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    Substrate depositing system and depositing method using the same
    4.
    发明授权
    Substrate depositing system and depositing method using the same 有权
    基板沉积系统及其沉积方法

    公开(公告)号：US08802488B2

    公开(公告)日：2014-08-12

    申请号：US13179350

    申请日：2011-07-08

    申请人： Jeong-Ho Yi ,  Suk-Won Jung ,  Seung-Ho Choi

    发明人： Jeong-Ho Yi ,  Suk-Won Jung ,  Seung-Ho Choi

    IPC分类号： H01L51/40 ,  C23C16/00

    CPC分类号： H01L21/67184 ,  C23C14/50 ,  C23C14/566 ,  C23C14/568 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67748

    摘要： A substrate depositing system and a method of using a substrate depositing system. A substrate depositing system includes a load-lock chamber for loading and unloading a substrate, at least one transfer chamber connected to the load-lock chamber and including a substrate transfer device configured to vertically transfer the substrate, and a pair of depositing chambers connected to opposite sides of the at least one transfer chamber and including a depositing source and a pair of substrate fixing devices, the substrate transfer device including a pair of substrate installing members.

    摘要翻译： 衬底沉积系统和使用衬底沉​​积系统的方法。 衬底沉积系统包括用于装载和卸载衬底的加载锁定室，连接到加载锁定室的至少一个传送室，并且包括被配置为垂直传送衬底的衬底传送装置，以及连接到 所述至少一个传送室的相对侧并且包括沉积源和一对基板固定装置，所述基板传送装置包括一对基板安装构件。

    SUBSTRATE DEPOSITING SYSTEM AND DEPOSITING METHOD USING THE SAME
    5.
    发明申请
    SUBSTRATE DEPOSITING SYSTEM AND DEPOSITING METHOD USING THE SAME 有权
    基底沉积系统和使用该沉积系统的沉积方法

    公开(公告)号：US20120064728A1

    公开(公告)日：2012-03-15

    申请号：US13179350

    申请日：2011-07-08

    申请人： Jeong-Ho Yi ,  Suk-Won Jung ,  Seung-Ho Choi

    发明人： Jeong-Ho Yi ,  Suk-Won Jung ,  Seung-Ho Choi

    IPC分类号： H01L21/30 ,  B05C5/00

    CPC分类号： H01L21/67184 ,  C23C14/50 ,  C23C14/566 ,  C23C14/568 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67748

    摘要： A substrate depositing system and a method of using a substrate depositing system. A substrate depositing system includes a load-lock chamber for loading and unloading a substrate, at least one transfer chamber connected to the load-lock chamber and including a substrate transfer device configured to vertically transfer the substrate, and a pair of depositing chambers connected to opposite sides of the at least one transfer chamber and including a depositing source and a pair of substrate fixing devices, the substrate transfer device including a pair of substrate installing members.

    摘要翻译： 衬底沉积系统和使用衬底沉​​积系统的方法。 衬底沉积系统包括用于装载和卸载衬底的加载锁定室，连接到加载锁定室的至少一个传送室，并且包括被配置为垂直传送衬底的衬底传送装置，以及连接到 所述至少一个传送室的相对侧并且包括沉积源和一对基板固定装置，所述基板传送装置包括一对基板安装构件。

    Substrate Depositing System and Method
    6.
    发明申请
    Substrate Depositing System and Method 审中-公开
    基材沉积体系及方法

    公开(公告)号：US20120094025A1

    公开(公告)日：2012-04-19

    申请号：US13186944

    申请日：2011-07-20

    申请人： Sun-Ho Kim ,  Cheol-Lae Roh ,  Suk-Won Jung ,  Hyun Choi ,  Min-Gyu Seo

    发明人： Sun-Ho Kim ,  Cheol-Lae Roh ,  Suk-Won Jung ,  Hyun Choi ,  Min-Gyu Seo

    IPC分类号： B05D5/00 ,  B05C11/00 ,  B05C13/00

    CPC分类号： H01L51/56 ,  B05D1/02 ,  B05D1/32 ,  H01J37/32743 ,  H01J37/32788 ,  H01J37/32899 ,  H01L21/67173 ,  H01L21/67225

    摘要： A substrate depositing system comprises a substrate loading chamber for receiving a substrate, a substrate unloading chamber for withdrawing the substrate, at least one process chamber disposed between the substrate loading chamber and the substrate unloading chamber for processing the substrate, and a mask keeping chamber connected to one side of the process chamber(s). A substrate depositing method comprises inputting a substrate into a process chamber, transferring a mask to the process chamber from a mask keeping chamber connected to the process chamber, aligning the substrate and the mask, depositing a depositing material on the substrate while moving a deposition source in the process chamber, and withdrawing the substrate from the process chamber.

    摘要翻译： 衬底沉积系统包括用于接收衬底的衬底加载室，用于取出衬底的衬底卸载室，设置在衬底加载室和衬底卸载室之间的至少一个处理室，用于处理衬底;以及掩模保持室连接 到处理室的一侧。 衬底沉积方法包括将衬底输入到处理室中，将掩模从连接到处理室的掩模保持室转移到处理室，对准衬底和掩模，在衬底上沉积沉积材料，同时移动沉积源 在处理室中，并从处理室中取出基板。

    DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    10.
    发明申请
    DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 有权
    显示基板及其制造方法

    公开(公告)号：US20110169000A1

    公开(公告)日：2011-07-14

    申请号：US12904507

    申请日：2010-10-14

    申请人： JUNG-SUK BANG ,  Byeong-Hoon Cho ,  Sung-Hoon Yang ,  Suk-Won Jung ,  Ki-Hun Jeong

    发明人： JUNG-SUK BANG ,  Byeong-Hoon Cho ,  Sung-Hoon Yang ,  Suk-Won Jung ,  Ki-Hun Jeong

    IPC分类号： H01L33/16 ,  H01L33/00

    CPC分类号： G02F1/136209 ,  G02F2001/13312 ,  G02F2203/11

    摘要： A display substrate includes a first light blocking pattern formed on a base substrate, a first switching element, a second light blocking pattern formed on the base substrate, and a first sensing element. The first light blocking pattern is configured to block visible light and transmit infrared light. The first switching element includes a first semiconductor pattern, a first source electrode, a first drain electrode, and a first gate electrode. The second light blocking pattern is configured to block the visible light and transmit the infrared light. The first sensing element is configured to detect the infrared light, and includes a second semiconductor pattern, a second source electrode, a second drain electrode, and a second gate electrode.

    摘要翻译： 显示基板包括形成在基底基板上的第一遮光图案，第一开关元件，形成在基底基板上的第二遮光图案和第一感测元件。 第一遮光图案被配置为阻挡可见光并透射红外光。 第一开关元件包括第一半导体图案，第一源极电极，第一漏极电极和第一栅极电极。 第二遮光图案被配置为阻挡可见光并透射红外光。 第一感测元件被配置为检测红外光，并且包括第二半导体图案，第二源电极，第二漏电极和第二栅电极。