公开(公告)号：US4873301A

公开(公告)日：1989-10-10

申请号：US147722

申请日：1988-01-25

申请人： Yasushi Saotome ,  Takeo Miyazawa ,  Takeshi Endo

发明人： Yasushi Saotome ,  Takeo Miyazawa ,  Takeshi Endo

IPC分类号： C07D499/46 ,  C07D499/00 ,  C07D499/32 ,  C07D499/42 ,  C07D499/44 ,  C07F7/18 ,  C08F12/26 ,  C08F18/02 ,  C08F18/22 ,  C08F20/00 ,  C08F20/52 ,  C08F20/60 ,  C08F26/00 ,  C08F26/02 ,  C08F30/08

CPC分类号： C08F20/60 ,  C07D499/00 ,  C08F12/26

摘要： Disclosed are an optically active, ethylenically unsaturated monomer represented by the following structural formula: ##STR1## wherein: A stands for S, SO or SO.sub.2 ; X and Y each stand for a hydrogen atom or a substituent selected from the group consisting of alkyl groups and acyl groups; Z stands for a substituent selected from the group consisting of alkoxy, alkylamino, hydroxyl and silyloxy groups; and X and Y can be bonded together to form a ring with the nitrogen atom to which they are bonded or X and Y can be a single group bonded to said nitrogen atom through a double bond, with the proviso that at least one of X and Z is an alkenyl equivalent to said group, and polymers of this monomer. One typical instance of the monomer is benzyl 6-acrylaminopenicillanate.

公开(公告)号：US07607735B2

公开(公告)日：2009-10-27

申请号：US12062750

申请日：2008-04-04

申请人： Satoru Kuno ,  Tokuyuki Nishikawa ,  Yasushi Saotome

发明人： Satoru Kuno ,  Tokuyuki Nishikawa ,  Yasushi Saotome

IPC分类号： B60N2/62

CPC分类号： B60N2/0232 ,  B60N2/986 ,  B60N2002/0236

摘要： A vehicle seat may include a seat cushion that includes a central portion, first and second side support portions, and a vertical moving mechanism. The first and second side support portions are capable of laterally supporting femoral portions of a passenger. The vertical moving mechanism is capable of vertically moving the first and second side support portions in synchronism with each other, so as to change heights of the first and second side support portions relative to the central portion. The vertical moving mechanism is arranged and constructed to vertically move each of the first and second side support portions within a use range thereof in which each of the first and second side support portions has side support function. The vertical moving mechanism is arranged and constructed to further vertically move the second side support portion downwardly beyond the use range to a release position in which the second side support portion does not have the side support function.

摘要翻译： 车辆座椅可以包括座垫，其包括中心部分，第一和第二侧支撑部分以及垂直移动机构。 第一和第二侧支撑部分能够横向地支撑乘客的股骨部分。 垂直移动机构能够使第一和第二侧支撑部分彼此同步地垂直移动，以便改变第一和第二侧支撑部分相对于中心部分的高度。 垂直移动机构被布置和构造成在其使用范围内垂直移动第一和第二侧支撑部分中的每一个，其中第一和第二侧支撑部分中的每一个具有侧支撑功能。 垂直移动机构被布置和构造成进一步将第二侧支撑部分向下垂直移动超过使用范围到第二侧支撑部分不具有侧支撑功能的释放位置。

公开(公告)号：US4624909A

公开(公告)日：1986-11-25

申请号：US724457

申请日：1985-04-18

申请人： Yasushi Saotome ,  Hiroshi Gokan ,  Kazuhide Saigo ,  Masayoshi Suzuki ,  Yoshitake Ohnishi

发明人： Yasushi Saotome ,  Hiroshi Gokan ,  Kazuhide Saigo ,  Masayoshi Suzuki ,  Yoshitake Ohnishi

IPC分类号： C07F7/08 ,  C08G8/04 ,  C08G8/28 ,  C08L61/14 ,  G03F7/075 ,  C08G77/00 ,  C08G77/60

CPC分类号： C07F7/0818 ,  C08G8/04 ,  C08G8/28 ,  C08L61/14 ,  G03F7/0757 ,  Y10S430/106

摘要： Disclosed is a novel novolak resin comprising structural units having a trimethylsilyl group. A resist material highly resistive to dry etching is obtained by adding a photosensitive diazo compound to this novolak resin. The resist material is useful in various lithography methods to form a positive resist pattern. This resist material is used in a pattern forming method of a two-layer type, in which a fine pattern is formed in a thin film of the resist material by lithography and then transferred into an underlying thick organic polymer layer by dry etching of the underlying layer with the resist pattern as mask. Curing of the resist pattern by irradiation with deep UV rays is effective for further improvement in the precision of the transferred pattern.

摘要翻译： 公开了包含具有三甲基甲硅烷基的结构单元的新型酚醛清漆树脂。 通过向该酚醛清漆树脂中加入感光性重氮化合物，可获得高耐干蚀刻性的抗蚀剂材料。 抗蚀剂材料可用于各种光刻方法以形成正的抗蚀剂图案。 该抗蚀剂材料以两层型的图案形成方法使用，其中通过光刻在抗蚀剂材料的薄膜中形成精细图案，然后通过干法蚀刻底层的方法将其转移到下面的厚的有机聚合物层中 层，抗蚀图案作为掩模。 通过深紫外线照射固化抗蚀剂图案对于进一步提高转印图案的精度是有效的。