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26 条记录 (耗时 0.023 秒)

    Substrate transfer apparatus, substrate transfer method, and storage medium
    1.
    发明授权
    Substrate transfer apparatus, substrate transfer method, and storage medium 有权
    基板转印装置，基板转印方法和存储介质

    公开(公告)号：US08029224B2

    公开(公告)日：2011-10-04

    申请号：US12076648

    申请日：2008-03-20

    申请人： Yo Abe ,  Mitsuru Obara ,  Takahiro Abe

    发明人： Yo Abe ,  Mitsuru Obara ,  Takahiro Abe

    IPC分类号： H01L21/00 ,  G01N21/86

    CPC分类号： H01L21/67781 ,  H01L21/67265 ,  H01L21/67766 ,  Y10S414/138

    摘要： A substrate transfer apparatus 100 includes a substrate transport means 4 having a transport base 5 and a plurality of retention arms 41a-41e for retaining substrates W, an optical sensor 62 that is used to define a horizontal optical axis L, an elevator means 52 for moving the transport base 5 up and down, and a height detection means 54 for detecting the height of the transport base 5 relative to the optical axis L. In accordance with a light-reception/no-light-reception detection result fed from the optical sensor 62 and the height of the transport base 5, a judgment means 72a of a control section 7 judges whether the postures of the retention arms 41a-41e relative to the horizontal plane are normal. When the judgment means 72a judges that the postures of the retention arms 41a-41e relative to the horizontal plane are abnormal, the control section 7 exercises control to stop the substrate transport means 4.

    摘要翻译： 基板输送装置100具备：基板输送机构4，具有输送基座5和保持基板W的多个保持臂41a-41e，用于限定水平光轴L的光学传感器62;电梯装置52， 移动基座5上下移动的高度检测单元54，检测运送台5相对于光轴L的高度的高度检测单元54.根据来自光学系统的光接收/无光接收检测结果 传感器62和传送基座5的高度，控制部分7的判断装置72a判断保持臂41a-41e相对于水平面的姿势是否正常。 当判断装置72a判定保持臂41a-41e相对于水平面的姿势异常时，控制部分7进行控制以停止基板输送装置4。

    Substrate transfer apparatus, substrate transfer method, and storage medium
    2.
    发明申请
    Substrate transfer apparatus, substrate transfer method, and storage medium 有权
    基板转印装置，基板转印方法和存储介质

    公开(公告)号：US20080232937A1

    公开(公告)日：2008-09-25

    申请号：US12076648

    申请日：2008-03-20

    申请人： Yo Abe ,  Mitsuru Obara ,  Takahiro Abe

    发明人： Yo Abe ,  Mitsuru Obara ,  Takahiro Abe

    IPC分类号： H01L21/00

    CPC分类号： H01L21/67781 ,  H01L21/67265 ,  H01L21/67766 ,  Y10S414/138

    摘要： A substrate transfer apparatus 100 includes a substrate transport means 4 having a transport base 5 and a plurality of retention arms 41a-41e for retaining substrates W, an optical sensor 62 that is used to define a horizontal optical axis L, an elevator means 52 for moving the transport base 5 up and down, and a height detection means 54 for detecting the height of the transport base 5 relative to the optical axis L. In accordance with a light-reception/no-light-reception detection result fed from the optical sensor 62 and the height of the transport base 5, a judgment means 72a of a control section 7 judges whether the postures of the retention arms 41a-41e relative to the horizontal plane are normal. When the judgment means 72a judges that the postures of the retention arms 41a-41e relative to the horizontal plane are abnormal, the control section 7 exercises control to stop the substrate transport means 4.

    摘要翻译： 基片传送装置100包括具有传输基座5和用于保持基片W的多个保持臂41a-41e，用于限定水平光轴L的光学传感器62的基片传送装置4，电梯装置 52，用于检测传送基座5相对于光轴L的高度的高度检测单元54.根据从传送基座5的光接收检测结果 光学传感器62和传送基座5的高度，控制部7的判断装置72a判断保持臂41a-41e相对于水平面的姿势是否正常。 当判断装置72a判定保持臂41a-41e相对于水平面的姿势异常时，控制部分7进行控制以停止基板传送装置4。

    Electronic ballast for a high intensity discharge lamp
    6.
    发明授权
    Electronic ballast for a high intensity discharge lamp 有权
    电子镇流器用于高强度放电灯

    公开(公告)号：US06958580B2

    公开(公告)日：2005-10-25

    申请号：US10479042

    申请日：2002-06-10

    申请人： Takeshi Kamoi ,  Takahiro Abe

    发明人： Takeshi Kamoi ,  Takahiro Abe

    IPC分类号： H05B41/288 ,  H05B41/392 ,  G05F1/00

    CPC分类号： H05B41/3921 ,  H05B41/2882

    摘要： An electronic ballast for a discharge lamp is capable of dimming the lamp over a wide range, yet assuring to operate the lamp efficiently with a minimum lamp power variation in compensation for a possible lamp characteristic variation. The ballast provides an unique voltage-wattage output characteristic which varies with a varying dimming ratio for reducing the lamp power as the dimming ratio decreases. The output characteristic is designed to follow a true lamp characteristic that the lamp voltage will decrease as the lamp power is reduced to a certain level. With this result, it is possible to give a wide voltage range within which the lamp power being supplied to the lamp is kept substantially constant irrespective of the lamp characteristic variation, thereby assuring to reduce the lamp power exactly as intended by the dimming ratio even in the presence of the lamp characteristic variation.

    摘要翻译： 用于放电灯的电子镇流器能够在宽范围内对灯进行调光，但是确保以可能的灯特性变化补偿的最小灯功率变化来有效地操作灯。 镇流器提供独特的电压功率输出特性，随着调光比降低，随着变化的调光比而变化，以减小灯功率。 输出特性被设计为遵循真正的灯特性，灯电压将随着灯功率降低到一定水平而降低。 由此，可以提供宽电压范围，其中供给灯的灯功率与灯特性变化无关地保持基本恒定，从而确保即使在调光比下也能按照调光比精确地降低灯功率 存在灯的特性变化。

    Method for processing plasma processing apparatus
    7.
    发明申请
    Method for processing plasma processing apparatus 审中-公开
    等离子体处理装置的处理方法

    公开(公告)号：US20050072444A1

    公开(公告)日：2005-04-07

    申请号：US10791856

    申请日：2004-03-04

    申请人： Shigeru Shirayone ,  Tetsuo Ono ,  Naoshi Itabashi ,  Motohiko Yoshigai ,  Takahiro Abe ,  Takahiro Shimomura ,  Hiroyuki Kitsunai

    发明人： Shigeru Shirayone ,  Tetsuo Ono ,  Naoshi Itabashi ,  Motohiko Yoshigai ,  Takahiro Abe ,  Takahiro Shimomura ,  Hiroyuki Kitsunai

    IPC分类号： B08B7/00 ,  H01L21/3213 ,  B08B3/12

    CPC分类号： H01J37/32082 ,  B08B7/0035 ,  H01J2237/334 ,  H01L21/32136

    摘要： A method for processing a plasma processing apparatus having plasma generating means 3, 8, 10, 13 through 15 for generating plasma within a processing chamber, a high-frequency power applying means 18 for applying high-frequency power to an object 17 to be processed, a processing chamber 1 to which an evacuating device 7 is connected and capable of having its interior evacuated, and a gas supply device (not shown) for the processing chamber, wherein the method comprises mounting a Si wafer 17 on an electrode 4 for holding the object to be processed, introducing hydrobromic gas and chlorine gas into the processing chamber and generating plasma, and removing the aluminum-based deposit adhered to the interior of the processing chamber.

    摘要翻译： 一种用于处理具有用于在处理室内产生等离子体的等离子体产生装置3,8,10,13至15的等离子体处理装置的方法，用于向要处理的物体17施加高频电力的高频电力施加装置18 ，排气装置7连接并能够将其内部抽真空的处理室1和用于处理室的气体供给装置（未示出），其中该方法包括将Si晶片17安装在用于保持的电极4上 要处理的物体，将氢溴酸气体和氯气引入处理室并产生等离子体，以及去除附着在处理室内部的铝基沉积物。

    Wire harness attachment structure
    9.
    发明授权
    Wire harness attachment structure 有权
    线束附件结构

    公开(公告)号：US09166387B2

    公开(公告)日：2015-10-20

    申请号：US13819929

    申请日：2011-07-28

    申请人： Hiroyuki Murakoshi ,  Takahiro Abe

    发明人： Hiroyuki Murakoshi ,  Takahiro Abe

    IPC分类号： H02G3/04 ,  F16L3/10 ,  B60R16/02 ,  H02G3/32

    CPC分类号： H02G3/0406 ,  B60R16/0215 ,  F16L3/1025 ,  H02G3/0418 ,  H02G3/32

    摘要： An object is to mount a harness protector on a circular-sectional-shaped reinforcing member stably in a space-saving manner. A protector into which a wiring harness is inserted is arranged on a top portion of a circular-sectional-shaped horizontal reinforcing member at a vehicle side along a longitudinal direction of the reinforcing member. A curved bottom surface formed on a bottom of the protector is engaged with a curved top surface of the reinforcing member. A locking clamp projected from the bottom is engaged with a hole of the reinforcing member. A notch portion communicated with the curved bottom surface and a bracket positioned at an upper side of the notch portion are provided on a sidewall of the protector. A receiving bracket of the reinforcing member is engaged with the notch portion, and the bracket is screwed and fixed to the receiving bracket. A bottom surface of a ground terminal is exposed in a bottom surface of the bracket, and the bottom surface of the ground terminal abuts on the conductive receiving bracket at the same time as the bracket is screwed and fixed.

    摘要翻译： 目的是以节省空间的方式稳定地将线束保护器安装在圆形截面形状的加强构件上。 沿着加强构件的长度方向在车辆侧的圆形截面形状的水平加强构件的顶部上布置有插入线束的保护器。 形成在保护器的底部上的弯曲的底部表面与加强构件的弯曲的顶部表面接合。 从底部突出的锁定夹与加强构件的孔接合。 与弯曲底面连通的切口部分和位于切口部分上侧的支架设置在保护器的侧壁上。 加强构件的接收托架与切口部接合，并且托架被螺纹固定到接收托架。 接地端子的底面暴露在支架的底面，接地端子的底面与支架螺纹固定的同时靠在导电接收支架上。