公开(公告)号：US08213086B2

公开(公告)日：2012-07-03

申请号：US12448589

申请日：2007-12-28

申请人： Yeong-Rae Chang ,  Young-Jun Hong ,  Young-Eun Lee ,  Tae-Su Kim ,  Hyun-Woo Shin ,  Bu-Gon Shin

发明人： Yeong-Rae Chang ,  Young-Jun Hong ,  Young-Eun Lee ,  Tae-Su Kim ,  Hyun-Woo Shin ,  Bu-Gon Shin

IPC分类号： G02B1/10

CPC分类号： G02B1/111

摘要： A coating composition for antireflection that includes a low refraction-thermosetting resin having a refractive index of 1.2 to 1.45, a high refraction-ultraviolet curable resin having a refractive index of 1.46 to 2, and an ultraviolet absorber; an antireflection film manufactured using the coating composition; and a method of manufacturing the antireflection film. The antireflection film has excellent abrasion resistance and antireflection characteristic. Further, since the antireflection film can be manufactured in one coating process, it is possible to reduce manufacturing cost.

摘要翻译： 一种抗反射用涂料组合物，其包含折射率为1.2〜1.45的低折射率热固性树脂，折射率为1.46〜2的高折射紫外线固化性树脂和紫外线吸收剂; 使用该涂料组合物制造的防反射膜; 以及制造防反射膜的方法。 抗反射膜具有优异的耐磨性和抗反射特性。 此外，由于可以在一个涂布工艺中制造抗反射膜，所以可以降低制造成本。

公开(公告)号：US20090296219A1

公开(公告)日：2009-12-03

申请号：US12448589

申请日：2007-12-28

申请人： Yeong-Rae Chang ,  Young-Jun Hong ,  Young-Eun Lee ,  Tae-Su Kim ,  Hyun-Woo Shin ,  Bu-Gon Shin

发明人： Yeong-Rae Chang ,  Young-Jun Hong ,  Young-Eun Lee ,  Tae-Su Kim ,  Hyun-Woo Shin ,  Bu-Gon Shin

IPC分类号： G02B1/11 ,  F21V9/06 ,  B05D3/06

CPC分类号： G02B1/111

摘要： The present invention provides a coating composition for antireflection that includes a low refraction-thermosetting resin having a refractive index of 1.2 to 1.45, a high refraction-ultraviolet curable resin having a refractive index of 1.46 to 2, and an ultraviolet absorber; an antireflection film manufactured using the coating composition; and a method of manufacturing the antireflection film. The antireflection film according to the present invention has excellent abrasion resistance and antireflection characteristic. Further, since the antireflection film can be manufactured in one coating process, it is possible to reduce manufacturing cost.

摘要翻译： 本发明提供一种抗反射用涂料组合物，其包含折射率为1.2〜1.45的低折射率热固性树脂，折射率为1.46〜2的高折射紫外线固化树脂和紫外线吸收剂; 使用该涂料组合物制造的防反射膜; 以及制造防反射膜的方法。 根据本发明的抗反射膜具有优异的耐磨性和抗反射特性。 此外，由于可以在一个涂布工艺中制造抗反射膜，所以可以降低制造成本。

公开(公告)号：US20100020272A1

公开(公告)日：2010-01-28

申请号：US12310785

申请日：2007-09-07

申请人： Tae-Su Kim ,  Hyun-Woo Shin ,  Bu-Gon Shin ,  Jac-Jin Kim

发明人： Tae-Su Kim ,  Hyun-Woo Shin ,  Bu-Gon Shin ,  Jac-Jin Kim

IPC分类号： G02F1/1335

CPC分类号： G02F1/133536

摘要： A LCD (Liquid Crystal Display) device includes a backlight unit, a lower polarizer positioned on the backlight unit, a liquid crystal layer positioned on the lower polarizer, and an upper reflection polarizer positioned on the liquid crystal layer. The upper reflection polarizer is configured such that a regularly arranged metallic lattice is formed on a support this LCD device may give a good mirror effect when power is intercepted, and also give a clear display with high brightness even at a bright place when power is supplied to operate the LCD device.

摘要翻译： LCD（液晶显示器）装置包括背光单元，位于背光单元上的下偏振器，位于下偏振器上的液晶层和位于液晶层上的上反射偏振器。 上反射偏振片被配置为使得在支撑件上形成规则排列的金属格子，该LCD装置在断电时可以给出良好的镜面效果，并且即使在供电时在明亮的地方也提供高亮度的清晰显示 操作LCD设备。

公开(公告)号：US08054417B2

公开(公告)日：2011-11-08

申请号：US12310785

申请日：2007-09-07

申请人： Tae-Su Kim ,  Hyun-Woo Shin ,  Bu-Gon Shin ,  Jac-Jin Kim

发明人： Tae-Su Kim ,  Hyun-Woo Shin ,  Bu-Gon Shin ,  Jac-Jin Kim

IPC分类号： G02F1/1335

CPC分类号： G02F1/133536

摘要： An LCD (Liquid Crystal Display) device includes a backlight unit, a lower polarizer positioned on the backlight unit, a liquid crystal layer positioned on the lower polarizer, and an upper reflection polarizer positioned on the liquid crystal layer. The upper reflection polarizer is configured such that a regularly arranged metallic line lattice is formed on a support. this LCD device may give a good mirror effect when power is intercepted, and also give a clear display with high brightness even at a bright place when power is supplied to operate the LCD device.

摘要翻译： LCD（液晶显示器）装置包括背光单元，位于背光单元上的下偏振器，位于下偏振器上的液晶层和位于液晶层上的上反射偏振片。 上反射偏振器被配置为使得在支撑件上形成规则排列的金属线阵列。 这种LCD装置在断电时可以产生良好的镜面效果，并且即使在供给电力来操作LCD装置的情况下，也可以在明亮的地方提供高亮度的清晰显示。

公开(公告)号：US20100027146A1

公开(公告)日：2010-02-04

申请号：US12312927

申请日：2007-12-06

申请人： Hyun-Sik Kim ,  Bu-Gon Shin ,  Hyun-Woo Shin ,  Joon-Hyung Kim

发明人： Hyun-Sik Kim ,  Bu-Gon Shin ,  Hyun-Woo Shin ,  Joon-Hyung Kim

IPC分类号： G02B5/22 ,  G02B1/12

CPC分类号： G02B5/201 ,  G02B5/223

摘要： The present invention relates to a method of manufacturing a color filter, which includes forming a light-shielding portion and a pixel portion on a substrate, and reforming the pixel portion to be ink-philic by using a laser ablation. In the method of manufacturing the color filter, the laser ablation is used to prevent ink particles from being agglomerated in the pixel portion, uniformly filling with the ink, and selectively performing surface reformation of the pixel portion. The color filter manufactured by using the method has desirable pixels without color mixing.

摘要翻译： 本发明涉及一种制造滤色器的方法，其包括在基板上形成遮光部分和像素部分，并且通过使用激光烧蚀将像素部分重新形成为亲墨色。 在制造滤色器的方法中，使用激光烧蚀来防止墨颗粒在像素部分中聚集，均匀地填充墨，并且选择性地执行像素部分的表面改质。 通过使用该方法制造的滤色器具有不需要混色的期望像素。

公开(公告)号：US20100279233A1

公开(公告)日：2010-11-04

申请号：US12738598

申请日：2008-10-08

申请人： Tae-Su Kim ,  Jae-Jin Kim ,  Hyun-Woo Shin

发明人： Tae-Su Kim ,  Jae-Jin Kim ,  Hyun-Woo Shin

IPC分类号： G03F7/20

CPC分类号： G03F7/70408 ,  G02B5/1809 ,  G02B5/1814

摘要： A method for laser interference lithography using a diffraction grating includes (a) forming a photoresist layer on a work substrate to which a repeated fine pattern is to be formed; (b) forming a refractive index matching material layer on the photoresist layer; (c) forming on the refractive index matching material layer a diffraction grating layer having a period of diffraction grating within the range from λ/ng to λ/n0 (λ is a wavelength of laser beam, ng is a refractive index of the diffraction grating, and n0 is a refractive index in the air or in vacuum); and (d) exposing the photoresist layer by means of mutual interference of positive and negative diffracted lights with the same absolute value by inputting a laser beam perpendicularly to the diffraction grating layer. This method allows to realize an interference pattern with higher resolution and to use a laser source with lower coherence.

摘要翻译： 使用衍射光栅的激光干涉光刻方法包括：（a）在要形成重复精细图案的工件基板上形成光致抗蚀剂层; （b）在光致抗蚀剂层上形成折射率匹配材料层; （c）在折射率匹配材料层上形成具有λ/ ng至λ/ n0范围内的衍射光栅周期的衍射光栅层（λ为激光束的波长，ng为衍射光栅的折射率 ，n0是空气中或真空中的折射率）; 和（d）通过垂直于衍射光栅层输入激光束，通过相同绝对值的正和负衍射光的相互干涉来使光致抗蚀剂层曝光。 该方法允许实现具有更高分辨率的干涉图案并且使用具有较低相干性的激光源。

公开(公告)号：US08399184B2

公开(公告)日：2013-03-19

申请号：US12738598

申请日：2008-10-08

申请人： Tae-Su Kim ,  Jae-Jin Kim ,  Hyun-Woo Shin

发明人： Tae-Su Kim ,  Jae-Jin Kim ,  Hyun-Woo Shin

IPC分类号： G03F7/20

CPC分类号： G03F7/70408 ,  G02B5/1809 ,  G02B5/1814

摘要： A method for laser interference lithography using a diffraction grating includes (a) forming a photoresist layer on a work substrate to which a repeated fine pattern is to be formed; (b) forming a refractive index matching material layer on the photoresist layer; (c) forming on the refractive index matching material layer a diffraction grating layer having a period of diffraction grating within the range from λ/ng to λ/n0 (λ is a wavelength of laser beam, ng is a refractive index of the diffraction grating, and n0 is a refractive index in the air or in vacuum); and (d) exposing the photoresist layer by means of mutual interference of positive and negative diffracted lights with the same absolute value by inputting a laser beam perpendicularly to the diffraction grating layer. This method allows to realize an interference pattern with higher resolution and to use a laser source with lower coherence.

摘要翻译： 使用衍射光栅的激光干涉光刻方法包括：（a）在要形成重复精细图案的工件基板上形成光致抗蚀剂层; （b）在光致抗蚀剂层上形成折射率匹配材料层; （c）在折射率匹配材料层上形成具有λ/ ng至λ/ n0范围内的衍射光栅周期的衍射光栅层（λ为激光束的波长，ng为衍射光栅的折射率 ，n0是空气中或真空中的折射率）; 和（d）通过垂直于衍射光栅层输入激光束，通过相同绝对值的正和负衍射光的相互干涉来使光致抗蚀剂层曝光。 该方法允许实现具有更高分辨率的干涉图案并且使用具有较低相干性的激光源。

公开(公告)号：US20090323156A1

公开(公告)日：2009-12-31

申请号：US12310734

申请日：2007-09-04

申请人： Hyun-Woo Shin ,  Ki-Seok Jang ,  Jin-Young Park ,  Min-Ho Choi ,  Tae-Su Kim ,  Su-Hee Lee ,  Jae-Hong Kim ,  Boo-Kyung Kim

发明人： Hyun-Woo Shin ,  Ki-Seok Jang ,  Jin-Young Park ,  Min-Ho Choi ,  Tae-Su Kim ,  Su-Hee Lee ,  Jae-Hong Kim ,  Boo-Kyung Kim

IPC分类号： G02F1/15 ,  G03F7/20

CPC分类号： G02F1/153

摘要： A method for forming an electrochromic layer pattern includes forming a transparent electrode layer and a photoresist layer on a transparent substrate, forming a photoresist pattern by laser interference lithography, and depositing an electrochromic layer pattern on the transparent electrode through openings defined by the photoresist pattern by depositing an electrochromic layer on a front surface of the substrate and then lifting up the photoresist pattern. An insulation layer may be further formed between the transparent layer and the photoresist layer. Here, the electrochromic layer may be formed after an insulation layer pattern is formed using the photoresist pattern as an etching mask. In this case, the electrochromic layer pattern is formed in openings defined by the insulation layer pattern. As a result, a contact surface area between the electrochromic layer pattern and the ion conductive layer is increased to ensure a rapid response speed.

摘要翻译： 形成电致变色层图案的方法包括在透明基板上形成透明电极层和光致抗蚀剂层，通过激光干涉光刻形成光致抗蚀剂图案，并通过由光致抗蚀剂图案限定的开口在透明电极上沉积电致变色层图案 在基板的前表面上沉积电致变色层，然后提起光致抗蚀剂图案。 可以在透明层和光致抗蚀剂层之间进一步形成绝缘层。 这里，可以在使用光致抗蚀剂图案作为蚀刻掩模形成绝缘层图案之后形成电致变色层。 在这种情况下，电致变色层图案形成在由绝缘层图案限定的开口中。 结果，增加了电致变色层图案和离子传导层之间的接触表面积，以确保快速的响应速度。

公开(公告)号：US07999991B2

公开(公告)日：2011-08-16

申请号：US12448909

申请日：2008-01-22

申请人： Ki-Seok Jang ,  Hyun-Woo Shin ,  Jae-Hong Kim

发明人： Ki-Seok Jang ,  Hyun-Woo Shin ,  Jae-Hong Kim

IPC分类号： G02F1/153

CPC分类号： G02F1/1506 ,  G02F1/155

摘要： Disclosed is a method of preparing an electrode, which can lead to uniform electrochromism of a lithium nickel oxide layer by applying a voltage in all directions of the electrode during a formatting process, an electrode prepared by the same, and an electrochromic device including the electrode.

摘要翻译： 公开了一种制备电极的方法，其可以在格式化过程期间通过在电极的所有方向施加电压，由其制备的电极以及包括电极的电致变色器件而导致锂镍氧化物层的均匀电致变色 。

公开(公告)号：US20100014145A1

公开(公告)日：2010-01-21

申请号：US12448909

申请日：2008-01-22

申请人： Ki-Seok Jang ,  Hyun-Woo Shin ,  Jae-Hong Kim

发明人： Ki-Seok Jang ,  Hyun-Woo Shin ,  Jae-Hong Kim

IPC分类号： G02F1/155 ,  B05D3/06

CPC分类号： G02F1/1506 ,  G02F1/155

摘要： Disclosed is a method of preparing an electrode, which can lead to uniform electrochromism of a lithium nickel oxide layer by applying a voltage in all directions of the electrode during a formatting process, an electrode prepared by the same, and an electrochromic device including the electrode.

摘要翻译： 公开了一种制备电极的方法，其可以在格式化过程期间通过在电极的所有方向施加电压，由其制备的电极以及包括电极的电致变色器件而导致锂镍氧化物层的均匀电致变色 。