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23 条记录 (耗时 0.033 秒)

    Gas-discharge display apparatus
    5.
    发明申请
    Gas-discharge display apparatus 审中-公开
    气体放电显示装置

    公开(公告)号：US20060038491A1

    公开(公告)日：2006-02-23

    申请号：US11206126

    申请日：2005-08-18

    申请人： Kazuya Akiyama ,  Yo Hibino

    发明人： Kazuya Akiyama ,  Yo Hibino

    IPC分类号： H01J17/49

    CPC分类号： C09K11/7734 ,  C09K11/7772 ,  C09K11/778 ,  H01J2211/42 ,  H01J2217/49

    摘要： A discharge is initiated in a discharge space defined between the front glass substrate and the back glass substrate, whereby vacuum ultraviolet light is generated from a discharge gas filling the discharge space and excite phosphor layers. Each of the phosphor layers is formed of a firs phosphor having a resistance to an Xe resonance line, and absorbing the Xe resonance line and ultraviolet light in a longer wavelength range than the Xe resonance line and the Xe molecular beam but allowing the Xe molecular beam to pass through, and a second phosphor absorbing the Xe resonance line and the Xe molecular beam and generating ultraviolet light in a longer wavelength range than the Xe resonance line and the Xe molecular beam.

    摘要翻译： 在前玻璃基板和后玻璃基板之间的放电空间中开始放电，由填充放电空间的放电气体产生真空紫外光，并激发荧光体层。 每个荧光层由具有对Xe谐振线的电阻的第一个磷光体形成，并且吸收Xe谐振线和比Xe谐振线和Xe分子束更长波长范围内的紫外光，但是允许Xe分子束 以及吸收Xe共振线和Xe分子束的第二荧光体，并产生比Xe共振线和Xe分子束更长波长范围的紫外光。

    Substrate processing apparatus, substrate processing system and inspection/periphery exposure apparatus
    7.
    发明授权
    Substrate processing apparatus, substrate processing system and inspection/periphery exposure apparatus 有权
    基板处理装置，基板处理系统和检查/周边曝光装置

    公开(公告)号：US08477301B2

    公开(公告)日：2013-07-02

    申请号：US12870402

    申请日：2010-08-27

    申请人： Masahito Kashiyama ,  Yukihiko Inagaki ,  Kazuya Akiyama ,  Noriaki Yokono ,  Isao Taniguchi

    发明人： Masahito Kashiyama ,  Yukihiko Inagaki ,  Kazuya Akiyama ,  Noriaki Yokono ,  Isao Taniguchi

    IPC分类号： G01N21/00

    CPC分类号： G03F7/2028 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742

    摘要： An edge exposure unit includes a projector, a projector holding unit, a substrate rotating unit, an outer edge detecting unit and a surface inspection processing unit. Each component of the projector holding unit operates to move the projector in an X direction and a Y direction. The projector irradiates a peripheral portion of a substrate with light transmitted from a light source for exposure through a light guide. Edge sampling processing is performed based on distribution of an amount of light received in a CCD line sensor of the outer edge detecting unit. Surface inspection processing is performed based on distribution of an amount of light received in a CCD line sensor of the surface inspection processing unit.

    摘要翻译： 边缘曝光单元包括投影仪，投影仪保持单元，基板旋转单元，外缘检测单元和表面检查处理单元。 投影机保持单元的每个组件操作以沿X方向和Y方向移动投影仪。 投影仪利用从光源透射的光通过光导照射用于曝光的基板的周边部分。 基于在外部边缘检测单元的CCD线传感器中接收的光量的分布来执行边缘采样处理。 基于在表面检查处理单元的CCD线传感器中接收的光量的分布进行表面检查处理。

    Periphery exposing apparatus and method
    9.
    发明授权
    Periphery exposing apparatus and method 失效
    周边曝光装置及方法

    公开(公告)号：US5982474A

    公开(公告)日：1999-11-09

    申请号：US868382

    申请日：1997-06-03

    申请人： Kazuya Akiyama ,  Kenji Kamei ,  Satoshi Yamamoto

    发明人： Kazuya Akiyama ,  Kenji Kamei ,  Satoshi Yamamoto

    IPC分类号： G03F7/20 ,  G03B27/42 ,  G03B27/48

    CPC分类号： G03F7/2026

    摘要： A method and apparatus for exposing a substrate to light perform the steps of inputting position data of a peripheral region along an outline of a chip region on a substrate, which has been placed on a spin chuck, detecting a reference position at an outer edge of the substrate inputting axial directions of the position data and aligning axial directions of an orthogonal shifting mechanism. Based on the position data inputted, light of an irradiator is shifted along the peripheral region to expose the peripheral region in a staggered way along the outline of the chip region. The method and apparatus may also perform the steps of inputting a shape of the chip region on the substrate as image information, deriving position data of the peripheral region along the outline of the chip region from the image information, and exposing the peripheral region to light based on the position data derived. The method and apparatus may also perform the steps of inputting shape information of the substrate, the chip region, and an area around a crossing point of scribe lines in the chip region on the substrate as image information, computing the positions of the peripheral region from the image information and the shape information of the substrate and the chip region; and exposing the peripheral region to light based on the positions of the computed peripheral region.

    摘要翻译： 用于将基板曝光的方法和装置执行以下步骤：沿着已经放置在旋转卡盘上的基板上沿着芯片区域的轮廓输入周边区域的位置数据，检测在外部边缘处的基准位置 基板输入位置数据的轴向和正交变换机构的对准轴向。 基于输入的位置数据，照射器的光沿着周边区域移动，沿着芯片区域的轮廓以交错的方式露出周边区域。 该方法和装置还可以执行以下步骤：在基板上输入芯片区域的形状作为图像信息，从图像信息导出沿着芯片区域轮廓的外围区域的位置数据，并将外围区域曝光 基于导出的位置数据。 该方法和装置还可以执行以下步骤：输入衬底的形状信息，芯片区域和衬底上的芯片区域中的划线的交叉点周围的区域作为图像信息，计算外围区域的位置 基板和芯片区域的图像信息和形状信息; 并且基于所计算的周边区域的位置将外围区域曝光。

    Polarizing illuminant apparatus and image display apparatus
    10.
    发明申请
    Polarizing illuminant apparatus and image display apparatus 审中-公开
    偏振光源装置和图像显示装置

    公开(公告)号：US20070024809A1

    公开(公告)日：2007-02-01

    申请号：US11493746

    申请日：2006-07-27

    申请人： Ryusaku Takahashi ,  Tatsuru Kobayashi ,  Kazuya Akiyama

    发明人： Ryusaku Takahashi ,  Tatsuru Kobayashi ,  Kazuya Akiyama

    IPC分类号： G03B21/14

    CPC分类号： G03B21/14 ,  G03B21/2073

    摘要： A polarizing illuminant apparatus includes a surface emission light source 1 that emits a monochroic and indefinitely polarized light, a tabular photonic crystal 2 arranged on a light emitting surface 1a of the surface emission light source 1 to receive the light emitted from the light emitting surface 1a, a quarter wave plate 3 that receives a light emitted from the surface emission light source 1 and transmitted through the photonic crystal 2 and a reflective polarization plate 4 arranged in substantially-parallel with the photonic crystal 2 to receive a light transmitted through the quarter wave plate 3.

    摘要翻译： 偏振光源装置包括发射单色和无限偏振光的表面发射光源1，布置在表面发射光源1的发光表面1a上的平板光子晶体2，以接收从发光表面发射的光 1a，四分之一波片3，其接收从表面发射光源1发射并透射通过光子晶体2的光和与光子晶体2基本平行布置的反射偏振板4，以接收透过光子晶体2的光 四分之一波片3。