Semiconductor device having through vias
    8.
    发明授权
    Semiconductor device having through vias 有权
    具有通孔的半导体器件

    公开(公告)号:US07602047B2

    公开(公告)日:2009-10-13

    申请号:US11979562

    申请日:2007-11-06

    IPC分类号: H01L29/40

    摘要: A method of fabricating a semiconductor device is provided. The method may include forming an insulating layer on a wafer. The wafer may have an active surface and an inactive surface which face each other, and the insulating layer may be formed on the active surface. A pad may be formed on the insulating layer, and a first hole may be formed in the insulating layer. A first hole insulating layer may then be formed on an inner wall of the first hole. A second hole may be formed under the first hole. The second hole may be formed to extend from the first hole into the wafer. A second hole insulating layer may be formed on an inner wall of the second hole. The semiconductor device fabricated according to the method may also be provided.

    摘要翻译: 提供一种制造半导体器件的方法。 该方法可以包括在晶片上形成绝缘层。 晶片可以具有彼此面对的有源表面和非活性表面,并且绝缘层可以形成在有源表面上。 可以在绝缘层上形成焊盘,并且可以在绝缘层中形成第一孔。 然后可以在第一孔的内壁上形成第一孔绝缘层。 可以在第一孔下方形成第二孔。 第二孔可以形成为从第一孔延伸到晶片。 第二孔绝缘层可以形成在第二孔的内壁上。 还可以提供根据该方法制造的半导体器件。