该方法还能够将设计意图数据与热点信息组合，以限制可能包括关于对象半导体集成电路的特性的高可能性的系统缺陷的检查点，并显着缩短缺陷检查时间。

    Method and apparatus for inspecting reticle
    6.
    发明授权
    Method and apparatus for inspecting reticle 有权
    检查掩模版的方法和装置

    公开(公告)号：US08064681B2

    公开(公告)日：2011-11-22

    申请号：US12292660

    申请日：2008-11-24

    申请人： Nobuhiro Okai ,  Shinji Okazaki ,  Yasunari Sohda ,  Yoshinori Nakayama

    发明人： Nobuhiro Okai ,  Shinji Okazaki ,  Yasunari Sohda ,  Yoshinori Nakayama

    IPC分类号： G06K9/00

    CPC分类号： G06K9/00 ,  G06K2209/19 ,  G06T7/0004

    摘要： The present invention provides a reticle inspection technology that enables a relative position between patterns to be evaluated for a pattern that may become a defect at the time of exposure to a sample, such as a wafer, in the double patterning technology on the same layer. An apparatus for inspecting a reticle for inspecting two reticles that are used in order to form patterns in the same layer on a substrate using the double patterning technology has: a coordinate information input unit for inputting coordinate information of a pattern of a measuring object; an image input unit for acquiring images of patterns of the two reticles based on the obtained coordinate information; an image overlay unit for overlaying the images of the two reticles at the same coordinates; a relative position calculation unit for finding the relative position between the patterns on the two reticles; an evaluation unit for assigning an index of the overlaying accuracy based on the relative position and evaluates whether the two reticles need repair; and an evaluation result output unit for outputting an evaluation result.

    摘要翻译： 本发明提供了一种掩模版检查技术，其能够在同一层上的双重图案化技术中，使图案之间的相对位置能够在暴露于样品（例如晶片）时成为缺陷的图案被评估。 用于检查用于检查用于使用双重图案形成技术在基板上形成图案的图案的两个掩模版的掩模版的装置具有：用于输入测量对象的图案的坐标信息的坐标信息输入单元; 图像输入单元，用于基于所获得的坐标信息获取两个标线图案的图像; 用于在相同坐标处叠加两个光罩的图像的图像叠加单元; 相对位置计算单元，用于找到两个标线之间的图案之间的相对位置; 评估单元，用于基于所述相对位置分配所述重叠精度的指标，并评估所述两个标线是否需要修理; 以及评价结果输出单元，用于输出评估结果。

    Method and apparatus for inspecting reticle
    8.
    发明申请
    Method and apparatus for inspecting reticle 有权
    检查掩模版的方法和装置

    公开(公告)号：US20090136116A1

    公开(公告)日：2009-05-28

    申请号：US12292660

    申请日：2008-11-24

    申请人： Nobuhiro Okai ,  Shinji Okazaki ,  Yasunari Sohda ,  Yoshinori Nakayama

    发明人： Nobuhiro Okai ,  Shinji Okazaki ,  Yasunari Sohda ,  Yoshinori Nakayama

    IPC分类号： G06K9/00

    CPC分类号： G06K9/00 ,  G06K2209/19 ,  G06T7/0004

    摘要： The present invention provides a reticle inspection technology that enables a relative position between patterns to be evaluated for a pattern that may become a defect at the time of exposure to a sample, such as a wafer, in the double patterning technology on the same layer. An apparatus for inspecting a reticle for inspecting two reticles that are used in order to form patterns in the same layer on a substrate using the double patterning technology has: a coordinate information input unit for inputting coordinate information of a pattern of a measuring object; an image input unit for acquiring images of patterns of the two reticles based on the obtained coordinate information; an image overlay unit for overlaying the images of the two reticles at the same coordinates; a relative position calculation unit for finding the relative position between the patterns on the two reticles; an evaluation unit for assigning an index of the overlaying accuracy based on the relative position and evaluates whether the two reticles need repair; and an evaluation result output unit for outputting an evaluation result.

    摘要翻译： 本发明提供了一种掩模版检查技术，其能够在同一层上的双重图案化技术中，使图案之间的相对位置能够在暴露于样品（例如晶片）时成为缺陷的图案被评估。 用于检查用于检查用于使用双重图案形成技术在基板上形成图案的图案的两个掩模版的掩模版的装置具有：用于输入测量对象的图案的坐标信息的坐标信息输入单元; 图像输入单元，用于基于所获得的坐标信息获取两个标线图案的图像; 用于在相同坐标处叠加两个光罩的图像的图像叠加单元; 相对位置计算单元，用于找到两个标线之间的图案之间的相对位置; 评估单元，用于基于所述相对位置分配所述重叠精度的指标，并评估所述两个标线是否需要修理; 以及评价结果输出单元，用于输出评估结果。

    Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control system
    9.
    发明申请
    Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control system 有权
    控制具有多种功能的通信终端的方法，通信终端装置，通信控制系统

    公开(公告)号：US20050170822A1

    公开(公告)日：2005-08-04

    申请号：US11093784

    申请日：2005-03-29

    申请人： Shinji Okazaki ,  Hirokazu Takagaki ,  Katsumi Hirota ,  Koichi Matsuno ,  Ichiro Hino

    发明人： Shinji Okazaki ,  Hirokazu Takagaki ,  Katsumi Hirota ,  Koichi Matsuno ,  Ichiro Hino

    IPC分类号： H04M1/00 ,  G10K15/02 ,  H04B1/40 ,  H04M1/60 ,  H04M1/67 ,  H04M1/725 ,  H04M1/73 ,  H04M11/08 ,  H04W52/02 ,  H04W60/00 ,  H04W64/00 ,  H04W88/02 ,  H04M3/00

    CPC分类号： H04M15/47 ,  H04M1/6041 ,  H04M1/67 ,  H04M1/72519 ,  H04M1/72522 ,  H04M1/72558 ,  H04M2215/0148 ,  H04W52/0264

    摘要： When a radio communication is made between a predetermined base station and a communication terminal, the communication terminal is allowed to make a communication if a predetermined registration processing is made. If the above registration processing is not executed, then predetermined functions other than a communication function of the communication terminal are limited. Moreover, when a predetermined operation mode is set by an operation means, at least a transmission processing at a radio communication means is stopped and an execution of predetermined functions other than the radio communication processing is not restricted. Thus, when a communication terminal apparatus incorporates therein other functions than an audio reproducing function, operation of such function can be limited properly. Moreover, when other functions such as an audio reproducing function are incorporated into a communication terminal apparatus, operations of the functions thus incorporated can be limited properly and the communication functions can be stopped properly.

    摘要翻译： 当在预定基站和通信终端之间进行无线电通信时，如果进行了预定的登记处理，则通信终端被允许进行通信。 如果不执行上述注册处理，则限制通信终端的通信功能以外的预定功能。 此外，当通过操作装置设定预定操作模式时，至少停止在无线电通信装置处的发送处理，并且不限制除了无线电通信处理之外的预定功能的执行。 因此，当通信终端装置在其中并入具有比音频再现功能的其它功能时，可以适当地限制这种功能的操作。 此外，当诸如音频再现功能的其它功能被并入到通信终端设备中时，可以适当地限制所包含的功能的操作，并且可以适当地停止通信功能。

    Condensed-Indan derivatives and pharmaceutically acceptable salts thereof
    10.
    发明授权
    Condensed-Indan derivatives and pharmaceutically acceptable salts thereof 失效
    缩合 - 茚满衍生物及其药学上可接受的盐

    公开(公告)号：US5733918A

    公开(公告)日：1998-03-31

    申请号：US578542

    申请日：1996-01-19

    申请人： Shinji Okazaki ,  Tetsuji Asao ,  Motoji Wakida ,  Keisuke Ishida ,  Masato Washinosu ,  Teruhiro Utsugi ,  Yuji Yamada

    发明人： Shinji Okazaki ,  Tetsuji Asao ,  Motoji Wakida ,  Keisuke Ishida ,  Masato Washinosu ,  Teruhiro Utsugi ,  Yuji Yamada

    IPC分类号： A61K31/44 ,  A61K31/473 ,  A61P35/00 ,  C07D221/18 ,  C07D401/12 ,  C07D491/04 ,  C07D491/056 ,  C07D521/00 ,  A61K31/47 ,  C07D491/56

    CPC分类号： C07D231/12 ,  C07D221/18 ,  C07D233/56 ,  C07D249/08 ,  C07D401/12 ,  C07D491/04

    摘要： A condensed-indan derivative represented by formula (1) and a pharmaceutically acceptable salt thereof: ##STR1## wherein ring A represents an optionally substituted benzene ring or naphthalene ring, or a benzene ring having a lower alkylenedioxy group, ring B represents an optionally substituted benzene ring or a benzene ring having a lower alkylenedioxy group. Y represents --N.dbd.CR-- or --CR=N--, R represents a --NR.sub.1 R.sub.2 group, an optionally substituted nitrogen-containing heterocyclic group or a --OR.sub.3 group, wherein R.sub.1 and R.sub.2 are the same or different and each is a hydrogen atom; a phenyl group; an optionally substituted nitrogen-containing heterocyclic group; or a lower alkyl group which may be substituted by at least one selected from the group consisting of an optionally substituted amino group, a lower alkoxy group, a phenyl group, a nitrogen-containing heterocyclic group, an amine oxide group substituted by a lower alkyl group or a hydroxyl group(s); R.sub.3 represents a lower alkyl group optionally substituted by a substituted amino group, except when R represents an optionally substituted nitrogen-containing heterocyclic group; ring A and ring B are a benzene ring having no substituent group.

    摘要翻译： PCT No.PCT / JP95 / 00944 Sec。 371日期1996年1月19日 102（e）日期1996年1月19日PCT提交1995年5月18日PCT公布。 出版物WO95 / 32187 日期：1995年11月30日由式（1）表示的缩合 - 缩水甘油衍生物及其药学上可接受的盐：其中环A表示任选取代的苯环或萘环，或具有低级亚烷基二氧基 基团，环B表示任选取代的苯环或具有较低亚烷基二氧基的苯环。 Y表示-N = CR-或-CR = N-，R表示-NR1R2基，任选取代的含氮杂环基或-OR 3基，其中R1和R2相同或不同，各自为氢原子 ; 苯基; 任选取代的含氮杂环基; 或可以被选自任选取代的氨基，低级烷氧基，苯基，含氮杂环基，被低级烷基取代的氧化胺基中的至少一种取代的低级烷基 基团或羟基; R3表示任选被取代的氨基取代的低级烷基，除了当R表示任意取代的含氮杂环基时; 环A和环B是没有取代基的苯环。